公开(公告)号：US20060044539A1

公开(公告)日：2006-03-02

申请号：US10927309

申请日：2004-08-27

申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

IPC分类号： G03B27/54

CPC分类号： G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

摘要： A lithographic system includes a laser outputting a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a prism for forming interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable without replacing any optical components in an optical path of the lithographic system. The beamsplitter is movable along the optical path to adjust the resolution. The prism includes a plurality of sets of facets, each set of facets corresponding to a particular resolution. Each set of facets corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. The resolution is adjustable. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.

公开(公告)号：US07474385B2

公开(公告)日：2009-01-06

申请号：US11561238

申请日：2006-11-17

申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.

摘要翻译： 光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。 光刻系统的分辨率可通过调整反射表面的角度方向来调节。 分束器可沿着光路移动以调节分辨率。 反射面可以是棱镜的面。 每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。 分束器包括线性光栅或棋盘格栅。 梁是N路对称的。 通过沿着光路移动分束器来调节系统的数值孔径。 液体可以在基板和棱镜之间。

公开(公告)号：US20070041002A1

公开(公告)日：2007-02-22

申请号：US11586639

申请日：2006-10-26

申请人： Aleksandr Khmelichek ,  Louis Markoya ,  Harry Sewell

发明人： Aleksandr Khmelichek ,  Louis Markoya ,  Harry Sewell

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.

摘要翻译： 一种液浸光刻系统，包括用于将电磁辐射引导到基板上的投影光学系统，以及用于在投影光学系统和基板之间输送液体流的喷头。 喷头包括位于不同高度的注射喷嘴和拾取喷嘴。 液体流动相对于基底倾斜。 从注射喷嘴到回收喷嘴的方向相对于基板倾斜约1至2度。

公开(公告)号：US20060170896A1

公开(公告)日：2006-08-03

申请号：US11341381

申请日：2006-01-30

申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Diane McCafferty ,  Harry Sewell ,  Justin Kreuzer

发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Diane McCafferty ,  Harry Sewell ,  Justin Kreuzer

IPC分类号： G03B27/54

CPC分类号： G03F7/70408

摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.

摘要翻译： 光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。 照明系统提供辐射束。 可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。 下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。 使用梁的部分在基板上形成干涉条纹或接触孔图案。

公开(公告)号：US20080137044A1

公开(公告)日：2008-06-12

申请号：US11634924

申请日：2006-12-07

申请人： Harry Sewell ,  Louis Markoya ,  Diane McCafferty

发明人： Harry Sewell ,  Louis Markoya ,  Diane McCafferty

IPC分类号： G03B27/52

CPC分类号： G03B27/72 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70858

摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.

摘要翻译： 提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。 像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。 流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。 在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。 提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。

公开(公告)号：US08709908B2

公开(公告)日：2014-04-29

申请号：US12725026

申请日：2010-03-16

申请人： Harry Sewell ,  Mircea Dusa ,  Richard Johannes Franciscus Van Haren ,  Manfred Gawein Tenner ,  Maya Angelova Doytcheva

发明人： Harry Sewell ,  Mircea Dusa ,  Richard Johannes Franciscus Van Haren ,  Manfred Gawein Tenner ,  Maya Angelova Doytcheva

IPC分类号： H01L21/76

CPC分类号： G03F9/7046 ,  G03F7/0035 ,  G03F7/105 ,  G03F7/70466 ,  G03F9/7076 ,  H01L21/0273 ,  H01L21/32139

摘要： A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

摘要翻译： 提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。 该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。 染料可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。 波长可对应于对准光束的波长。 染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。

公开(公告)号：US08629970B2

公开(公告)日：2014-01-14

申请号：US12355039

申请日：2009-01-16

申请人： Harry Sewell ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Louis John Markoya ,  Diane McCafferty

发明人： Harry Sewell ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Louis John Markoya ,  Diane McCafferty

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.

摘要翻译： 光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。 流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。 测量装置被配置为监测浸没流体的参数。 回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

公开(公告)号：US08451422B2

公开(公告)日：2013-05-28

申请号：US12388900

申请日：2009-02-19

申请人： Harry Sewell ,  Erik Theodorus Maria Bijlaart ,  Sjoerd Nicolaas Lambertus Donders ,  Louis John Markoya ,  Diane McCafferty ,  Ralph Joseph Meijers

发明人： Harry Sewell ,  Erik Theodorus Maria Bijlaart ,  Sjoerd Nicolaas Lambertus Donders ,  Louis John Markoya ,  Diane McCafferty ,  Ralph Joseph Meijers

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G01F1/662 ,  G01F1/667 ,  G01N1/2226 ,  G03F7/70341 ,  G03F7/70858

摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.

摘要翻译： 公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。 此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

公开(公告)号：US07898643B2

公开(公告)日：2011-03-01

申请号：US11187010

申请日：2005-07-22

申请人： Harry Sewell

发明人： Harry Sewell

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70233

摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes an optical system that images the electromagnetic radiation on the substrate. A liquid is between the optical system and the substrate. The projection optical system is positioned below the substrate.

摘要翻译： 液浸光刻系统包括用电磁辐射曝光基板的曝光系统，还包括对基片上的电磁辐射进行成像的光学系统。 液体在光学系统和基板之间。 投影光学系统位于基板的下方。

公开(公告)号：US20080192214A1

公开(公告)日：2008-08-14

申请号：US11984825

申请日：2007-11-21

申请人： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Czop McCafferty

发明人： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Czop McCafferty

IPC分类号： G03B27/52 ,  F26B3/00

CPC分类号： G03F7/70341

摘要： Lithographic Apparatus, a Dryer and a Method of Removing Liquid from a Surface A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

摘要翻译： 平版印刷设备，干燥器和从表面去除液体的方法公开了一种干燥和/或润湿表面（例如基底的顶表面）的新方法，其可用于浸没式光刻。 将表面放置在单相萃取器下方，并将启动液体在单相萃取器和表面之间输送。 单相萃取器只有在单相萃取器和表面之间提供了引发液体后才被激活。 在整个干燥和/或润湿过程中，引发液体被输送到单相萃取器。