公开(公告)号：US20160020132A1

公开(公告)日：2016-01-21

申请号：US14773005

申请日：2014-03-14

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Kaushal Gangakhedkar

IPC: H01L21/683 ,  C23C16/46 ,  C23C16/455 ,  C23C16/50 ,  H01L21/687 ,  C23C16/458

CPC classification number: H01L21/6838 ,  C23C16/45544 ,  C23C16/458 ,  C23C16/46 ,  C23C16/50 ,  H01L21/68735

Abstract: Described are apparatus and methods for processing a semiconductor wafer so that the wafer remains in place during processing. The wafer is subjected to a pressure differential between the top surface and bottom surface so that sufficient force prevents the wafer from moving during processing, the pressure differential generated by applying a decreased pressure to the back side of the wafer.

Abstract translation: 描述了用于处理半导体晶片的装置和方法，使得晶片在处理期间保持就位。 晶片经受顶表面和底表面之间的压差，使得足够的力防止晶片在加工期间移动，通过对晶片的背面施加减小的压力而产生的压差。

公开(公告)号：US12146217B2

公开(公告)日：2024-11-19

申请号：US17590614

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

IPC: C23C16/44 ,  A61K9/16 ,  C23C16/455

Abstract: A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

公开(公告)号：US11810810B2

公开(公告)日：2023-11-07

申请号：US18079589

申请日：2022-12-12

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Kallol Bera ,  Joseph Yudovsky

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01L21/68764 ,  H01L21/67017 ,  H01L21/6838 ,  H01L21/6875 ,  H01L21/68735 ,  H01L21/68757 ,  H01L21/68771 ,  H01L21/68785

Abstract: Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described. A pie anchor can be positioned in the center of the susceptor base to hold the pie-shaped skins in place during processing.

公开(公告)号：US20220186372A1

公开(公告)日：2022-06-16

申请号：US17590614

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

IPC: C23C16/455 ,  A61K9/16 ,  C23C16/44

Abstract: A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

公开(公告)号：US20220064794A1

公开(公告)日：2022-03-03

申请号：US17522869

申请日：2021-11-09

Applicant: Applied Materials, Inc.

Inventor： Colin C. Neikirk ,  Pravin K. Narwankar ,  Kaushal Gangakhedkar ,  Visweswaren Sivaramakrishnan ,  Jonathan Frankel ,  David Masayuki Ishikawa ,  Quoc Truong ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

公开(公告)号：US20210384063A1

公开(公告)日：2021-12-09

申请号：US17403756

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Kaushal Gangakhedkar

IPC: H01L21/683 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C16/50 ,  H01L21/687

Abstract: Described are apparatus and methods for processing a semiconductor wafer so that the wafer remains in place during processing. The wafer is subjected to a pressure differential between the top surface and bottom surface so that sufficient force prevents the wafer from moving during processing, the pressure differential generated by applying a decreased pressure to the back side of the wafer.

公开(公告)号：US11180846B2

公开(公告)日：2021-11-23

申请号：US16708308

申请日：2019-12-09

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar

IPC: H01L21/687 ,  C23C14/50 ,  C23C16/458 ,  C23C16/455

Abstract: Pedestal assemblies with a thermal barrier plate, a torque plate and at least one kinematic mount to change a plane formed by the thermal barrier plate are described. Susceptor assemblies and processing chambers incorporating the pedestal assemblies are also described. Methods of leveling a susceptor to form parallel planes between the susceptor surface and a gas distribution assembly surface are also described.

公开(公告)号：US10774006B2

公开(公告)日：2020-09-15

申请号：US15976704

申请日：2018-05-10

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Jennifer Y. Sun

IPC: C04B35/50 ,  C04B35/505 ,  C04B35/622 ,  C23C4/11 ,  C23C4/134 ,  C23C14/08 ,  C23C14/22 ,  C23C16/40 ,  C23C16/455 ,  C23C24/04 ,  C23C4/18 ,  C23C14/58 ,  C23C16/56 ,  C04B35/64 ,  C04B35/44 ,  C04B35/486

Abstract: Methods comprise loading an article comprising a ceramic coating into an induction heating system or a microwave heating system and heat treating the ceramic coating using the microwave heating system or the induction heating system within a temperature range for a duration of about 1-15 minutes.

公开(公告)号：US20170352575A1

公开(公告)日：2017-12-07

申请号：US15616364

申请日：2017-06-07

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Kallol Bera ,  Joseph Yudovsky

IPC: H01L21/687 ,  H01L21/67

Abstract: Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described. A pie anchor can be positioned in the center of the susceptor base to hold the pie-shaped skins in place during processing.

公开(公告)号：US11242599B2

公开(公告)日：2022-02-08

申请号：US16515875

申请日：2019-07-18

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

IPC: C23C16/44 ,  C23C16/455 ,  A61K9/16

Abstract: A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.