摘要:
A gallium nitride based field effect transistor having good current hysteresis characteristics in which forward gate leakage can be reduced. In a gallium nitride-based field effect transistor (100) having a gate insulation film (108), part or all of a material constituting the gate insulation film (108) is a dielectric material having a relative dielectric constant of 9-22, and a semiconductor crystal layer A (104) in contact with the gate insulation film (108) and a semiconductor crystal layer B (103) in the vicinity of the semiconductor crystal layer A (104) and having a larger electron affinity than the semiconductor crystal layer A (104) constitute a hetero junction. A hafnium oxide such as HfO2, HfAlO, HfAlON or HfSiO is preferably contained, at least partially, in the material constituting the gate insulation film (108).
摘要:
Provided is a silicon carbide epitaxial wafer which is formed on a substrate that is less than 1° off from the {0001} surface of silicon carbide having an α-type crystal structure, wherein the crystal defects in the SiC epitaxial wafer are reduced while the flatness of the surface thereof is improved.
摘要:
A mobile electronic device includes: a housing; an image projector provided on the housing for projecting a portion of an original image to a projection area; and a processing unit. The processing unit causes the image projector to change an image projected to the projection area from a first image corresponding to a first portion of the original image to a second image corresponding to a second portion of the original image according to change information for changing the image projected by the image projector.
摘要:
An epitaxial crystal for a field effect transistor which has a nitride-based III-V group semiconductor epitaxial crystal grown on a SiC single crystal base substrate having micropipes by use of an epitaxial growth method, wherein at least a part of the micropipes spreading from the SiC single crystal base substrate into the epitaxial crystal terminate between an active layer of the transistor and the SiC single crystal base substrate.
摘要:
Provided is a silicon carbide epitaxial wafer which is formed on a substrate that is less than 1° off from the {0001} surface of silicon carbide having an α-type crystal structure, wherein the crystal defects in the SiC epitaxial wafer are reduced while the flatness of the surface thereof is improved.
摘要:
An epitaxial crystal for a field effect transistor which has a nitride-based III-V group semiconductor epitaxial crystal grown on a SiC single crystal base substrate having micropipes by use of an epitaxial growth method, wherein at least a part of the micropipes spreading from the SiC single crystal base substrate into the epitaxial crystal terminate between an active layer of the transistor and the SiC single crystal base substrate.
摘要:
An epitaxial SiC single crystal substrate including a SiC single crystal wafer whose main surface is a c-plane or a surface that inclines a c-plane with an angle of inclination that is more than 0 degree but less than 10 degrees, and SiC epitaxial film that is formed on the main surface of the SiC single crystal wafer, wherein the dislocation array density of threading edge dislocation arrays that are formed in the SiC epitaxial film is 10 arrays/cm2 or less.
摘要翻译:外延SiC单晶衬底,其包括主表面为c面的SiC单晶晶片或倾斜角度大于0度但小于10度的c面倾斜的表面;以及SiC外延膜 其形成在SiC单晶晶片的主表面上,其中形成在SiC外延膜中的穿线边缘位错阵列的位错阵列密度为10阵列/ cm 2以下。
摘要:
According to one embodiment, a mobile electronic device includes: a housing; an image projector provided on the housing for projecting a portion of an original image to a projection area; and a processing unit. The processing unit causes the image projector to change an image projected to the projection area from a first image corresponding to a first portion of the original image to a second image corresponding to a second portion of the original image according to change information for changing the image projected by the image projector.
摘要:
An epitaxial SiC single crystal substrate including a SiC single crystal wafer whose main surface is a c-plane or a surface that inclines a c-plane with an angle of inclination that is more than 0 degree but less than 10 degrees, and SiC epitaxial film that is formed on the main surface of the SiC single crystal wafer, wherein the dislocation array density of threading edge dislocation arrays that are formed in the SiC epitaxial film is 10 arrays/cm2 or less.
摘要翻译:外延SiC单晶衬底,其包括主表面为c面的SiC单晶晶片或倾斜角度大于0度但小于10度的c面倾斜的表面;以及SiC外延膜 其形成在SiC单晶晶片的主表面上,其中形成在SiC外延膜中的穿线边缘位错阵列的位错阵列密度为10阵列/ cm 2以下。
摘要:
An epitaxial SiC single crystal substrate including a SiC single crystal wafer whose main surface is a c-plane or a surface that inclines a c-plane with an angle of inclination that is more than 0 degree but less than 10 degrees, and SiC epitaxial film that is formed on the main surface of the SiC single crystal wafer, wherein the dislocation array density of threading edge dislocation arrays that are formed in the SiC epitaxial film is 10 arrays/cm2 or less.
摘要翻译:外延SiC单晶衬底,其包括主表面为c面的SiC单晶晶片或倾斜角度大于0度但小于10度的c面倾斜的表面;以及SiC外延膜 其形成在SiC单晶晶片的主表面上,其中形成在SiC外延膜中的穿线边缘位错阵列的位错阵列密度为10阵列/ cm 2以下。