SEMICONDUCTOR FIELD EFFECT TRANSISTOR AND METHOD FOR FABRICATING THE SAME
    11.
    发明申请
    SEMICONDUCTOR FIELD EFFECT TRANSISTOR AND METHOD FOR FABRICATING THE SAME 审中-公开
    半导体场效应晶体管及其制造方法

    公开(公告)号:US20110012110A1

    公开(公告)日:2011-01-20

    申请号:US12293330

    申请日:2007-03-16

    IPC分类号: H01L29/04 H01L21/336

    摘要: A gallium nitride based field effect transistor having good current hysteresis characteristics in which forward gate leakage can be reduced. In a gallium nitride-based field effect transistor (100) having a gate insulation film (108), part or all of a material constituting the gate insulation film (108) is a dielectric material having a relative dielectric constant of 9-22, and a semiconductor crystal layer A (104) in contact with the gate insulation film (108) and a semiconductor crystal layer B (103) in the vicinity of the semiconductor crystal layer A (104) and having a larger electron affinity than the semiconductor crystal layer A (104) constitute a hetero junction. A hafnium oxide such as HfO2, HfAlO, HfAlON or HfSiO is preferably contained, at least partially, in the material constituting the gate insulation film (108).

    摘要翻译: 一种具有良好的电流滞后特性的氮化镓基场效应晶体管,其中可以减少正向栅极泄漏。 在具有栅极绝缘膜(108)的氮化镓系场效应晶体管(100)中,构成栅极绝缘膜(108)的材料的一部分或全部是相对介电常数为9〜22的电介质材料, 与栅极绝缘膜(108)接触的半导体晶体层A(104)和半导体晶体层A(104)附近的半导体晶体层B(103),并且具有比半导体晶体层更大的电子亲和力 A(104)构成异质结。 至少部分地,在构成栅极绝缘膜(108)的材料中含有氧化铪如HfO 2,HfAlO,HfAlON或HfSiO。

    Epitaxial substrate for field effect transistor
    14.
    发明授权
    Epitaxial substrate for field effect transistor 有权
    场效晶体管的外延衬底

    公开(公告)号:US07750351B2

    公开(公告)日:2010-07-06

    申请号:US11386844

    申请日:2006-03-23

    IPC分类号: H01L23/29 H01L21/04

    摘要: An epitaxial crystal for a field effect transistor which has a nitride-based III-V group semiconductor epitaxial crystal grown on a SiC single crystal base substrate having micropipes by use of an epitaxial growth method, wherein at least a part of the micropipes spreading from the SiC single crystal base substrate into the epitaxial crystal terminate between an active layer of the transistor and the SiC single crystal base substrate.

    摘要翻译: 一种用于场效应晶体管的外延晶体,其具有通过使用外延生长法在具有微管的SiC单晶基底板上生长的基于氮化物的III-V族半导体外延晶体,其中至少部分微管从 SiC单晶基底衬底中的外延晶体终止于晶体管的有源层与SiC单晶基底之间。

    Epitaxial substrate for field effect transistor
    16.
    发明申请
    Epitaxial substrate for field effect transistor 有权
    场效晶体管的外延衬底

    公开(公告)号:US20070069253A1

    公开(公告)日:2007-03-29

    申请号:US11386844

    申请日:2006-03-23

    IPC分类号: H01L29/80

    摘要: An epitaxial crystal for a field effect transistor which has a nitride-based III-V group semiconductor epitaxial crystal grown on a SiC single crystal base substrate having micropipes by use of an epitaxial growth method, wherein at least a part of the micropipes spreading from the SiC single crystal base substrate into the epitaxial crystal terminate between an active layer of the transistor and the SiC single crystal base substrate.

    摘要翻译: 一种用于场效应晶体管的外延晶体,其具有通过使用外延生长法在具有微管的SiC单晶基底板上生长的基于氮化物的III-V族半导体外延晶体,其中至少部分微管从 SiC单晶基底衬底中的外延晶体终止于晶体管的有源层与SiC单晶基底之间。

    MOBILE ELECTRONIC DEVICE
    18.
    发明申请
    MOBILE ELECTRONIC DEVICE 有权
    移动电子设备

    公开(公告)号:US20120069308A1

    公开(公告)日:2012-03-22

    申请号:US13322539

    申请日:2010-05-26

    IPC分类号: G03B21/14

    摘要: According to one embodiment, a mobile electronic device includes: a housing; an image projector provided on the housing for projecting a portion of an original image to a projection area; and a processing unit. The processing unit causes the image projector to change an image projected to the projection area from a first image corresponding to a first portion of the original image to a second image corresponding to a second portion of the original image according to change information for changing the image projected by the image projector.

    摘要翻译: 根据一个实施例,移动电子设备包括:壳体; 设置在所述壳体上用于将原始图像的一部分投射到投影区域的图像投影仪; 和处理单元。 处理单元使得图像投影仪根据用于改变图像的改变信息将投影到投影区域的图像从对应于原始图像的第一部分的第一图像改变为对应于原始图像的第二部分的第二图像 由图像投影仪投影。