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公开(公告)号：US11548811B2
公开(公告)日：2023-01-10
申请号：US17359739
申请日：2021-06-28
Applicant: CORNING INCORPORATED , ICFO—The Institute of Photonic Science , Institució Catalana de Recerca i Estudis Avançats (ICREA)
Inventor： Connie Li , Xinyuan Liu , Miriam Marchena Martín-Francés , Valerio Pruneri , Wageesha Senaratne , Zhen Song , Kamal Kishore Soni
IPC: C03C17/22 , C01B32/186 , C01B32/182
Abstract: Disclosed herein are graphene coatings characterized by a porous, three-dimensional, spherical structure having a hollow core, along with methods for forming such graphene coatings on glasses, glass-ceramics, ceramics, and crystalline materials. Such coatings can be further coated with organic or inorganic layers and are useful in chemical and electronic applications.
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公开(公告)号：US20160261086A1
公开(公告)日：2016-09-08
申请号：US15057532
申请日：2016-03-01
Applicant: CORNING INCORPORATED
Inventor： Valerio Pruneri , Renwen Yu , Francisco Javier Garcia de Abajo
IPC: H01S3/106
CPC classification number: H01S3/1062 , G02F1/21 , G02F2001/213 , G02F2202/36 , G02F2203/15 , H01S3/106 , H01S3/1118
Abstract: Described herein are optical devices based on two-dimensional materials and methods for making such devices. In particular, the articles described herein are useful in the control and modulation of light via graphene mono- or multilayers. methods for improved transfer of graphene from formation substrates to target substrates. The improved articles provide exceedingly high modulation depths in vis-NIR light transmission, with small insertion losses, thus revealing the potential of graphene for fast electro-optics within such a technologically important range of optical frequencies.
Abstract translation: 这里描述的是基于二维材料的光学装置和用于制造这种装置的方法。 特别地，本文描述的制品可用于通过石墨烯单层或多层的光的控制和调制。 用于改善石墨烯从地层衬底转移到目标衬底的方法。 改进的物品在vis-NIR光传输中提供了非常高的调制深度，具有小的插入损耗，从而在这样的技术上重要的光学频率范围内揭示了用于快速电光学的石墨烯的潜力。
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公开(公告)号：US11994651B2
公开(公告)日：2024-05-28
申请号：US17601505
申请日：2020-03-31
Applicant: Corning Incorporated , FUNDACIÓ INSTITUT DE CIÈNCIES FOTÒNIQUES , INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS
Inventor： Prantik Mazumder , Valerio Pruneri , Juan Rombaut
CPC classification number: G02B1/118 , C03C17/32 , C03C17/3639 , C03C17/3649 , C03C17/3657 , C03C17/38 , C09D5/006 , C09D179/08 , C09K13/04 , C03C2217/73 , C03C2218/156 , C03C2218/33
Abstract: A method for fabricating a structured surface, includes: providing a transparent substrate; disposing a dewettable film over the substrate; annealing the dewettable film to form a plurality of islands; forming a coating over the plurality of islands; and etching the plurality of islands to form a structured array of surface features in the coating. A structured polymer and/or structured glass, includes: a structured array of surface features, such that the structured array of surface features has at least one dimension in a range of 0.5 nm to 5000 nm.
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公开(公告)号：US20220179126A1
公开(公告)日：2022-06-09
申请号：US17601505
申请日：2020-03-31
Applicant: Corning Incorporated , FUNDACIÓ INSTITUT DE CIÈNCIES FOTÒNIQUES , INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS
Inventor： Prantik Mazumder , Valerio Pruneri , Juan Rombaut
Abstract: A method for fabricating a structured surface, includes: providing a transparent substrate; disposing a dewettable film over the substrate; annealing the dewettable film to form a plurality of islands; forming a coating over the plurality of islands; and etching the plurality of islands to form a structured array of surface features in the coating. A structured polymer and/or structured glass, includes: a structured array of surface features, such that the structured array of surface features has at least one dimension in a range of 0.5 nm to 5000 nm.
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公开(公告)号：US20210323860A1
公开(公告)日：2021-10-21
申请号：US17359739
申请日：2021-06-28
Applicant: CORNING INCORPORATED , ICFO- The Institute of Photonic Science , Institució Catalana de Recerca i Estudis Avançats (ICREA)
Inventor： Connie Li , Xinyuan Liu , Miriam Marchena Martín-Francés , Valerio Pruneri , Wageesha Senaratne , Zhen Song , Kamal Kishore Soni
IPC: C03C17/22 , C01B32/186
Abstract: Disclosed herein are graphene coatings characterized by a porous, three-dimensional, spherical structure having a hollow core, along with methods for forming such graphene coatings on glasses, glass-ceramics, ceramics, and crystalline materials. Such coatings can be further coated with organic or inorganic layers and are useful in chemical and electronic applications.
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Patent Agency Ranking
16.发明申请SILICON AND SILICA NANOSTRUCTURES AND METHOD OF MAKING SILICON AND SILICA NANOSTRUCTURES 审中-公开硅和二氧化硅纳米结构和制备硅和二氧化硅纳米结构的方法公开(公告)号：US20160002096A1
公开(公告)日：2016-01-07
申请号：US14750047
申请日：2015-06-25
Applicant: Corning Incorporated , ICFO
Inventor： Albert Carrilero , Prantik Mazumder , Valerio Pruneri
CPC classification number: C03C15/00 , C01B33/12 , C01P2004/13 , C30B11/12 , C30B29/06 , C30B29/18 , C30B29/60 , C30B29/602
Abstract: Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
Abstract translation: 本文提供了形成一个或多个硅纳米结构的方法，例如硅纳米管和含二氧化硅的玻璃基板。 作为用于制备硅纳米结构的方法的结果，含二氧化硅的玻璃基底包括一个或多个纳米柱，并且一个或多个硅纳米结构从含二氧化硅玻璃基底的纳米柱延伸。 硅纳米结构包括纳米管和任选的纳米线。 另一方面是在含二氧化硅的玻璃基板上制备硅纳米结构的方法。 该方法包括在含二氧化硅的玻璃衬底上提供一种或多种金属纳米颗粒，然后在适合于形成一种或多种硅纳米结构的条件下进行含二氧化硅的玻璃衬底的反应离子蚀刻。
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公开(公告)号：US20240327275A1
公开(公告)日：2024-10-03
申请号：US18293463
申请日：2022-07-29
Applicant: CORNING INCORPORATED , Fundació Institut de Ciències Fotòniques (ICFO) , Institució Catalana de Recerca i Estudis Avançats (ICREA)
Inventor： Indrani Bhattacharyya , Miriam Marchena Martín-Francés , Prantik Mazumder , Valerio Pruneri
CPC classification number: C03C17/3441 , C03C21/002 , C03C2217/28
Abstract: Provided herein is a glass article comprising: an ion-exchanged glass layer comprising a first major surface and a second major surface; and at least one negatively doped graphene layer having a first major surface and a second major surface; the negatively doped graphene layer first major surface located opposite at least a portion of at least one of the first major surface and the second major surface of the ion-exchanged glass layer, the negatively doped graphene layer having a carrier density of at least about 1013 cm−2. Also provided herein are devices comprising the glass article and methods of making the glass article.
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公开(公告)号：US20210347689A1
公开(公告)日：2021-11-11
申请号：US17285322
申请日：2019-10-09
Applicant: CORNING INCORPORATED , THE INSTITUTE OF PHOTONIC SCIENCES
Inventor： Miriam Marchena Martín-Francés , Prantik Mazumder , Valerio Pruneri
IPC: C03C23/00 , C01B32/194
Abstract: A method of forming a graphene device includes: providing a glass substrate with a blocking layer disposed thereon to form a stack; providing a first electrode and a second electrode; increasing the temperature of the stack to at least 100° C.; applying an external electric field (VP) to the first electrode such that at least one metal ion of the glass substrate migrates toward the first electrode to create a depletion region in the glass substrate adjacent the second electrode; decreasing the temperature of the stack to room temperature while applying the external electric field to the first electrode; and after reaching room temperature, setting the external electric field to zero to create a frozen voltage region adjacent the second electrode.
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19.发明申请公开(公告)号：US20210095371A1
公开(公告)日：2021-04-01
申请号：US17038991
申请日：2020-09-30
Applicant: Corning Incorporated , ICFO - The Institute of Photonic Sciences , INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS
Inventor： Rinu Maniyara , Prantik Mazumder , Valerio Pruneri
Abstract: A method is provided for manufacturing an article comprising a transparent conductive material, wherein a transparent conductive material (e.g., indium tin oxide) is deposited onto a substrate (e.g., fused silica) by physical vapor deposition, then annealed at high temperature (i.e., at least 450° C.) in a nitrogen atmosphere. The resulting article comprises a transparent conductive material that reduces the trade-off between low resistivity (or sheet resistance) and high near infrared transmission. For example, the transparent conductive material thus obtained may possess a transmission of at least 80% at 1550 nm while having a resistivity of less than or equal to about 5×10−4 Ohm-cm and a Haacke figure of merit of at least about 40×10−4Ω−1. Also provided is a method for modulating the resistivity and/or the near infrared transmission of a transparent conductive material by annealing the transparent conductive material at a high temperature under nitrogen atmosphere.
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20.发明申请公开(公告)号：US20200290921A1
公开(公告)日：2020-09-17
申请号：US16891606
申请日：2020-06-03
Applicant: CORNING INCORPORATED , ICFO
Inventor： Albert Carrilero , Prantik Mazumder , Valerio Pruneri
Abstract: Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
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