摘要:
A method for forming a fuse for integrated circuits and a fuse produced therefrom is disclosed. The fuse (10) includes a substrate (12) having thick oxide layers (14) with a gap (16) formed therebetween. A second oxide layer (20) is grown onto an N+ region (18). At the intersection between oxide layers (20, 14), a sublithographic area is exposed and a dielectric layer (24) is formed therein. This structure is capable of reducing the capacitance between a polysilicon layer (26) formed thereon and the N+ diffusion region (18).
摘要:
A metal-to-polysilicon capacitor, a floating-gate transistor containing such a capacitor, and a method for making the same is disclosed. The bottom plate of the capacitor is formed over a field oxide structure, and the capacitor dielectric is deposited thereover. A first metal layer, such as titanium nitride or a titanium-tungsten alloy, is formed over the capacitor dielectric, and is patterned and etched to define the top plate of the capacitor and, accordingly, the capacitor size. Multilevel dielectric is formed thereover, and a contact via to the top plate is etched therethrough. Metallization is sputtered overall, to make contact to the top plate and elsewhere in the circuit.
摘要:
Pulse-width-modulating class D amplifier with an H-bridge output stage, and method of operating the same. in which output stage dead-time is compensated. Offset logic circuitry detects various dead-time-related conditions at push-pull output drivers, and generates an offset signal applied to the amplified differential input signal, to adjust the time at which the voltage at differential signal lines crosses a ramp reference waveform. The offset signal can correspond to the duration of a disturbance (dead-time at one driver in combination with an active signal at the active driver), or the sum of that disturbance duration with a dead-time at the active driver. The offset signal is generated by charging a capacitor for the duration of this disturbance, or disturbance plus dead-time. According to another approach, error is reduced by charging a capacitor for each transition of the signal for a duration of the dead-time of the active driver. Total harmonic distortion is reduced without requiring increased circuit complexity and without shortening the dead-time to unsafe margins.
摘要:
A circuit and method for determining overcurrent in a FET detects an output voltage of the FET in both a positive and negative polarity. The related positive or negative currents through the FET can be measured to determine whether an overcurrent condition exists. By measuring positive and negative currents in the FET, the overcurrent detector can obtain twice as much information as when measuring a positive current alone, and can respond more readily to overcurrent conditions. The overcurrent detector avoids the constraints typically observed in cycle-by-cycle PWM control with single polarity Vds sensing, while permitting a relaxation in the timing requirements for current sensing. A spike suppression circuit also contributes to longer sensing intervals.
摘要:
A system and method is provided for driving an output transistor. The system and method employ a sense control to adjust a drive strength associated with driving the output transistor. The sense control measures an output parameter of the transistor, and adjusts the drive strength based on the measured parameter. The drive strength can be based on a selected driver of a plurality of driver devices with varying drive strengths or selected output devices of a driver of a plurality of output devices of varying drive strengths. The drive strength of the driver devices or output devices can be varied by varying the channel widths of output drive devices selectively coupled to a drive terminal (e.g., gate, base) of the output transistor.
摘要:
The invention comprises a method of forming an integrated circuit, the method comprising: (1) forming a first dielectric layer disposed outwardly from a semiconductor substrate; (2) forming a first intermediate structure outwardly from the a dielectric layer, the first intermediate structure comprising a floating gate layer disposed outwardly from the first dielectric layer, a second dielectric layer disposed outwardly from the floating gate layer, and a first polysilicon layer disposed outwardly from the second dielectric layer; (3) removing regions of the first intermediate structure to form at least one gate stack disposed outwardly from the first dielectric layer; and (4) forming at least one dielectric isolation region after the formation of the gate stacks, wherein the at least one dielectric isolation region is disposed between two gate stacks.
摘要:
The image sensor has improvements for suppressing cross talk without degrading red light response. This is accomplished by implanting a deep p+ layer 42 under blue and green pixels 24 and 22 but not under red pixels 20 in a standard RGB pattern color filter array.
摘要:
A method for use in erasing data stored in a memory cell includes asserting a voltage differential across a tank region and a gate region of the memory cell, wherein the tank region has a first conductivity type and the tank region is located within a well region of a second conductivity type. The method also includes floating the voltage level of a source region and a drain region of the memory cell, wherein the source region and the drain region are located within the tank region and have the second conductivity type. The method additionally includes discharging a charge stored in the drain region by electrically connecting the source region to an electric potential lower than the potential of the drain region and electrically connecting the well region and the tank region to a potential lower than their existing potentials.
摘要:
The invention comprises a method of forming an integrated circuit, the method comprising: (1) forming a first dielectric layer disposed outwardly from a semiconductor substrate; (2) forming a first intermediate structure outwardly from the a dielectric layer, the first intermediate structure comprising a floating gate layer disposed outwardly from the first dielectric layer, a second dielectric layer disposed outwardly from the floating gate layer, and a first polysilicon layer disposed outwardly from the second dielectric layer; (3) removing regions of the first intermediate structure to form at least one gate stack disposed outwardly from the first dielectric layer; and (4) forming at least one dielectric isolation region after the formation of the gate stacks, wherein the at least one dielectric isolation region is disposed between two gate stacks.
摘要:
A non-volatile split-gate memory cell 8 which can be programmed with only a five volt power supply and is fabricated using standard transistor processing methods, comprises a semiconductor substrate 10 with a source 12 and a drain 14 region separated by a channel region 16. A conductive floating gate 18 is formed over a portion 16a of the channel region 16 and separated by a FAMOS oxide 20. A conductive control gate 22 is formed over but electrically insulated from the floating gate 18 and over a second portion 16b of the channel region 16. The control gate 22 is separated from the second portion of the channel 16b by a pass oxide 26 which is thicker than the FAMOS oxide 20. Other embodiments and processes are also disclosed.