Systems and methods of automatic boundary control for semiconductor processes
    15.
    发明授权
    Systems and methods of automatic boundary control for semiconductor processes 有权
    半导体工艺自动边界控制系统和方法

    公开(公告)号:US09250619B2

    公开(公告)日:2016-02-02

    申请号:US13311601

    申请日:2011-12-06

    IPC分类号: G06F19/00 G05B19/18 H01L21/66

    摘要: A system and method of automatically calculating boundaries for a semiconductor fabrication process. The method includes selecting a first parameter for monitoring during a semiconductor fabrication process. A first set of values for the first parameter are received and a group value of the first set is determined. Each value in the first set of values is normalized. A first weighting factor is selected based on a number of values in the first set. The embodiment also includes generating a first and a second boundary value as a function of the weighting factor, the first set normalized values and the group value of the first set and applying the first and second boundary values to control the semiconductor fabrication process.

    摘要翻译: 一种自动计算半导体制造工艺边界的系统和方法。 该方法包括在半导体制造过程中选择用于监测的第一参数。 接收第一参数的第一组值,并确定第一组的组值。 第一组值中的每个值都被归一化。 基于第一组中的值的数量来选择第一加权因子。 该实施例还包括根据加权因子,第一集合归一化值和第一组的组值产生第一和第二边界值,并施加第一和第二边界值以控制半导体制造过程。

    Processing exception handling
    16.
    发明授权
    Processing exception handling 有权
    处理异常处理

    公开(公告)号:US08549012B2

    公开(公告)日:2013-10-01

    申请号:US12778855

    申请日:2010-05-12

    IPC分类号: G06F7/00 G06F17/30

    摘要: In accordance with an embodiment, a method for exception handling comprises accessing an exception type for an exception, filtering historical data based on at least one defined criterion to provide a data train comprising data sets, assigning a weight to each data set, and providing a current control parameter. The data sets each comprise a historical condition and a historical control parameter, and the weight assigned to each data set is based on each historical condition. The current control parameter is provided using the weight and the historical control parameter for each data set.

    摘要翻译: 根据实施例,用于异常处理的方法包括访问异常的异常类型,基于至少一个定义的标准过滤历史数据,以提供包括数据集的数据队列,为每个数据集分配权重,以及提供 电流控制参数。 数据集各自包含历史条件和历史控制参数,并且分配给每个数据集的权重基于每个历史条件。 使用每个数据集的权重和历史控制参数提供当前的控制参数。

    APC Model Extension Using Existing APC Models
    17.
    发明申请
    APC Model Extension Using Existing APC Models 有权
    APC型号扩展使用现有的APC型号

    公开(公告)号:US20110301736A1

    公开(公告)日:2011-12-08

    申请号:US12793307

    申请日:2010-06-03

    IPC分类号: G06F17/50

    CPC分类号: G05B17/02 H01L22/20

    摘要: A method of extending advanced process control (APC) models includes constructing an APC model table including APC model parameters of a plurality of products and a plurality of work stations. The APC model table includes empty cells and cells filled with existing APC model parameters. Average APC model parameters of the existing APC model parameters are calculated, and filled into the empty cells as initial values. An iterative calculation is performed to update the empty cells with updated values.

    摘要翻译: 扩展先进过程控制(APC)模型的方法包括构建包括多个产品的APC模型参数和多个工作站的APC模型表。 APC模型表包括空单元格和填充有现有APC模型参数的单元格。 计算现有APC模型参数的平均APC模型参数,并作为初始值填充到空单元格中。 执行迭代计算以更新值更新空单元格。

    E-CHUCK WITH AUTOMATED CLAMPED FORCE ADJUSTMENT AND CALIBRATION
    18.
    发明申请
    E-CHUCK WITH AUTOMATED CLAMPED FORCE ADJUSTMENT AND CALIBRATION 有权
    具有自动钳位力调整和校准的电动自行车

    公开(公告)号:US20110042006A1

    公开(公告)日:2011-02-24

    申请号:US12938610

    申请日:2010-11-03

    摘要: The present disclosure describes a semiconductor manufacturing apparatus. The apparatus includes a processing chamber designed to perform a process to a wafer; an electrostatic chuck (E-chuck) configured in the processing chamber and designed to secure the wafer, wherein the E-chuck includes an electrode and a dielectric feature formed on the electrode; a tuning structure designed to hold the E-chuck to the processing chamber by clamping forces, wherein the tuning structure is operable to dynamically adjust the clamping forces; a sensor integrated with the E-chuck and sensitive to the clamping forces; and a process control module for controlling the tuning structure to adjust the clamping forces based on pre-measurement data from the wafer and sensor data from the sensor.

    摘要翻译: 本公开描述了一种半导体制造装置。 该设备包括设计成对晶片执行处理的处理室; 配置在所述处理室中并设计成固定所述晶片的静电卡盘(E卡盘),其中所述E卡盘包括形成在所述电极上的电极和电介质特征; 调谐结构,其被设计成通过夹紧力将所述E卡盘保持在所述处理室中,其中所述调谐结构可操作以动态地调节所述夹紧力; 与E型卡盘集成并对夹紧力敏感的传感器; 以及过程控制模块,用于基于来自晶片的预测量数据和来自传感器的传感器数据来控制调谐结构以调整夹紧力。

    Physical failure analysis guiding methods
    20.
    发明授权
    Physical failure analysis guiding methods 有权
    物理故障分析指导方法

    公开(公告)号:US08205173B2

    公开(公告)日:2012-06-19

    申请号:US12818003

    申请日:2010-06-17

    CPC分类号: G01R31/2894

    摘要: A method includes providing a plurality of failure dies, and performing a chip probing on the plurality of failure dies to generate a data log comprising electrical characteristics of the plurality of failure dies. An automatic net tracing is performed to trace failure candidate nodes in the failure dies. A failure layer analysis is performed on results obtained from the automatic net tracing. Physical failure analysis (PFA) samples are selected from the plurality of failure dies using results obtained in the step of performing the failure layer analysis.

    摘要翻译: 一种方法包括提供多个故障管芯,并对多个故障管芯进行芯片探测以产生包括多个故障管芯的电气特性的数据记录。 执行自动网络跟踪以跟踪故障模块中的故障候选节点。 对从自动网络跟踪获得的结果执行故障层分析。 使用在执行故障层分析的步骤中获得的结果从多个故障模具中选择物理故障分析(PFA)样本。