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    PURIFICATION DEVICE, PURIFICATION METHOD, MANUFACTURING DEVICE, MANUFACTURING METHOD OF CHEMICAL LIQUID, CONTAINER, AND CHEMICAL LIQUID STORAGE CONTAINER
    11.
    发明申请
    PURIFICATION DEVICE, PURIFICATION METHOD, MANUFACTURING DEVICE, MANUFACTURING METHOD OF CHEMICAL LIQUID, CONTAINER, AND CHEMICAL LIQUID STORAGE CONTAINER 审中-公开

    公开(公告)号：US20190060782A1

    公开(公告)日：2019-02-28

    申请号：US16170100

    申请日：2018-10-25

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya SHIMIZU ,  Tetsuya KAMIMURA

    IPC: B01D3/32 ,  B65D25/14 ,  C07C67/54 ,  C07C29/84

    Abstract: An object of the present invention is to provide a purification device which makes it possible to obtain a solvent with a reduced impurity content and a raw material of the solvent. Another object of the present invention is to provide a purification method, a manufacturing device, and a manufacturing method of a chemical liquid. Still another object of the present invention is to provide a container which makes it difficult for an impurity content in a chemical liquid to increase even in a case where the chemical liquid is filled into the container and stored for a predetermined period of time. Yet another object of the present invention is to provide a chemical liquid storage container. The purification device of the present invention is a purification device including a distillation column for purifying a chemical liquid, in which an interior wall of the distillation column is coated with or formed of at least one kind of material selected from the group consisting of a fluororesin and an electropolished metal material, the metal material contains at least one kind of metal selected from the group consisting of chromium and nickel, and a total content of the chromium and the nickel is greater than 25% by mass with respect to a total mass of the metal material.

    TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, STORAGE CONTAINER STORING TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
    12.
    发明申请
    TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, STORAGE CONTAINER STORING TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE 审中-公开

    公开(公告)号：US20190025703A1

    公开(公告)日：2019-01-24

    申请号：US16143497

    申请日：2018-09-27

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya SHIMIZU ,  Tetsuya KAMIMURA

    IPC: G03F7/32 ,  H01L21/308 ,  H01L21/027

    Abstract: An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor with which the occurrence of defects such as particles is suppressed such that a fine resist pattern or a fine semiconductor element can be manufactured, and a storage container storing the treatment liquid for manufacturing a semiconductor. In addition, another object of the present invention is to provide a pattern forming method using the treatment liquid for manufacturing a semiconductor and a method of manufacturing an electronic device.A storage container according to an embodiment of the present invention includes a storage portion that stores a treatment liquid for manufacturing a semiconductor. The treatment liquid for manufacturing a semiconductor includes one kind or two or more kinds of metal atoms selected from the group consisting of metal species including Al, Ca, Cr, Co, Cu, Fe, Pb, Li, Mg, Mn, Ni, K, Ag, Na, and Zn, and a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.

    METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    14.
    发明申请
    METHOD FOR MANUFACTURING ELECTRONIC DEVICE 有权

    公开(公告)号：US20220121123A1

    公开(公告)日：2022-04-21

    申请号：US17561999

    申请日：2021-12-27

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya KAMIMURA ,  Tetsuya SHIMIZU ,  Satoru MURAYAMA

    IPC: G03F7/32 ,  G03F7/40 ,  G03F7/039 ,  G03F7/027 ,  G03F7/20 ,  H01L21/02

    Abstract: A method for manufacturing an electronic device, the method including performing a treatment using a treatment liquid for manufacturing a semiconductor, the treatment liquid for manufacturing a semiconductor includes: a quaternary ammonium compound represented by the following Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; water; and one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn. A ratio T1 of a total mass of the metal atoms to the sum of a total mass of the additive and the total mass of the metal atoms is in a range from 1 ppt to 1 ppm.

    MEMBER, CONTAINER, CHEMICAL LIQUID STORAGE BODY, REACTOR, DISTILLATION COLUMN, FILTER UNIT, STORAGE TANK, PIPE LINE, AND CHEMICAL LIQUID MANUFACTURING METHOD
    15.
    发明申请
    MEMBER, CONTAINER, CHEMICAL LIQUID STORAGE BODY, REACTOR, DISTILLATION COLUMN, FILTER UNIT, STORAGE TANK, PIPE LINE, AND CHEMICAL LIQUID MANUFACTURING METHOD 有权

    公开(公告)号：US20210130084A1

    公开(公告)日：2021-05-06

    申请号：US17141335

    申请日：2021-01-05

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya SHIMIZU ,  Tetsuya KAMIMURA ,  Satomi TAKAHASHI ,  Tadashi OOMATSU

    IPC: B65D85/84 ,  B01D3/00 ,  B01D39/20 ,  B65D25/14 ,  C25F3/24 ,  C11D7/50

    Abstract: The present invention provides a member which makes is possible to obtain excellent residue defect inhibition properties and excellent bridge defect inhibition properties of a chemical liquid in a case where the member is brought into contact with the chemical liquid. The present invention also provides a container, a chemical liquid storage body, a reactor, a distillation column, a filter unit, a storage tank, a pipe line, and a chemical liquid manufacturing method. The member according to an embodiment of the present invention is a member that will be brought into contact with a chemical liquid. A surface of the member is constituted with stainless steel containing chromium atoms and iron atoms. In a case where an atomic ratio of the chromium atoms to the iron atoms is measured from the surface of the member to a position 10 nm below the surface in a depth direction, a maximum value of the atomic ratio is found in a region extending 3 nm from the surface of the member in the depth direction. The maximum value is 0.5 to 3.0, and an average surface roughness of the surface of the member is equal to or lower than 10 nm.

    FILTERING DEVICE, PURIFICATION DEVICE, CHEMICAL LIQUID MANUFACTURING DEVICE, FILTERED SUBSTANCE TO BE PURIFIED, CHEMICAL LIQUID, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION
    17.
    发明申请
    FILTERING DEVICE, PURIFICATION DEVICE, CHEMICAL LIQUID MANUFACTURING DEVICE, FILTERED SUBSTANCE TO BE PURIFIED, CHEMICAL LIQUID, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开

    公开(公告)号：US20200147528A1

    公开(公告)日：2020-05-14

    申请号：US16745493

    申请日：2020-01-17

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya SHIMIZU ,  Tetsuya KAMIMURA

    IPC: B01D29/58 ,  B01D29/00 ,  B01D29/23 ,  B01D39/16 ,  B01D63/06 ,  B01D61/02 ,  B01D69/02 ,  B01D69/04

    Abstract: An object of the present invention is to provide a filtering device which makes it possible to obtain a chemical liquid having excellent performance and enables filter media to have sufficiently long pot life. Another object of the present invention is to provide a purification device, a chemical liquid manufacturing device, a filtered substance to be purified, a chemical liquid, and an actinic ray-sensitive or radiation-sensitive resin composition. A filtering device according to an embodiment of the present invention has a first filter unit including a first filter, which satisfies at least one condition selected from the group consisting of following conditions 1 to 3, and a housing accommodating the first filter and a second filter unit including a second filter different from the first filter and a housing accommodating the second filter, in which the first filter unit and the second filter unit are independently disposed in a pipe line through which a substance to be purified is supplied.Condition 1: the filter has a filter medium including two or more layers containing materials different from each other.Condition 2: the filter has a filter medium including two or more layers having different pore structures.Condition 3: the filter has a filter medium including one layer in which different materials are mixed together.

    TREATMENT LIQUID AND TREATMENT LIQUID HOUSING BODY
    19.
    发明公开
    TREATMENT LIQUID AND TREATMENT LIQUID HOUSING BODY 审中-公开

    公开(公告)号：US20240264532A1

    公开(公告)日：2024-08-08

    申请号：US18603841

    申请日：2024-03-13

    Applicant: FUJIFILM Corporation

    Inventor： Tetsuya SHIMIZU ,  Michihiro Shirakawa ,  Satomi Takahashi

    IPC: G03F7/32 ,  G03F7/20

    CPC classification number: G03F7/325 ,  G03F7/2004

    Abstract: An object of the present invention is to provide a treatment liquid that, when used as a developer or a rinsing liquid, is less likely to cause defects when applied onto a surface to be coated and, in addition, is less likely to cause defects on a surface to be coated also when used after being housed in a container whose inner wall surface is made of metal. Another object of the present invention is to provide a treatment liquid housing body. A treatment liquid according to the present invention is a treatment liquid including an aliphatic hydrocarbon solvent, an acid component that is at least one selected from the group consisting of carboxylic acids having a hydrocarbon group having 1 to 3 carbon atoms and formic acid, and a metallic impurity including a metallic element that is at least one selected from the group consisting of Fe, Ni, and Cr. The mass ratio of the content of the metallic element to the content of the acid component is 1.0×10−9 to 3.0×10−5.

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