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    PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVELOPMENT
    15.
    发明申请
    PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVELOPMENT 有权

    公开(公告)号：US20210200098A1

    公开(公告)日：2021-07-01

    申请号：US17200912

    申请日：2021-03-15

    Applicant: FUJIFILM Corporation

    Inventor： Wataru NIHASHI ,  Michihiro SHIRAKAWA

    IPC: G03F7/32 ,  G03F7/004 ,  G03F7/039

    Abstract: A pattern forming method includes: preparing a laminate having a substrate, an inorganic base layer, and a resist layer; exposing the resist layer; and developing the laminate using a developer including an organic solvent to form a negative tone pattern, in which a surface energy γA of the resist layer and a surface energy γB of the inorganic base layer after irradiation of the laminate with ultraviolet rays having a wavelength of 13.5 nm from the resist layer side with an integrated light quantity of 40 mJ/cm2, followed by heating of the laminate at 110° C. for 60 seconds are 60 mJ/m2 or more and 55 mJ/m2 or more, respectively, and a difference γAB in surface energies that is defined by Formula (A) is 5.0 mJ/m2 or less: γAB=γA−γB (Formula (A)).

    PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE
    16.
    发明申请
    PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE 审中-公开

    公开(公告)号：US20180181003A1

    公开(公告)日：2018-06-28

    申请号：US15904438

    申请日：2018-02-26

    Applicant: FUJIFILM Corporation

    Inventor： Wataru NIHASHI ,  Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Kei YAMAMOTO

    IPC: G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
    19.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，丙烯酸敏感性或辐射敏感性树脂组合物，耐蚀膜，使用其的电子器件的制造方法和电子设备

    公开(公告)号：US20150147688A1

    公开(公告)日：2015-05-28

    申请号：US14603811

    申请日：2015-01-23

    Applicant: FUJIFILM Corporation

    Inventor： Natsumi YOKOKAWA ,  Shuji HIRANO ,  Wataru NIHASHI ,  Hiroo TAKIZAWA

    IPC: G03F7/038 ,  G03F7/30

    CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/325

    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).

    Abstract translation: 提供一种图案形成方法，其包括（1）通过使用含有（P）具有由所述具体式表示的重复单元的树脂的光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（2）a 通过使用光化射线或辐射使膜曝光的步骤，以及（3）通过使用含有机溶剂的显影剂显影曝光的薄膜以形成负图案的步骤，其中由特定式表示的重复单元的含量 基于树脂（P）中的所有重复单元为25摩尔％以上。

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