公开(公告)号：US08945810B2

公开(公告)日：2015-02-03

申请号：US13173210

申请日：2011-06-30

申请人： Fumiyuki Nishiyama ,  Hiromi Kanda

发明人： Fumiyuki Nishiyama ,  Hiromi Kanda

IPC分类号： G03F7/039 ,  G03F7/38 ,  G03F7/004 ,  G03F7/20 ,  G03F7/075

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A positive resist composition comprises: (A) a resin that has a repeating unit represented by general formula (a1) and increases its solubility in an alkali developer by action of an acid; (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation; and (C) a resin that has at least one of a fluorine atom and a silicon atom and has a group selected from the group consisting of (x), (y) and (z); and (D) a solvent: (x) an alkali-soluble group; (y) a group capable that decomposes by action of an alkali developer to undergo an increase in a solubility of the resin (C) in an alkali developer; and (z) a group that decomposes by action of an acid, wherein R represents a hydrogen atom or a methyl group, Rxa represents an alkyl group or a cycloalkyl group, and n represents an integer of 1 to 8.

摘要翻译： 正型抗蚀剂组合物包含：（A）具有由通式（a1）表示的重复单元并通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; 和（C）具有氟原子和硅原子中的至少一个并且具有选自（x），（y）和（z）的基团的树脂; 和（D）溶剂：（x）碱溶性基团; （y）能够通过碱性显影剂的作用分解以使树脂（C）在碱性显影剂中的溶解度增加的基团; 和（z）通过酸的作用分解的基团，其中R表示氢原子或甲基，Rxa表示烷基或环烷基，n表示1至8的整数。

公开(公告)号：US08753792B2

公开(公告)日：2014-06-17

申请号：US12915710

申请日：2010-10-29

申请人： Kunihiko Kodama ,  Fumiyuki Nishiyama

发明人： Kunihiko Kodama ,  Fumiyuki Nishiyama

IPC分类号： G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  G03F7/26

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395

摘要： A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

摘要翻译： 一种正型感光性组合物，其包含：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B1）在碱性显影剂中的溶解度在酸的作用下增加的树脂; 和（B2）具有选自（a）碱溶性基团和（b）能够在碱的作用下分解以产生碱溶性基团的基团中的至少一种的树脂，并且树脂（B2 ）没有能够在酸的作用下分解的基团; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US07465528B2

公开(公告)日：2008-12-16

申请号：US11581407

申请日：2006-10-17

申请人： Fumiyuki Nishiyama ,  Kunihiko Kodama

发明人： Fumiyuki Nishiyama ,  Kunihiko Kodama

IPC分类号： G03F7/039

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/122 ,  Y10S430/123

摘要： A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation, and (C) a solvent.

摘要翻译： 一种正性感光性组合物，其包含（A）含有具有双金刚烷结构的重复单元并能够在酸的作用下分解以提高在碱性显影剂中的溶解度的树脂的树脂，（B）在照射时能够产生特定有机酸的化合物 具有光化射线或辐射，和（C）溶剂。

公开(公告)号：US20060292490A1

公开(公告)日：2006-12-28

申请号：US11475128

申请日：2006-06-27

申请人： Kunihiko Kodama ,  Fumiyuki Nishiyama

发明人： Kunihiko Kodama ,  Fumiyuki Nishiyama

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395

摘要： A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

摘要翻译： 一种正型感光性组合物，其包含：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B1）在碱性显影剂中的溶解度在酸的作用下增加的树脂; 和（B2）具有选自（a）碱溶性基团和（b）能够在碱的作用下分解以产生碱溶性基团的基团中的至少一种的树脂，并且树脂（B2 ）没有能够在酸的作用下分解的基团; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US06727033B2

公开(公告)日：2004-04-27

申请号：US10285502

申请日：2002-11-01

申请人： Fumiyuki Nishiyama ,  Toru Fujimori

发明人： Fumiyuki Nishiyama ,  Toru Fujimori

IPC分类号： G03F7039

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/106

摘要： A positive resist composition comprising a resin (A), which is decomposed by the action of an acid to increase solubility in an alkali developing solution, containing a structural unit including a group represented by formula (X) defined in the specification and/or a resin (B), which is decomposed by the action of an acid to increase solubility in an alkali developing solution, containing a structural unit including a group represented by formula (Y) defined in the specification, and a resin (C), which is decomposed by the action of an acid to increase solubility in an alkali developing solution, containing a structural unit including a group represented by formula (Q) defined in the specification; and a compound that generates an acid upon irradiation of an actinic ray or radiation.

摘要翻译： 一种正型抗蚀剂组合物，其包含通过酸的作用分解以增加在碱性显影液中的溶解度的树脂（A），其含有包含由说明书中定义的式（X）表示的基团的结构单元和/或 树脂（B），其通过酸的作用分解以提高在碱性显影液中的溶解度，其含有包含本说明书中定义的由式（Y）表示的基团的结构单元和树脂（C），其是 通过酸的作用分解以提高在碱性显影液中的溶解度，其含有包含由说明书中定义的式（Q）表示的基团的结构单元; 以及在光化射线或辐射照射时产生酸的化合物。

公开(公告)号：US08012665B2

公开(公告)日：2011-09-06

申请号：US11475128

申请日：2006-06-27

申请人： Kunihiko Kodama ,  Fumiyuki Nishiyama

发明人： Kunihiko Kodama ,  Fumiyuki Nishiyama

IPC分类号： G03C1/00 ,  G03F1/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395

摘要： A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

摘要翻译： 一种正型感光性组合物，其包含：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B1）在碱性显影剂中的溶解度在酸的作用下增加的树脂; 和（B2）具有选自（a）碱溶性基团和（b）能够在碱的作用下分解以产生碱溶性基团的基团中的至少一种的树脂，并且树脂（B2 ）没有能够在酸的作用下分解的基团; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US20060078823A1

公开(公告)日：2006-04-13

申请号：US11245136

申请日：2005-10-07

申请人： Hiromi Kanda ,  Fumiyuki Nishiyama

发明人： Hiromi Kanda ,  Fumiyuki Nishiyama

IPC分类号： G03C1/76

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/2041 ,  Y10S430/108

摘要： A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.

摘要翻译： 一种正型抗蚀剂组合物，其包含（A）具有单环或多环脂环族烃结构且能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，（B）在用一种处理时能够产生酸的化合物 的光化射线和辐射，以及（F）含有30〜60质量％的氟原子的比表面活性剂和使用其的图案形成方法。

公开(公告)号：US06537718B2

公开(公告)日：2003-03-25

申请号：US09742368

申请日：2000-12-22

申请人： Fumiyuki Nishiyama ,  Toru Fujimori

发明人： Fumiyuki Nishiyama ,  Toru Fujimori

IPC分类号： G03F7039

CPC分类号： G03F7/0045 ,  G03F7/0048 ,  G03F7/039 ,  Y10S430/106

摘要： A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

摘要翻译： 用于暴露于远紫外线的正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，（B）含有对应于羟基苯乙烯的重复单元的树脂，其溶解度增加 （C）（1）选自丙二醇单甲醚乙酸酯和丙二醇单甲醚丙酸酯中的至少一种溶剂，和（2）至少一种溶剂，其选自： 由丙二醇单甲醚和丙酸乙氧基乙酯组成的组。 本发明的正型光致抗蚀剂组合物适用于暴露于远紫外线，特别是KrF准分子激光束，在线边缘粗糙度和微晶粒方面得到改善，在基材上贴合的均匀性优异，在其中较少的颗粒 抗溶液。

公开(公告)号：US5358824A

公开(公告)日：1994-10-25

申请号：US118590

申请日：1993-09-10

申请人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

发明人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

IPC分类号： G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/023

CPC分类号： G03F7/022

摘要： The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.

摘要翻译： 本发明的感光性树脂组合物含有5〜100重量份的具有下列通式（A）的感光材料和100重量份碱溶性树脂的混合物：通式（A）表示氢原子， 羟基，卤素原子，烷基，烷氧基，芳烷基，芳基，氨基，单烷基氨基，二烷基氨基，酰氨基，烷基氨基甲酰基，芳基氨基甲酰基，烷基氨磺酰基 基团，芳基氨磺酰基，羧基，氰基，硝基，酰基，烷氧基羰基，芳氧基羰基，酰氧基或-OD，-N（R）-D（其中R表示 氢原子或烷基，D表示1,2-萘基叠氮基-5-磺酰基或1,2-萘醌亚叠氮基-4-磺酰基），R 1至R 8中的至少一个表示-OD或-N（ R）-D; R9至R12各自独立地表示氢原子，低级烷基或R9和R10和/或R11和R12可以形成环; R 13〜R 14各自独立地表示氢原子，低级烷基或R 13或R 14，R 15或R 16中的任一个可以形成环，而R 13〜R 16中的至少一个为氢以外的取代基。 Z表示氧原子或单键。

公开(公告)号：US07998654B2

公开(公告)日：2011-08-16

申请号：US12056330

申请日：2008-03-27

申请人： Fumiyuki Nishiyama ,  Hiromi Kanda

发明人： Fumiyuki Nishiyama ,  Hiromi Kanda

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A positive resist composition comprises: (A) a resin that has a repeating unit represented by general formula (a1) and increases its solubility in an alkali developer by action of an acid; (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation; and (C) a resin that has at least one of a fluorine atom and a silicon atom and has a group selected from the group consisting of (x), (y) and (z); and (D) a solvent: (x) an alkali-soluble group; (y) a group capable that decomposes by action of an alkali developer to undergo an increase in a solubility of the resin (C) in an alkali developer; and (z) a group that decomposes by action of an acid, wherein R represents a hydrogen atom or a methyl group, Rxa represents an alkyl group or a cycloalkyl group, and n represents an integer of 1 to 8.

摘要翻译： 正型抗蚀剂组合物包含：（A）具有由通式（a1）表示的重复单元并通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; 和（C）具有氟原子和硅原子中的至少一个并且具有选自（x），（y）和（z）的基团的树脂; 和（D）溶剂：（x）碱溶性基团; （y）能够通过碱性显影剂的作用分解以使树脂（C）在碱性显影剂中的溶解度增加的基团; 和（z）通过酸的作用分解的基团，其中R表示氢原子或甲基，Rxa表示烷基或环烷基，n表示1至8的整数。