公开(公告)号：US5358824A

公开(公告)日：1994-10-25

申请号：US118590

申请日：1993-09-10

申请人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

发明人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

IPC分类号： G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/023

CPC分类号： G03F7/022

摘要： The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.

摘要翻译： 本发明的感光性树脂组合物含有5〜100重量份的具有下列通式（A）的感光材料和100重量份碱溶性树脂的混合物：通式（A）表示氢原子， 羟基，卤素原子，烷基，烷氧基，芳烷基，芳基，氨基，单烷基氨基，二烷基氨基，酰氨基，烷基氨基甲酰基，芳基氨基甲酰基，烷基氨磺酰基 基团，芳基氨磺酰基，羧基，氰基，硝基，酰基，烷氧基羰基，芳氧基羰基，酰氧基或-OD，-N（R）-D（其中R表示 氢原子或烷基，D表示1,2-萘基叠氮基-5-磺酰基或1,2-萘醌亚叠氮基-4-磺酰基），R 1至R 8中的至少一个表示-OD或-N（ R）-D; R9至R12各自独立地表示氢原子，低级烷基或R9和R10和/或R11和R12可以形成环; R 13〜R 14各自独立地表示氢原子，低级烷基或R 13或R 14，R 15或R 16中的任一个可以形成环，而R 13〜R 16中的至少一个为氢以外的取代基。 Z表示氧原子或单键。

公开(公告)号：US06692883B2

公开(公告)日：2004-02-17

申请号：US09838257

申请日：2001-04-20

申请人： Fumiyuki Nishiyama ,  Toru Fujimori ,  Shiro Tan

发明人： Fumiyuki Nishiyama ,  Toru Fujimori ,  Shiro Tan

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/106

摘要： A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.

摘要翻译： 公开了一种正型光致抗蚀剂组合物，其包含具有包含特定基团的结构单元并且能够在酸的作用下分解以增加在碱性显影剂中的溶解度的树脂，具有包含特定基团的结构单元的树脂，并且能够 在酸的作用下分解以增加在碱性显影剂中的溶解度，以及能够在用光化射线或辐射照射时能够产生酸的化合物。

公开(公告)号：US06379860B1

公开(公告)日：2002-04-30

申请号：US09220682

申请日：1998-12-23

申请人： Toru Fujimori ,  Yasunori Takata ,  Shiro Tan ,  Toshiaki Aoai

发明人： Toru Fujimori ,  Yasunori Takata ,  Shiro Tan ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/115

摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.

摘要翻译： 公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使 具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。 正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是 没有缺陷，例如发展缺陷。

公开(公告)号：US06830872B2

公开(公告)日：2004-12-14

申请号：US10247656

申请日：2002-09-20

申请人： Kazuyoshi Mizutani ,  Shiro Tan

发明人： Kazuyoshi Mizutani ,  Shiro Tan

IPC分类号： G03F7038

CPC分类号： G03F7/0233 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/04 ,  B41C2201/06 ,  B41C2201/10 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/0046 ,  G03F7/033 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/108 ,  Y10S430/165

摘要： Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.

摘要翻译： 公开了平版印刷版原版，其包括载体，其上设置有含有衍生自由以下通式（I）表示的单体的结构单元的氟高分子化合物的成像层。 在通式（I）中，R 0表示氢原子，甲基，氰基或卤素原子。 X表示单键或二价连接基团。 R 1〜R 6各自独立地表示氢原子，烷基，氟原子或至少一个氢原子被氟原子取代的烷基。 此外，R 1至R 6中的至少一个表示氟原子或至少一个氢原子被氟原子取代的烷基。

公开(公告)号：US06416925B1

公开(公告)日：2002-07-09

申请号：US09497281

申请日：2000-02-02

申请人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

发明人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

IPC分类号： G03C173

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

摘要翻译： 适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团 的酸以增加在碱性显影剂中的溶解度。

公开(公告)号：US5674657A

公开(公告)日：1997-10-07

申请号：US743592

申请日：1996-11-04

申请人： Shiro Tan ,  Yasumasa Kawabe ,  Kenji Honda

发明人： Shiro Tan ,  Yasumasa Kawabe ,  Kenji Honda

IPC分类号： C08L61/06 ,  G03F7/022 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0236 ,  G03F7/022

摘要： The invention is directed to an alkali-soluble novolak binder resin composition made by addition condensation reaction of a phenolic mixture with at least one aldehyde source, the feedstock of said phenolic mixture for the reaction comprising about 33 to about 83 mole percent of meta-cresol; about 1 to about 4 mole percent of para-cresol; about 10 to about 60 mole percent of a phenolic monomer selected from the group consisting of 2,3-xylenol, 3,4-xylenol, 3,5-xylenol and mixtures thereof; and about 5 to about 55 mole percent of a methoxy phenol monomer, the amount of aldehyde source being from about 40 to about 200 percent of the stoichiometric amount needed to react with all of the phenolic moieties in said phenolic mixture, and the alkali-soluble novolak binder resin having a weight average molecular weight (M.sub.w) of about 3,000 to about 20,000 with a molecular weight polydispersity (M.sub.w /M.sub.n) of 1.5-4.0. The invention is also directed to a positive working photoresist made from the composition.

摘要翻译： 本发明涉及通过酚类混合物与至少一种醛源的加成缩合反应制备的碱溶性酚醛清漆粘合剂树脂组合物，所述用于反应的酚类混合物的原料包含约33-约83摩尔％的间甲酚 ; 约1至约4摩尔％的对 - 甲酚; 约10至约60摩尔％的选自2,3-二甲苯酚，3,4-二甲苯酚，3,5-二甲苯酚及其混合物的酚单体; 和约5至约55摩尔％的甲氧基酚单体，醛源的量为所述酚类混合物中所有酚部分反应所需化学计量的约40至约200％，碱溶性 酚醛清漆粘合剂树脂，重均分子量（Mw）约为3,000至约20,000，分子量多分散性（Mw / Mn）为1.5-4.0。 本发明还涉及由该组合物制成的正性工作光致抗蚀剂。

公开(公告)号：US06277541B1

公开(公告)日：2001-08-21

申请号：US09333655

申请日：1999-06-16

申请人： Seiji Uno ,  Shiro Tan ,  Mitsuhiro Imaizumi ,  Keiji Akiyama

发明人： Seiji Uno ,  Shiro Tan ,  Mitsuhiro Imaizumi ,  Keiji Akiyama

IPC分类号： G03C177

CPC分类号： B41C1/1016 ,  B41C2201/04 ,  B41C2201/06 ,  B41C2201/10 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/11 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111

摘要： A photosensitive lithographic printing plate in which press life, deletion performance, photosensitive layer removability and image reproducibility are compatible with one another, while retaining scumming prevention performance, which comprises an aluminum support hydrophilized after anodic oxidization, an intermediate layer provided thereon containing an alkali-soluble polymer adjusted in a number-average molecular weight (Mn) to the range of 300 to 5,000 by using an initiator in combination with a chain transfer agent in radical polymerization, and a photosensitive layer provided on the intermediate layer.

摘要翻译： 其中压印寿命，缺失性能，感光层可除去性和图像再现性彼此兼容的感光性平版印刷版，同时保持防阳离子性能，其包括在阳极氧化后亲水化的铝载体，其上设置有含有碱 - 通过在自由基聚合中使用与链转移剂组合的引发剂和在中间层上设置的感光层，将数均分子量（Mn）调节至300-5,000范围内的可溶性聚合物。

公开(公告)号：US6114089A

公开(公告)日：2000-09-05

申请号：US55969

申请日：1998-04-07

申请人： Satoshi Takita ,  Mitsuhiro Imaizumi ,  Keiji Akiyama ,  Seiji Uno ,  Shiro Tan

发明人： Satoshi Takita ,  Mitsuhiro Imaizumi ,  Keiji Akiyama ,  Seiji Uno ,  Shiro Tan

IPC分类号： B41N3/03 ,  G03F7/11 ,  G03C1/77

CPC分类号： B41C1/1016 ,  G03F7/11 ,  B41C2201/04 ,  B41C2201/06 ,  B41C2201/10 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

摘要： A positive working photosensitive lithographic printing plate comprising an aluminum substrate and a positive working photosensitive layer, the aluminum substrate having been anodized and rendered water-wettable, wherein an intermediate layer containing a polymer comprising (A) a unit interacting with an alumina layer and (B) a unit interacting with a water-wettable layer is provided between the aluminum substrate and the photosensitive layer. The photosensitive layer and the water-wettable aluminum substrate have good adhesion so that the printing plate has a satisfactory press life.

摘要翻译： 一种正性感光性平版印刷版，其特征在于，具有铝基板和正性感光层，所述铝基板经过阳极氧化处理，使其具有水润湿性，其中含有聚合物的中间层包含（A）与氧化铝层相互作用的单元和（ B）在铝基材和感光层之间设置与水可湿性层相互作用的单元。 感光层和水润湿铝基材具有良好的粘合性，使得印刷版具有令人满意的印刷寿命。

公开(公告)号：US5683851A

公开(公告)日：1997-11-04

申请号：US784469

申请日：1997-01-17

申请人： Shiro Tan ,  Shinji Sakaguchi

发明人： Shiro Tan ,  Shinji Sakaguchi

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027

CPC分类号： G03F7/0236

摘要： Provided is a positive photoresist composition comprising (A) an alkali-soluble resin prepared by condensation of aldehydes and a mixture of phenols, which comprises (i) thymol, isothymol or a thymol-isothymol mixture and (ii) one or more of a phenol compound represented by the following formula (I); ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group, and optionally, as a third monomer, (iii) a phenol compound other than m-cresol; (B) 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent; and (C) a low molecular weight compound having from 12 to 50 carbon atoms in all and from 2 to 8 phenolic hydroxy groups.

摘要翻译： 本发明提供了一种正性光致抗蚀剂组合物，其包含（A）通过醛和酚的混合物制备的碱溶性树脂，其包含（i）百里酚，异百草酚或百里酚 - 同种异黄醇混合物和（ii）一种或多种苯酚 由下式（I）表示的化合物; （I）其中R1，R2和R3相同或不同，并且它们各自表示氢原子或甲基，任选地，作为第三单体，（iii）除了间甲酚之外的酚化合物 ; （B）1,2-萘醌二叠氮化物-5-（和/或-4-）磺酸酯作为感光剂; 和（C）全部和2-8个酚羟基具有12至50个碳原子的低分子量化合物。

公开(公告)号：US06207343B1

公开(公告)日：2001-03-27

申请号：US09292052

申请日：1999-04-14

申请人： Toru Fujimori ,  Shiro Tan

发明人： Toru Fujimori ,  Shiro Tan

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： The present invention provides a positive photosensitive composition comprising a compound having a group represented by the following general formula (Ia) or (Ib) which decomposes by the action of an acid to enhance its solubility in an alkaline developing solution and a compound which generates an acid upon irradiation with actinic rays or radiation: wherein R1a and R2a each represent a hydrogen atom or a C1-4 alkyl group; Wa represents a single bond or a divalent organic group; R3a represents a group which decomposes the action of an acid; R1b and R2b each represent a hydrogen atom or a C1-4 alkyl group; Wb represents a divalent organic group; and R3b represents a C11-20 chain alkyl group which may have substituents, a C11-20 cyclic alkyl group which may have substituents, a C11-30 aryl group which may have substituents or a C12-30 aralkyl group which may have substituents.

摘要翻译： 本发明提供一种正型光敏组合物，其包含具有由以下通式（Ia）或（Ib）表示的基团的化合物，其通过酸的作用而分解，以增强其在碱性显影液中的溶解度和产生 用光化射线或辐射照射时酸;其中R1a和R2a各自表示氢原子或C1-4烷基; Wa表示单键或二价有机基团; R3a表示分解酸的作用的基团; R1b和R2b各自表示氢原子或C1-4烷基; Wb表示二价有机基团; R3b表示可具有取代基的C11-20链烷基，可具有取代基的C11-20环状烷基，可具有取代基的C11-30芳基或可具有取代基的C12-30芳烷基。