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11.发明授权Negative imaging method for providing a patterned metal layer having high conductivity 有权用于提供具有高导电性的图案化金属层的负成像方法公开(公告)号：US07666567B2
公开(公告)日：2010-02-23
申请号：US11877633
申请日：2007-10-23
申请人： Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Irina Malajovich , Jeffrey Scott Meth , Kenneth George Sharp , Fredrick Claus Zumsteg, Jr. , Seema Agrawal
发明人： Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Irina Malajovich , Jeffrey Scott Meth , Kenneth George Sharp , Fredrick Claus Zumsteg, Jr. , Seema Agrawal
IPC分类号： G03C8/00
CPC分类号： B41M5/38207 , B41M5/392 , H05K3/046 , H05K3/182 , H05K3/185 , H05K2203/0528 , H05K2203/107 , H05K2203/1105
摘要： Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
摘要翻译： 公开了一种用于制造具有高导电性的金属图案的方法负成像方法，包括通过热成像方法在基底板上提供包含图案化催化剂层的图案化衬底，接着进行电镀以提供金属图案。 所提供的金属图案适用于包括电磁干扰屏蔽装置和触摸板传感器的电气装置。
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12.发明申请NEGATIVE IMAGING METHOD FOR PROVIDING A PATTERNED METAL LAYER HAVING HIGH CONDUCTIVITY 有权用于提供具有高电导率的图案金属层的负成像方法公开(公告)号：US20090104557A1
公开(公告)日：2009-04-23
申请号：US11877633
申请日：2007-10-23
申请人： Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Irina Malajovich , Jeffrey Scott Meth , Kenneth George Sharp , Fredrick Claus Zumsteg, JR. , Seema Agrawal
发明人： Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Irina Malajovich , Jeffrey Scott Meth , Kenneth George Sharp , Fredrick Claus Zumsteg, JR. , Seema Agrawal
IPC分类号： G03F1/14
CPC分类号： B41M5/38207 , B41M5/392 , H05K3/046 , H05K3/182 , H05K3/185 , H05K2203/0528 , H05K2203/107 , H05K2203/1105
摘要： Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
摘要翻译： 公开了一种用于制造具有高导电性的金属图案的方法负成像方法，包括通过热成像方法在基底板上提供包含图案化催化剂层的图案化衬底，接着进行电镀以提供金属图案。 所提供的金属图案适用于包括电磁干扰屏蔽装置和触摸板传感器的电气装置。
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公开(公告)号：US06989336B2
公开(公告)日：2006-01-24
申请号：US10949632
申请日：2004-09-24
IPC分类号： H01L21/31 , H01L21/00 , H01L21/3205
CPC分类号： H01L21/441 , H01L21/47 , H01L21/76801 , H01L29/4908 , H01L29/66742 , H01L29/66969 , H01L29/78648 , H01L29/78681 , H01L51/0516
摘要： This invention relates to processes useful for fabricating electronic devices, more particularly to a process for laminating a layer of dielectric material onto a semiconductor.
摘要翻译： 本发明涉及用于制造电子器件的方法，更具体地说，涉及将电介质材料层层压到半导体上的方法。
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公开(公告)号：US5876686A
公开(公告)日：1999-03-02
申请号：US663833
申请日：1996-06-14
IPC分类号： C01B13/32 , C03C1/00 , C03C17/42 , C04B41/45 , C04B41/52 , C04B41/81 , C04B41/89 , C09D5/00 , C23C26/00 , C01B13/14 , B32B27/00 , C01B33/12 , C01B35/10
CPC分类号： C04B41/009 , C01B13/32 , C03C1/008 , C03C17/42 , C04B41/4554 , C04B41/52 , C04B41/81 , C04B41/89 , C09D5/002 , C23C26/00 , Y10T428/3154 , Y10T428/31645 , Y10T428/31649 , Y10T428/31826 , Y10T428/31928 , Y10T428/31989
摘要： This invention relates to a process for the preparation of an inorganic oxide gel comprising contacting at least one fluorinated inorganic oxide precursor with a fluorinated gelling agent in the presence of at least one fluorinated solvent to form a solution; allowing sufficient time for gelation to occur; and isolating the inorganic oxide gel. Gels made by this process are useful as coatings and as components in inorganic/organic hybrid materials.
摘要翻译： 本发明涉及一种制备无机氧化物凝胶的方法，包括在至少一种氟化溶剂存在下使至少一种氟化无机氧化物前体与氟化胶凝剂接触以形成溶液; 允许有足够的时间发生凝胶化; 并分离无机氧化物凝胶。 通过该方法制成的凝胶可用作无机/有机杂化材料中的涂料和组分。
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15.发明授权Method and composition for improving gas barrier properties of polymeric containers and films 失效用于改善聚合物容器和膜的阻气性的方法和组合物公开(公告)号：US06489386B1
公开(公告)日：2002-12-03
申请号：US09634288
申请日：2000-08-09
申请人： Irene Greenwald Plotzker , Thomas Michael Ford , Kenneth George Sharp , Samuel Tacitus D'Arcangelis
发明人： Irene Greenwald Plotzker , Thomas Michael Ford , Kenneth George Sharp , Samuel Tacitus D'Arcangelis
IPC分类号： C08K509
CPC分类号： C08K5/138 , B65D65/38 , C08K5/0091 , C08K5/1345 , C08K5/20 , C08K2201/008 , C08L67/02
摘要： A polymer composition and method for reducing the permeability of gases through molded polymeric containers and films by incorporating into the polymer from which the container or film is formed an effective amount of a barrier-enhancing additive, such as monoesters of hydroxybenzoic acid and hydroxynaphthoic acid.
摘要翻译： 一种聚合物组合物和方法，用于通过将形成聚合物容器和薄膜的气体渗透到聚合物中以形成容器或膜，从而降低气体的渗透性，该聚合物形成有效量的阻隔增强添加剂，例如羟基苯甲酸和羟基萘甲酸的单酯。
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公开(公告)号：US06096460A
公开(公告)日：2000-08-01
申请号：US294575
申请日：1999-04-20
IPC分类号： G03F1/00 , G03F1/32 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32 , Y10T428/3154 , Y10T428/31612
摘要： Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1.2 to 2.0, preferably in the range from 1.26 to 1.8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0.04 to 0.8, preferably in the range from 0.06 to 0.59 at the selected lithographic wavelength below 400 nm.
摘要翻译： 透射衰减的嵌入式移相器光掩模包括至少一种聚合材料，优选无定形含氟聚合物或掺杂有氟官能化的有机硅烷的无定形含氟聚合物，以及有机硅酸盐或其组合，所述聚合物材料具有：（a）折射率（n） 在选择的光刻波长低于400nm的范围内为1.2至2.0，优选在1.26至1.8的范围内; 和（b）在低于400nm的选定光刻波长下，在0.04至0.8的范围内，优选在0.06至0.59的范围内的消光系数（k）。
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公开(公告)号：US5798430A
公开(公告)日：1998-08-25
申请号：US663834
申请日：1996-06-14
IPC分类号： C07F7/18 , C07F7/21 , C08G77/24 , C08G77/385 , C08G77/48 , C08G77/50 , C08G77/00 , C08G77/60
CPC分类号： C07F7/21 , C07F7/1836 , C07F7/184 , C08G77/485
摘要： The present invention pertains to molecular and oligomeric organo-silicon compounds bearing fluorine atoms, soluble in fluorinated solvents and useful as precursors to network materials.
摘要翻译： 本发明涉及含有氟原子的分子和低聚有机硅化合物，其可溶于氟化溶剂并且可用作网状材料的前体。
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公开(公告)号：US06598463B2
公开(公告)日：2003-07-29
申请号：US10128710
申请日：2002-04-22
IPC分类号： G01N1508
CPC分类号： G01N1/2226 , G01N15/0826 , G01N2001/2241 , G01N2015/0873
摘要： The Invention concerns an apparatus for and method for the simultaneous determination of permeation rate through and desorption rate from a polymeric specimen, the method comprising sealingly separating a first volume from a second volume with a specimen to be tested, said specimen being suffused with a first isotope of a gas or vapor; introducing in said first volume a second isotope of said gas or vapor, said second isotope being detectably distinguishable from said first isotope; in said second volume, adjusting the partial pressure of both said isotopes of said gas or vapor to a negligible value compared to that of said second isotope of said gas or vapor in said first volume; and, distinguishably detecting the concentration of each said diffusing isotope of said permeant in said second volume.
摘要翻译： 本发明涉及一种用于同时测定聚合物样品的渗透速率和解吸速率的装置和方法，所述方法包括将第一体积与第二体积与待测样品分开，所述样品充满第一同位素 在所述第一体积中引入所述气体或蒸气的第二同位素，所述第二同位素可检测地与所述第一同位素区分;在所述第二体积中，将所述气体或蒸气的所述同位素的分压调节至 与所述第一体积中的所述气体或蒸汽的所述第二同位素相比值可忽略的值;以及可区分地检测所述渗透物在所述第二体积中的每种所述扩散同位素的浓度。
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公开(公告)号：US06174631B1
公开(公告)日：2001-01-16
申请号：US09484149
申请日：2000-01-18
IPC分类号： G03F900
摘要： Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1.2 to 2.0, preferably in the range from 1.26 to 1.8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0.04 to 0.8, preferably in the range from 0.06 to 0.59 at the selected lithographic wavelength below 400 nm.
摘要翻译： 透射衰减的嵌入式移相器光掩模包括至少一种聚合材料，优选无定形含氟聚合物或掺杂有氟官能化的有机硅烷的无定形含氟聚合物，以及有机硅酸盐或其组合，所述聚合物材料具有：（a）折射率（n） 在选择的光刻波长低于400nm的范围内为1.2至2.0，优选在1.26至1.8的范围内; 和（b）在低于400nm的选定光刻波长下，在0.04至0.8的范围内，优选在0.06至0.59的范围内的消光系数（k）。
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20.发明授权Rapid process for making silica gel and silicate polymer and low density gels made thereby 失效制造硅胶和硅酸盐聚合物和低密度凝胶的快速制备方法公开(公告)号：US06168773A
公开(公告)日：2001-01-02
申请号：US09091051
申请日：1998-06-10
申请人： Kenneth George Sharp
发明人： Kenneth George Sharp
IPC分类号： C08G7702
CPC分类号： C08G77/24 , B01J20/103 , B01J2220/52 , C01B33/163 , C08G77/02
摘要： This invention relates to a rapid process for the preparation of a silica gel or a silicate polymer comprising contacting at least one fluoroalkoxysilane with a solution comprising water, optionally in the presence of a solvent and/or a catalyst. Low density gels can be prepared using this process and can possess large pore size, greater than 50 nm.
摘要翻译： 本发明涉及一种制备硅胶或硅酸盐聚合物的快速方法，包括任选地在溶剂和/或催化剂存在下使至少一种氟代烷氧基硅烷与含有水的溶液接触。 可以使用该方法制备低密度凝胶，并且可以具有大于50nm的大孔径。
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