Method for determining gas accumulation rates
    4.
    发明授权
    Method for determining gas accumulation rates 失效
    确定气体积聚率的方法

    公开(公告)号:US06598463B2

    公开(公告)日:2003-07-29

    申请号:US10128710

    申请日:2002-04-22

    IPC分类号: G01N1508

    摘要: The Invention concerns an apparatus for and method for the simultaneous determination of permeation rate through and desorption rate from a polymeric specimen, the method comprising sealingly separating a first volume from a second volume with a specimen to be tested, said specimen being suffused with a first isotope of a gas or vapor; introducing in said first volume a second isotope of said gas or vapor, said second isotope being detectably distinguishable from said first isotope; in said second volume, adjusting the partial pressure of both said isotopes of said gas or vapor to a negligible value compared to that of said second isotope of said gas or vapor in said first volume; and, distinguishably detecting the concentration of each said diffusing isotope of said permeant in said second volume.

    摘要翻译: 本发明涉及一种用于同时测定聚合物样品的渗透速率和解吸速率的装置和方法,所述方法包括将第一体积与第二体积与待测样品分开,所述样品充满第一同位素 在所述第一体积中引入所述气体或蒸气的第二同位素,所述第二同位素可检测地与所述第一同位素区分;在所述第二体积中,将所述气体或蒸气的所述同位素的分压调节至 与所述第一体积中的所述气体或蒸汽的所述第二同位素相比值可忽略的值;以及可区分地检测所述渗透物在所述第二体积中的每种所述扩散同位素的浓度。

    Attenuating phase shift photomasks
    5.
    发明授权
    Attenuating phase shift photomasks 失效
    衰减相移光掩模

    公开(公告)号:US06174631B1

    公开(公告)日:2001-01-16

    申请号:US09484149

    申请日:2000-01-18

    IPC分类号: G03F900

    CPC分类号: G03F1/32 G03F1/56

    摘要: Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1.2 to 2.0, preferably in the range from 1.26 to 1.8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0.04 to 0.8, preferably in the range from 0.06 to 0.59 at the selected lithographic wavelength below 400 nm.

    摘要翻译: 透射衰减的嵌入式移相器光掩模包括至少一种聚合材料,优选无定形含氟聚合物或掺杂有氟官能化的有机硅烷的无定形含氟聚合物,以及有机硅酸盐或其组合,所述聚合物材料具有:(a)折射率(n) 在选择的光刻波长低于400nm的范围内为1.2至2.0,优选在1.26至1.8的范围内; 和(b)在低于400nm的选定光刻波长下,在0.04至0.8的范围内,优选在0.06至0.59的范围内的消光系数(k)。

    Rapid process for making silica gel and silicate polymer and low density gels made thereby
    6.
    发明授权
    Rapid process for making silica gel and silicate polymer and low density gels made thereby 失效
    制造硅胶和硅酸盐聚合物和低密度凝胶的快速制备方法

    公开(公告)号:US06168773A

    公开(公告)日:2001-01-02

    申请号:US09091051

    申请日:1998-06-10

    IPC分类号: C08G7702

    摘要: This invention relates to a rapid process for the preparation of a silica gel or a silicate polymer comprising contacting at least one fluoroalkoxysilane with a solution comprising water, optionally in the presence of a solvent and/or a catalyst. Low density gels can be prepared using this process and can possess large pore size, greater than 50 nm.

    摘要翻译: 本发明涉及一种制备硅胶或硅酸盐聚合物的快速方法,包括任选地在溶剂和/或催化剂存在下使至少一种氟代烷氧基硅烷与含有水的溶液接触。 可以使用该方法制备低密度凝胶,并且可以具有大于50nm的大孔径。