Memory devices with volatile and non-volatile behavior

    公开(公告)号:US11043265B2

    公开(公告)日:2021-06-22

    申请号:US16072575

    申请日:2016-02-12

    Abstract: An example device in accordance with an aspect of the present disclosure includes an active oxide layer to form and dissipate a conductive bridge. The conductive bridge is to dissipate spontaneously within a relaxation time to enable the memory device to self-refresh according to volatile behavior in response to the input voltage being below a threshold corresponding to disregarding sneak current and noise of a crossbar array in which the memory device is to operate. The conductive bridge is to persist beyond the relaxation time to enable the memory device to retain programming for neuromorphic computing training according to non-volatile behavior of the memory device in response to the input voltage not being below the threshold.

    Crossbar arrays for calculating matrix multiplication

    公开(公告)号:US10410716B2

    公开(公告)日:2019-09-10

    申请号:US15570980

    申请日:2015-09-25

    Abstract: A crossbar array, comprises a plurality of row lines, a plurality of column lines intersecting the plurality of row lines at a plurality of intersections, a plurality of junctions coupled between the plurality of row lines and the plurality of column lines at a portion of the plurality of intersections, and a plurality of diagonal control lines coupled to the plurality of junctions. Each junction comprises a resistive memory element and a transistor, and the junctions are positioned to calculate a matrix multiplication of a first matrix and a second matrix.

    Multilayered memristors
    18.
    发明授权

    公开(公告)号:US10026896B2

    公开(公告)日:2018-07-17

    申请号:US15500050

    申请日:2015-02-13

    Abstract: A multilayered memristor includes a semiconducting n-type layer, a semiconducting p-type layer, and a semiconducting intrinsic layer. The semiconducting n-type layer includes one or both of anion vacancies and metal cations. The semiconducting p-type layer includes one or both of metal cation vacancies and anions. The semiconducting intrinsic layer is coupled between the n-type layer and the p-type layer to form an electrical series connection through the n-type layer, the intrinsic layer, and the p-type layer.

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