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公开(公告)号：US4084881A
公开(公告)日：1978-04-18
申请号：US732408
申请日：1976-10-14
Applicant: Yoichi Hirabayashi , Setsuo Minami , Takeshi Goshima
Inventor： Yoichi Hirabayashi , Setsuo Minami , Takeshi Goshima
CPC classification number: G02B13/10 , G01R13/38 , G02B26/125 , G02B27/0031
Abstract: A prism anamorphic optical system is disposed in the path of deflected beam from a rotatable polygonal mirror or a galvano-mirror. This prism anamorphic optical system includes at least two prisms, so that different amounts of displacement of the deflected beam at each angle of deflection and in a direction perpendicular to the direction of deflection caused by the first of the prisms are corrected by the second and subsequent prisms, as viewed from the incidence side. Thus, a straight scanning line may be obtained.
Abstract translation: 棱镜变形光学系统设置在来自可旋转多面镜或电流镜的偏转光束的路径中。 该棱镜变形光学系统包括至少两个棱镜，使得在每个偏转角和与由第一棱镜引起的偏转方向垂直的方向上的偏转光束的不同位移量被第二次和随后的 棱镜，从发生侧看。 因此，可以获得直线扫描线。
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公开(公告)号：US4586814A
公开(公告)日：1986-05-06
申请号：US535700
申请日：1983-09-26
Applicant: Mitsuhiro Tokuhara , Setsuo Minami
Inventor： Mitsuhiro Tokuhara , Setsuo Minami
IPC: G03B27/34 , G02B13/24 , G02B15/14 , G02B15/16 , G03G15/041 , G03G15/047 , G03B27/52
CPC classification number: G02B15/14 , G03G15/041
Abstract: A projecting device for projecting an image of the surface of a body on a light receiving surface, in which optical element blocks are provided symmetrically with respect to a stop, of which the diameter of aperture is always constant in varying the magnification. The device includes a projecting optical system to change the focal length by symmetrically moving with respect to the stop at least a part or the whole of the optical element blocks, and means for restricting the field of the surface of a body, disposed between said projecting optical system and the surface of the body. The exposure amount on the light receiving surface is maintained substantially constant in varying the magnification by making the change of the focussing magnification of the projecting optical system to mainly correspond with the change of refractive power of the optical element blocks which are disposed on both sides of said stop.
Abstract translation: 一种投影装置，用于将物体表面的图像投影在光接收表面上，其中光学元件块相对于止动件对称设置，其中孔径直径在变化时总是恒定的。 该装置包括投影光学系统，用于通过相对于止挡件至少一部分或整个光学元件块对称地移动焦距，以及用于限制主体表面的场的装置，该装置设置在所述突出部 光学系统和身体的表面。 通过使投影光学系统的聚焦放大率的变化主要对应于配置在两侧的光学元件块的折射能力的变化，使得受光面上的曝光量基本上保持恒定， 说停了
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公开(公告)号：US4523801A
公开(公告)日：1985-06-18
申请号：US351936
申请日：1982-02-24
Applicant: Takeshi Baba , Noriyuki Nose , Hideo Yoshikawa , Kazuo Minoura , Akinori Hasu , Setsuo Minami , Kazuhiko Matsuoka
Inventor： Takeshi Baba , Noriyuki Nose , Hideo Yoshikawa , Kazuo Minoura , Akinori Hasu , Setsuo Minami , Kazuhiko Matsuoka
Abstract: An optical system for scanning a medium with a beam spot includes a light beam generator, a deflector for deflecting the light beam in a predetermined direction and in deflection plane, and an imaging optical system between the deflector and the medium for imaging the light beam from the deflector on the medium as a beam spot, the imaging optical system having at least one lens element mode of a moisture absorbing material. The lens element has a shape in which the dimension in a direction parallel to the deflection plane of the light beam is greater than the dimension in a direction perpendicular to the deflection plane of the light beam. A device mitigates any influence on the imaged condition of the light beam on the medium caused by the lens element being subjected to moisture.
Abstract translation: 用于扫描具有束斑的介质的光学系统包括光束发生器，用于沿预定方向和偏转平面偏转光束的偏转器，以及偏转器和介质之间的成像光学系统，用于对来自 介质上的偏转器作为光束点，成像光学系统具有至少一种吸湿材料的透镜元件模式。 透镜元件具有与光束的偏转平面平行的方向上的尺寸大于垂直于光束的偏转平面的方向上的尺寸的形状。 一种装置减轻由透镜元件受到湿气导致的介质上的光束的成像状态的任何影响。
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公开(公告)号：US4515446A
公开(公告)日：1985-05-07
申请号：US452122
申请日：1982-12-22
Applicant: Sadatoshi Takahashi , Sadahiko Tsuji , Akira Tajima , Toshiaki Asano , Setsuo Minami
Inventor： Sadatoshi Takahashi , Sadahiko Tsuji , Akira Tajima , Toshiaki Asano , Setsuo Minami
IPC: G02B15/20 , G02B15/173 , G02B15/16
CPC classification number: G02B15/173
Abstract: A zoom objective comprising four lens groups of which the first three lens groups counting from the object side are movable for zooming, whereby the refractive powers and the conditions of zooming movement of the aforesaid three lens groups are properly specified so as to improve the compactness while still maintaining good correction of aberrations.
Abstract translation: 包括四个透镜组的变焦目标，其中从物体侧计数的前三个透镜组可移动以进行变焦，由此适当地指定上述三个透镜组的屈光力和变焦运动的条件，以便提高紧凑性，同时 仍然保持良好的畸变矫正。
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公开(公告)号：US4402572A
公开(公告)日：1983-09-06
申请号：US166964
申请日：1980-07-08
Applicant: Atsuo Tsunoda , Koyo Midorikawa , Hidetoshi Murase , Mikio Suzuta , Masazumi Moriwaki , Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui
Inventor： Atsuo Tsunoda , Koyo Midorikawa , Hidetoshi Murase , Mikio Suzuta , Masazumi Moriwaki , Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui
CPC classification number: G02B3/0056 , G02B13/24 , G03B27/525
Abstract: This specification discloses a projection device in which bar lenses of plastic, each having a great length in the direction of its optical axis as compared with its effective diameter, of the lenses are arranged in the form of a predetermined array. The bar lenses are shielded from the outside atmosphere by a holding member capable of easily setting the lenses. Further, transparent plates, such as glass plates or the like, are provided at the incidence end and the emergence end to seal the holding member, so that there occurs no deterioration of the predetermined optical performance resulting from variations in the environmental humidity which would otherwise cause variations in the plastic material.
Abstract translation: 本说明书公开了一种投影装置，其中透镜的条形透镜在其光轴的方向上与其有效直径相比具有大的长度，以预定阵列的形式布置。 条形透镜通过能够容易地设置透镜的保持构件与外界气氛隔离。 此外，在入射端和出射端设置透明板，例如玻璃板等，以密封保持构件，从而不会由于环境湿度的变化而导致的预定光学性能的劣化，否则将导致环境湿度的变化。 造成塑料材料的变化。
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Patent Agency Ranking
公开(公告)号：US4270858A
公开(公告)日：1981-06-02
申请号：US085493
申请日：1979-10-17
Applicant: Kazuo Minoura , Muneharu Sugiura , Setsuo Minami , Tadashi Sato
Inventor： Kazuo Minoura , Muneharu Sugiura , Setsuo Minami , Tadashi Sato
CPC classification number: G03B27/526 , G03G15/28
Abstract: A scanning and projecting device for scanning a first plane by a light deflecting device interposed between the first plane and a second plane, and sequentially projecting a partial plane of the first plane scanned by the deflector onto a predetermined position on the second plane, in which a projecting optical system is disposed between the deflector and the second plane, the projecting optical system is titled in synchronism with the deflecting action of the deflector within a deflecting plane where light beam from the first plane is deflected by the deflector, and at least a part of the optical members constituting the projecting optical system moves in the direction of the optical axis in synchronism with the deflecting action of the deflector.
Abstract translation: 一种扫描和投影装置，用于通过插入在第一平面和第二平面之间的光偏转装置扫描第一平面，并且将由偏转器扫描的第一平面的部分平面顺序投影到第二平面上的预定位置，其中 投影光学系统设置在偏转器和第二平面之间，投影光学系统与偏转器的偏转作用同步地标称，偏转平面内，来自第一平面的光束被偏转器偏转，并且至少一个 构成投影光学系统的光学构件的一部分与偏转器的偏转动作同步地沿着光轴的方向移动。
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公开(公告)号：US5153898A
公开(公告)日：1992-10-06
申请号：US841298
申请日：1992-02-28
Applicant: Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
Inventor： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
CPC classification number: B82Y10/00 , G02B17/0636 , G03F7/2039 , G03F7/70033 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70866 , G03F7/70875 , G03F7/70883 , G03F7/70891
Abstract: An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Abstract translation: X射线曝光装置包括：用于保持具有用于电路制造的图案的掩模的台，用于将要暴露于掩模的图案的晶片用X射线保持的晶片的台，以及设置在该掩模之间的反射减少成像系统 掩模台和晶片台，包括反射镜装置，其包含涂覆有多层膜的至少三个但不多于五个的反射镜，用于从掩模接收X射线并将其引导到晶片以暴露晶片 以减小的X射线的掩模图案。
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公开(公告)号：US4512641A
公开(公告)日：1985-04-23
申请号：US359482
申请日：1982-03-18
Applicant: Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui
Inventor： Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui
Abstract: A compound eye projection device includes a first lens and a second lens equal in shape and power. These two lenses are disposed with their optical axis being coincident with each other and together constitute an element lens system. A plurality of such element lens systems are arranged in a line form in a predetermined direction to thereby form a projection device.
Abstract translation: 复合眼睛投影装置包括第一透镜和形状和功率相等的第二透镜。 这两个透镜被设置成它们的光轴彼此重合并且一起构成元件透镜系统。 多个这样的元件透镜系统以预定方向以直线形式布置，从而形成投影装置。
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公开(公告)号：US4350431A
公开(公告)日：1982-09-21
申请号：US166849
申请日：1980-07-08
Applicant: Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui , Atsuo Tsunoda , Koyo Midorikawa , Hidetoshi Murase , Mikio Suzuta , Masazumi Moriwaki
Inventor： Noritaka Mochizuki , Setsuo Minami , Yoshiya Matsui , Atsuo Tsunoda , Koyo Midorikawa , Hidetoshi Murase , Mikio Suzuta , Masazumi Moriwaki
CPC classification number: G02B3/0062 , G02B27/18 , G02B3/0075 , G03B27/522 , G02B27/0018 , G02B3/0056 , G02B3/0087
Abstract: A projecting device having an array, in a plane perpendicular to the optical axis, of plural element lens systems each axially provided with two bar lenses of an axial length larger than the effective diameter thereof, characterized by the presence of an intermediate ring positioned between two bar lenses for extracting the effective beam emerging from the first bar lens and entering the second bar lens and providing a determined light intensity distribution on the projection plane.
Abstract translation: 一种投影装置，具有在与光轴垂直的平面中的多个元件透镜系统的阵列，每个元件透镜系统各自轴向设置有两个长度大于其有效直径的杆状透镜，其特征在于，存在位于两个 用于提取从第一条形透镜出射并进入第二条形透镜的有效光束并在投影平面上提供确定的光强度分布。
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公开(公告)号：US4298271A
公开(公告)日：1981-11-03
申请号：US53777
申请日：1979-07-02
Applicant: Muneharu Sugiura , Kazuo Minoura , Setsuo Minami
Inventor： Muneharu Sugiura , Kazuo Minoura , Setsuo Minami
CPC classification number: G03G15/04 , G03B27/526 , G03G15/041
Abstract: A scanning and projecting device of a construction having a rotationally symmetrical first image forming optical system, a scanning surface disposed on the focal plane of the optical system, a deflector to deflect a parallel light beam emitted from the scanning surface and passing through the first image forming optical system, a rotationally symmetrical second image forming system which receives the parallel light beam deflected by the deflector, a light receiving surface disposed at an image forming position of the second image forming optical system, and at least one anamorphic optical system disposed in the light path between the scanning surface and the light receiving surface.
Abstract translation: 一种具有旋转对称的第一成像光学系统的结构的扫描和投影装置，设置在光学系统的焦平面上的扫描表面，偏转器，用于偏转从扫描表面发射并穿过第一图像的平行光束 形成光学系统，旋转对称的第二图像形成系统，其接收由偏转器偏转的平行光束，设置在第二成像光学系统的图像形成位置处的光接收表面，以及设置在第二成像光学系统中的至少一个变形光学系统 扫描表面和光接收表面之间的光路。
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