公开(公告)号：US08731138B2

公开(公告)日：2014-05-20

申请号：US13547073

申请日：2012-07-12

Applicant: Boris Yokhin ,  Isaac Mazor ,  Alexander Krohmal ,  Amos Gvirtzman ,  Gennady Openganden ,  David Berman ,  Matthew Wormington

Inventor： Boris Yokhin ,  Isaac Mazor ,  Alexander Krohmal ,  Amos Gvirtzman ,  Gennady Openganden ,  David Berman ,  Matthew Wormington

IPC: G01N23/20 ,  G01N23/203 ,  G01N23/207

CPC classification number: G01N23/207

Abstract: A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.

Abstract translation: 一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数 从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。 分析边缘的特性以测量外延层的弛豫。

公开(公告)号：US20110164730A1

公开(公告)日：2011-07-07

申请号：US12683436

申请日：2010-01-07

Applicant: Boris Yokhin ,  Isaac Mazor ,  Alexander Krohmal ,  Amos Gvirtzman ,  Gennady Ofengenden ,  David Berman ,  Matthew Wormington

Inventor： Boris Yokhin ,  Isaac Mazor ,  Alexander Krohmal ,  Amos Gvirtzman ,  Gennady Ofengenden ,  David Berman ,  Matthew Wormington

IPC: G01N23/207

CPC classification number: G01N23/207

Abstract: A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.

Abstract translation: 一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数 从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。 分析边缘的特性以测量外延层的弛豫。

公开(公告)号：US07483513B2

公开(公告)日：2009-01-27

申请号：US11487433

申请日：2006-07-17

Applicant: Isaac Mazor ,  Boris Yokhin

Inventor： Isaac Mazor ,  Boris Yokhin

IPC: G01N23/20

CPC classification number: G01N23/20

Abstract: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

Abstract translation: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

公开(公告)号：US07110491B2

公开(公告)日：2006-09-19

申请号：US11018352

申请日：2004-12-22

Applicant: Isaac Mazor ,  Boris Yokhin

Inventor： Isaac Mazor ,  Boris Yokhin

IPC: G01N23/20

CPC classification number: G01N23/20

Abstract: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

Abstract translation: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

公开(公告)号：US20060023836A1

公开(公告)日：2006-02-02

申请号：US10902177

申请日：2004-07-30

Applicant: David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

Inventor： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

IPC: G01N23/20

CPC classification number: G01N23/203 ,  G01B15/02

Abstract: A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

公开(公告)号：US20050069090A1

公开(公告)日：2005-03-31

申请号：US10673996

申请日：2003-09-29

Applicant: Tzachi Rafaeli ,  Isaac Mazor

Inventor： Tzachi Rafaeli ,  Isaac Mazor

IPC: G01N23/223 ,  A61B6/08 ,  G01N23/22

CPC classification number: G01N23/22

Abstract: A method for X-ray analysis of a sample includes aligning an optical radiation source with an X-ray excitation source, so that a spot on the sample that is irradiated by an X-ray beam generated by the X-ray excitation source is illuminated with optical radiation generated by the optical radiation source. Optical radiation that is reflected from the sample is used to generate a first signal, which is indicative of an alignment of the spot on the sample. The X-ray beam is aligned, responsively to the first signal, so that the spot coincides with a target area of the sample. X-ray photons received from the spot on the sample, after aligning the X-ray beam, are used in generating a second signal that is indicative of a characteristic of the target area.

Abstract translation: 用于样品的X射线分析的方法包括使光辐射源与X射线激发源对准，使得由X射线激发源产生的X射线束照射的样品上的斑点被照亮 具有由光辐射源产生的光辐射。 从样品反射的光辐射用于产生第一信号，其表示样品上的斑点的对准。 响应于第一信号将X射线束对准，使得斑点与样品的目标区域重合。 在对准X射线束之后从样品上的点接收的X射线光子用于产生指示目标区域的特征的第二信号。

公开(公告)号：US06512814B2

公开(公告)日：2003-01-28

申请号：US09833902

申请日：2001-04-12

Applicant: Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

Inventor： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

IPC: G01T136

CPC classification number: G01T1/36

Abstract: Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

公开(公告)号：US20120275568A1

公开(公告)日：2012-11-01

申请号：US13419497

申请日：2012-03-14

Applicant: Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

Inventor： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N21/211 ,  G01N21/274 ,  G01N21/33 ,  G01N21/8422 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8438 ,  G01N2223/1006 ,  G01N2223/61

Abstract: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

Abstract translation: 用于检查样品的装置包括X射线源，其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。

公开(公告)号：US20090074137A1

公开(公告)日：2009-03-19

申请号：US12272050

申请日：2008-11-17

Applicant: Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

Inventor： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

IPC: G01N23/223

CPC classification number: G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

Abstract: A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

Abstract translation: 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

公开(公告)号：US07481579B2

公开(公告)日：2009-01-27

申请号：US11389490

申请日：2006-03-27

Applicant: Boris Yokhin ,  Isaac Mazor ,  Sean Jameson ,  Alex Dikopoltsev

Inventor： Boris Yokhin ,  Isaac Mazor ,  Sean Jameson ,  Alex Dikopoltsev

IPC: G01D18/00

CPC classification number: G03F7/70633

Abstract: A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.

Abstract translation: 一种检查方法包括将X射线束引导到包含分别在第一和第二薄膜层上形成的第一和第二特征的样品的区域上，该第一和第二特征覆盖在样品的表面上。 检测和分析从第一和第二特征衍射的X射线的图案，以评估第一和第二特征的对准。