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    Thin film optical measurement system and method with calibrating ellipsometer
    11.
    发明授权
    Thin film optical measurement system and method with calibrating ellipsometer 有权

    公开(公告)号：US06304326B1

    公开(公告)日：2001-10-16

    申请号：US09247121

    申请日：1999-02-08

    申请人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

    发明人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

    IPC分类号： G01J400

    CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

    摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

    MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS
    12.
    发明申请
    MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS 失效
    具有多个波长的调制反射测量系统

    公开(公告)号：US20080309943A1

    公开(公告)日：2008-12-18

    申请号：US12185297

    申请日：2008-08-04

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

    IPC分类号： G01N21/55

    CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

    摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

    摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

    Modulated reflectance measurement system with fiber laser technology
    13.
    发明授权
    Modulated reflectance measurement system with fiber laser technology 失效

    公开(公告)号：US07079249B2

    公开(公告)日：2006-07-18

    申请号：US10453146

    申请日：2003-06-03

    申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik

    发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik

    IPC分类号： G01N21/00 ,  G01N21/55

    CPC分类号： G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501

    摘要： A modulated reflectance measurement system includes two diode-based lasers for generating a probe beam and an intensity modulated pump beam. The pump and probe beams are joined into a collinear beam using a laser diode power combiner. One or more optical fibers are used to transport the beams either before and/or after they are combined. The collinear beam is focused through one or more lenses or other optical components for collimation. The collinear beam is then focused by an objective lens onto a sample. Reflected energy returns through an objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A processor uses the Q and/or I signals to analyze the sample.

    Self-calibrating beam profile ellipsometer
    14.
    发明授权
    Self-calibrating beam profile ellipsometer 有权
    自校准光束轮廓椭偏仪

    公开(公告)号：US07054006B2

    公开(公告)日：2006-05-30

    申请号：US10782321

    申请日：2004-02-19

    申请人： Haiming Wang ,  Jeffrey T. Fanton ,  Lanhua Wei

    发明人： Haiming Wang ,  Jeffrey T. Fanton ,  Lanhua Wei

    IPC分类号： G01N21/00

    CPC分类号： G01J4/00

    摘要： A real-time calibration method for beam profile ellipsometry systems includes projecting an electromagnetic probe beam having a known polarization state though an objective lens onto the surface of a subject and collecting the reflected probe beam using the same objective. The reflected probe beam is then passed through a rotating compensator and analyzer before being received by a detector. A processor performs a harmonic analysis on the detector output to determine normalized Fourier coefficients. The processor uses Fourier coefficients to measure the retardation δB and the azimuth angle QB of the objective lens; and uses the retardation δB and the azimuth angle QB to identify the ellipsometric effects of the objective lens.

    摘要翻译： 用于光束轮廓椭圆测量系统的实时校准方法包括：通过物镜将具有已知偏振状态的电磁探测光束投影到被摄体的表面上，并使用相同的目标收集反射的探测光束。 然后在被检测器接收之前，将反射的探测光束通过旋转补偿器和分析仪。 处理器对检测器输出执行谐波分析以确定归一化傅里叶系数。 处理器使用傅立叶系数来测量物镜的延迟增益B＆lt; B＆gt;和方位角Q B B＆lt; B SUB; 并且使用延迟增益B＆lt; B＆gt;和方位角Q B B来识别物镜的椭偏效应。

    SYSTEM AND METHOD FOR CHARACTERIZING A FILM BY X-RAY PHOTOELECTRON AND LOW-ENERGY X-RAY FLUORESCENCE SPECTROSCOPY
    19.
    发明申请
    SYSTEM AND METHOD FOR CHARACTERIZING A FILM BY X-RAY PHOTOELECTRON AND LOW-ENERGY X-RAY FLUORESCENCE SPECTROSCOPY 有权
    用X射线光电子和低能量X射线荧光光谱表征薄膜的系统和方法

    公开(公告)号：US20130077742A1

    公开(公告)日：2013-03-28

    申请号：US13246488

    申请日：2011-09-27

    申请人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey T. Fanton ,  Rodney Smedt

    发明人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey T. Fanton ,  Rodney Smedt

    IPC分类号： G01N23/223 ,  G21K1/00

    CPC分类号： G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

    摘要： Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

    摘要翻译： 公开了通过X射线光电子能谱（XPS）表征膜的系统和方法。 例如，用于表征胶片的系统可以包括用于产生具有低于硅的k边缘的能量的X射线束的X射线源。 可以包括样品保持器以将样品定位在X射线束的通路中。 可以包括第一检测器以收集通过用X射线束轰击样品而产生的XPS信号。 可以包括第二检测器，用于收集通过用X射线束轰击样品而产生的X射线荧光（XRF）信号。 在分析现场的X射线通量探测器附近和分析现场可以提供监测/估计分析现场的主要X射线通量。 XRF和XPS信号都可以归一化为（估计的）初级X射线通量，以实现膜厚度或剂量测量，而不需要使用信号强度比。