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    Print check repeater defect detection
    11.
    发明授权
    Print check repeater defect detection 有权

    公开(公告)号：US12190498B2

    公开(公告)日：2025-01-07

    申请号：US18072605

    申请日：2022-11-30

    Applicant: KLA Corporation

    Inventor： Nurmohammed Patwary ,  James A. Smith ,  Heonju Shin ,  Jusang Maeng ,  Kenong Wu ,  Xiaochun Li ,  Hucheng Lee

    IPC: G06T7/00 ,  G06T5/50 ,  G06V10/74

    Abstract: Systems and methods for detecting defects on a reticle are provided. One system is configured for generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer based on images generated for the first patterned areas in the different rows. The system is also configured for performing double detection based on the different stacked difference images. The system then identifies defects on the reticle based on the defects detected by the double detection. As described further herein, the systems and methods detect defects from multiple reticle rows printed on a wafer, which can reduce noise and enable detection of substantially small repeater defects. The embodiments are particularly useful for high sensitivity repeater defect detection for extreme ultraviolet (EUV) reticles and multi-die reticles (MDR).

    PRINT CHECK REPEATER DEFECT DETECTION
    12.
    发明公开
    PRINT CHECK REPEATER DEFECT DETECTION 审中-公开

    公开(公告)号：US20240177294A1

    公开(公告)日：2024-05-30

    申请号：US18072605

    申请日：2022-11-30

    Applicant: KLA Corporation

    Inventor： Nurmohammed Patwary ,  James A. Smith ,  Heonju Shin ,  Jusang Maeng ,  Kenong Wu ,  Xiaochun Li ,  Hucheng Lee

    IPC: G06T7/00 ,  G06T5/50 ,  G06V10/74

    CPC classification number: G06T7/001 ,  G06T5/50 ,  G06V10/761 ,  G06T2207/20221 ,  G06T2207/20224 ,  G06T2207/30148

    Abstract: Systems and methods for detecting defects on a reticle are provided. One system is configured for generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer based on images generated for the first patterned areas in the different rows. The system is also configured for performing double detection based on the different stacked difference images. The system then identifies defects on the reticle based on the defects detected by the double detection. As described further herein, the systems and methods detect defects from multiple reticle rows printed on a wafer, which can reduce noise and enable detection of substantially small repeater defects. The embodiments are particularly useful for high sensitivity repeater defect detection for extreme ultraviolet (EUV) reticles and multi-die reticles (MDR).

    Setting Up Inspection of a Specimen
    16.
    发明申请
    Setting Up Inspection of a Specimen 有权

    公开(公告)号：US20220067898A1

    公开(公告)日：2022-03-03

    申请号：US17165826

    申请日：2021-02-02

    Applicant: KLA Corporation

    Inventor： Hong Chen ,  Bjorn Brauer ,  Abdurrahman Sezginer ,  Sangbong Park ,  Ge Cong ,  Xiaochun Li

    IPC: G06T7/00 ,  G01N21/88 ,  G06T3/40

    Abstract: Methods and systems for setting up inspection of a specimen are provided. One system includes one or more computer subsystems configured for acquiring a reference image for a specimen and modifying the reference image to fit the reference image to a design grid thereby generating a golden grid image. The one or more computer subsystems are also configured for storing the golden grid image for use in inspection of the specimen. The inspection includes aligning a test image of the specimen generated from output of an inspection subsystem to the golden grid image.

    Unsupervised Learning-Based Reference Selection for Enhanced Defect Inspection Sensitivity
    17.
    发明申请
    Unsupervised Learning-Based Reference Selection for Enhanced Defect Inspection Sensitivity 有权

    公开(公告)号：US20210090229A1

    公开(公告)日：2021-03-25

    申请号：US17013264

    申请日：2020-09-04

    Applicant: KLA Corporation

    Inventor： Bjorn Brauer ,  Nurmohammed Patwary ,  Sangbong Park ,  Xiaochun Li

    IPC: G06T7/00 ,  G06K9/62 ,  G06T5/00 ,  G06T5/50

    Abstract: An optical characterization system and a method of using the same are disclosed. The system comprises a controller configured to be communicatively coupled with one or more detectors configured to receive illumination from a sample and generate image data. One or more processors may be configured to receive images of dies on the sample, calculate dissimilarity values for all combinations of the images, perform a cluster analysis to partition the combinations of the images into two or more clusters, generate a reference image for a cluster of the two or more clusters using two or more of the combinations of the images in the cluster; and detect one or more defects on the sample by comparing a test image in the cluster to the reference image for the cluster.

    Detecting defects on specimens
    19.
    发明授权
    Detecting defects on specimens 有权

    公开(公告)号：US12190500B2

    公开(公告)日：2025-01-07

    申请号：US18178519

    申请日：2023-03-05

    Applicant: KLA Corporation

    Inventor： Chunwei Song ,  Siqing Nie ,  Weifeng Zhou ,  Xiaochun Li ,  Sangbong Park

    IPC: G06T7/00 ,  G06V10/74

    Abstract: Methods and systems for detecting defects on a specimen are provided. One system computes different candidate reference images from different combinations of images of the specimen generated by an inspection subsystem and combines different portions of the candidate reference images without modification to thereby generate a final reference image. The final reference image is then used for defect detection, which may be single or double detection. The embodiments are particularly useful for defect detection in areas of specimens including only non-resolvable, repeating device patterns, like cell regions, but may be used for inspection of other types of areas as well.

    System and method for inspection using tensor decomposition and singular value decomposition
    20.
    发明授权
    System and method for inspection using tensor decomposition and singular value decomposition 有权

    公开(公告)号：US11431976B2

    公开(公告)日：2022-08-30

    申请号：US16744301

    申请日：2020-01-16

    Applicant: KLA Corporation

    Inventor： Nurmohammed Patwary ,  Richard Wallingford ,  James A. Smith ,  Xiaochun Li ,  Vladimir Tumakov ,  Bjorn Brauer

    IPC: G06K9/00 ,  H04N19/126 ,  H04N19/60 ,  G01N21/95

    Abstract: A sample characterization system is disclosed. In embodiments, the sample characterization system includes a controller communicatively coupled to an inspection sub-system, the controller including one or more processors configured to execute a set of program instructions stored in memory, the set of program instructions configured to cause the one or more processors to: acquire one or more target image frames of a sample; generate a target tensor with the one or more acquired target image frames; perform a first set of one or more decomposition processes on the target tensor to generate one or more reference tensors including one or more reference image frames; identify one or more differences between the one or more target image frames and the one or more reference image frames; and determine one or more characteristics of the sample based on the one or more identified differences.

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