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    Gas enclosure assembly and system
    11.
    发明授权
    Gas enclosure assembly and system 有权
    气体罩组件和系统

    公开(公告)号：US09048344B2

    公开(公告)日：2015-06-02

    申请号：US13802304

    申请日：2013-03-13

    Applicant: KATEEVA, INC.

    Inventor： Justin Mauck ,  Alexander Sou-Kang Ko ,  Eliyahu Vronsky ,  Shandon Alderson

    IPC: B05C11/00 ,  C23C14/00 ,  H01L33/00 ,  H01L21/67 ,  F24F3/16

    CPC classification number: B41J29/377 ,  B41J2/16508 ,  B41J2/1652 ,  B41J2/16523 ,  B41J2/16535 ,  B41J29/13 ,  B41J29/17 ,  F24F3/1607 ,  H01L21/6719 ,  H01L33/005 ,  H01L51/0005 ,  H01L51/0029 ,  H01L51/56 ,  H01L2924/0002 ,  Y10T29/49718 ,  H01L2924/00

    Abstract: The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.

    Abstract translation: 本教导涉及密封的气体封闭组件和系统的各种实施例，其可以容易地运输和组装，并且提供保持最小的惰性气体体积和最大限度地接近其中封闭的各种装置和装置。 本发明的密封气体封闭组件和系统的各种实施例可以具有以最小化气体外壳组件的内部容积的方式构造的气体外壳组件，同时优化工作空间以适应各种各样的 各种OLED打印系统的脚印。 如此构造的气体外壳组件的各种实施例另外在处理期间从外部提供便利地进入气体外壳组件的内部，并且容易地进入内部进行维护，同时最小化停机时间。

    Low Particle Gas Enclosure Systems and Methods
    12.
    发明申请
    Low Particle Gas Enclosure Systems and Methods 审中-公开
    低颗粒气体封闭系统和方法

    公开(公告)号：US20140290567A1

    公开(公告)日：2014-10-02

    申请号：US14275637

    申请日：2014-05-12

    Applicant: Kateeva, Inc.

    Inventor： Justin Mauck ,  Alexander Sou-Kang Ko ,  Eliyahu Vronsky ,  Shandon Alderson ,  Alexey Stepanov

    IPC: B05C15/00

    CPC classification number: B41J29/02 ,  B05C15/00 ,  B41J29/13 ,  H01L51/56

    Abstract: The present teachings relate to various embodiments of a gas enclosure system that can have various components comprising a particle control system that can provide a low-particle zone proximal to a substrate. Various components of a particle control system can include a gas circulation and filtration system, a low-particle-generating motion system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. In addition to maintaining substantially low levels for each species of various reactive species, including various reactive atmospheric gases, such as water vapor and oxygen, for various embodiments of a gas enclosure system that have a particle control system, an on-substrate particle specification can be readily met. Accordingly, processing of various substrates in an inert, low-particle gas environment according to systems and methods of the present teachings can have substantially lower manufacturing defects.

    Abstract translation: 本教导涉及一种气体封闭系统的各种实施方案，其可以具有各种组分，其包含可提供靠近基底的低颗粒区域的颗粒控制系统。 颗粒控制系统的各种组件可以包括气体循环和过滤系统，用于相对于基板移动打印头组件的低颗粒生成运动系统，服务束壳体排气系统和打印头组件排气系统。 除了为各种各种各样的各种反应性物质（包括各种活性大气气体，例如水蒸汽和氧气）维持基本上低的水平，对于具有颗粒控制系统的气体封闭系统的各种实施方案，基板上颗粒规格可以 很容易遇到 因此，根据本教导的系统和方法在惰性，低颗粒气体环境中处理各种基底可以具有基本上较低的制造缺陷。

    PRINTING SYSTEM ASSEMBLIES AND METHODS
    16.
    发明申请
    PRINTING SYSTEM ASSEMBLIES AND METHODS 有权

    公开(公告)号：US20210086535A1

    公开(公告)日：2021-03-25

    申请号：US17247013

    申请日：2020-11-24

    Applicant: Kateeva, Inc.

    Inventor： Robert B. Lowrance ,  Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Aleksey Khrustalev ,  Karl Mathia ,  Shandon Alderson

    IPC: B41J29/02 ,  B41J3/28 ,  B41J3/407 ,  B41J25/304 ,  B41J11/06

    Abstract: The present teachings disclose various embodiments of a printing system for printing substrate, in which the printing system can be housed in a gas enclosure, where the environment within the enclosure can be maintained as a controlled printing environment. A controlled environment of the present teachings can include control of the type of gas environment within the gas enclosure, the size and level particulate matter within the enclosure, control of the temperature within the enclosure and control of lighting. Various embodiments of a printing system of the present teachings can include a Y-axis motion system and a Z-axis moving plate that are configured to substantially decrease excess thermal load within the enclosure by, for example, eliminating or substantially minimizing the use of conventional electric motors.

    Gas enclosure assembly and system
    17.
    发明授权
    Gas enclosure assembly and system 有权

    公开(公告)号：US10900678B2

    公开(公告)日：2021-01-26

    申请号：US16362595

    申请日：2019-03-22

    Applicant: Kateeva, Inc.

    Inventor： Justin Mauck ,  Alexander Sou-Kang Ko ,  Eliyahu Vronsky ,  Shandon Alderson

    IPC: F24F3/16 ,  B41J29/393 ,  H05B33/10 ,  H01L51/56 ,  F24F3/14 ,  B05B17/00 ,  H01L51/00 ,  B41J29/377 ,  H05B33/02

    Abstract: The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.

    APPARATUS AND TECHNIQUES FOR THERMAL TREATMENT OF ELECTRONIC DEVICES
    18.
    发明申请
    APPARATUS AND TECHNIQUES FOR THERMAL TREATMENT OF ELECTRONIC DEVICES 审中-公开

    公开(公告)号：US20200013649A1

    公开(公告)日：2020-01-09

    申请号：US16421834

    申请日：2019-07-03

    Applicant: Kateeva, Inc.

    Inventor： Conor F. Madigan ,  Eliyahu Vronsky ,  Alexander Sou-Kang Ko ,  Justin Mauck

    IPC: H01L21/67 ,  H01L51/00 ,  H01L21/673

    Abstract: Apparatus and techniques are described herein for use in manufacturing electronic devices. such as can include organic light emitting diode (OLED) devices. Such apparatus and techniques can include using one or more modules having a controlled environment. For example, a substrate can be received from a printing system located in a first processing environment, and the substrate can be provided a second processing environment, such as to an enclosed thermal treatment module comprising a controlled second processing environment. The second processing environment can include a purified gas environment having a different composition than the first processing environment.

    Gas Enclosure Systems and Methods Utilizing Multi-Zone Circulation and Filtration
    19.
    发明申请
    Gas Enclosure Systems and Methods Utilizing Multi-Zone Circulation and Filtration 审中-公开

    公开(公告)号：US20190193436A1

    公开(公告)日：2019-06-27

    申请号：US16242000

    申请日：2019-01-08

    Applicant: Kateeva, Inc.

    Inventor： Justin Mauck ,  Alexander Sou-Kang Ko ,  Eliyahu Vronsky ,  Prahallad Iyengar ,  Digby Pun

    IPC: B41J29/06 ,  H01L51/56 ,  H01L51/00 ,  B41J29/02 ,  B01D46/00 ,  B41J29/377 ,  B41J2/01

    CPC classification number: B41J29/06 ,  B01D46/0039 ,  B41J2/01 ,  B41J29/02 ,  B41J29/377 ,  H01L51/0004 ,  H01L51/56

    Abstract: The present teachings relate to various embodiments of a gas enclosure system that can have a particle control system that can include a multi-zone gas circulation and filtration system, a low-particle-generating X-axis linear bearing system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. Various components of a particle control system can include a tunnel circulation and filtration system that can be in flow communication with bridge circulation and filtration system. Various embodiments of a tunnel circulation and filtration system can provide cross-flow circulation and filtration of gas about a floatation table of a printing system. Various embodiments of a gas enclosure system can have a bridge circulation and filtration system that can provide circulation and filtration of gas about a printing system bridge and related apparatuses and devices. Accordingly, various embodiments of a gas circulation and filtration system as disclosed herein can effectively remove both airborne particulate matter, as well as particulate matter generated proximal to a substrate during a printing process. As such, various embodiments of a gas circulation and filtration system in conjunction with various embodiments of a gas purification system of the present teachings can provide for a controlled manufacturing environment resulting in a high-yield of OLED various devices.

    Gas enclosure systems and methods utilizing multi-zone circulation and filtration
    20.
    发明授权
    Gas enclosure systems and methods utilizing multi-zone circulation and filtration 有权

    公开(公告)号：US10214037B2

    公开(公告)日：2019-02-26

    申请号：US15839942

    申请日：2017-12-13

    Applicant: Kateeva, Inc.

    Inventor： Justin Mauck ,  Alexander Sou-Kang Ko ,  Eliyahu Vronsky ,  Prahallad Iyengar ,  Digby Pun

    IPC: B41J29/377 ,  B41J29/06 ,  B41J29/02 ,  B01D46/00 ,  B41J2/01 ,  H01L51/00 ,  H01L51/56

    Abstract: The present teachings relate to various embodiments of a gas enclosure system that can have a particle control system that can include a multi-zone gas circulation and filtration system, a low-particle-generating X-axis linear bearing system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. Various components of a particle control system can include a tunnel circulation and filtration system that can be in flow communication with bridge circulation and filtration system. Various embodiments of a tunnel circulation and filtration system can provide cross-flow circulation and filtration of gas about a floatation table of a printing system. Various embodiments of a gas enclosure system can have a bridge circulation and filtration system that can provide circulation and filtration of gas about a printing system bridge and related apparatuses and devices. Accordingly, various embodiments of a gas circulation and filtration system as disclosed herein can effectively remove both airborne particulate matter, as well as particulate matter generated proximal to a substrate during a printing process. As such, various embodiments of a gas circulation and filtration system in conjunction with various embodiments of a gas purification system of the present teachings can provide for a controlled manufacturing environment resulting in a high-yield of OLED various devices.

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