公开(公告)号：US06950545B1

公开(公告)日：2005-09-27

申请号：US09698810

申请日：2000-10-26

申请人： Mineo Nomoto ,  Daiske Katsuta ,  Toshio Asano ,  Kaoru Sakai ,  Tetsuo Taguchi ,  Isao Tanaka

发明人： Mineo Nomoto ,  Daiske Katsuta ,  Toshio Asano ,  Kaoru Sakai ,  Tetsuo Taguchi ,  Isao Tanaka

IPC分类号： G01N27/82 ,  G01N21/91 ,  G06K9/00 ,  G01J4/00 ,  G01N21/00

CPC分类号： G06K9/4652 ,  G01N21/91

摘要： The present invention relates to a method for inspecting a crack in a metal surface or the like, and, particularly, to an inspection method and apparatus for nondestructive inspection such as liquid penetrant inspection and magnetic particle testing. The present invention provides a flaw inspection method that essentially comprises the steps of illuminating a surface of a sample to be inspected, obtaining an image of the surface, characterizing a potential flaw on the inspected surface by processing the obtained image, displaying an image of the potential flaw, verifying that the potential flaw is a true flaw, and storing an image of the verified flaw in memory.

公开(公告)号：US5301248A

公开(公告)日：1994-04-05

申请号：US904892

申请日：1992-06-25

申请人： Ninomiya Takanori ,  Kazushi Yoshimura ,  Mineo Nomoto

发明人： Ninomiya Takanori ,  Kazushi Yoshimura ,  Mineo Nomoto

IPC分类号： G01R31/308 ,  G06T7/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G01R31/308 ,  G06T7/0006 ,  G06T2207/20036 ,  G06T2207/20144 ,  G06T2207/30141

摘要： A detected pattern is binarized, the binarized pattern is expanded, an image size is reduced while a connectivity of the expanded pattern is preserved and stored in a first memory. In turn, the binarized pattern is contracted, the image size is reduced while a connectivity of the contracted pattern is preserved and stored in a second memory. Then the expanded pattern is read out from the first memory and a connectivity of the pattern is selected. The contracted pattern is read out from the second pattern and the connectivity of the pattern is extracted. The selected connectivities are compared with the connectivity of a normal pattern to detect a non-coincidence. The circuit pattern having a short circuit or a semi-short circuit defect and a circuit pattern having an open circuit or a semi-open circuit defect are classified and selected in response to these non-coincidences. Further, a pattern shape stored in the first memory is analyzed to specify the position where the short circuit or a semi-short circuit defect is present.

摘要翻译： 检测到的图案被二值化，二值化图案被扩展，图像尺寸减小，而扩展图案的连接被保存并存储在第一存储器中。 反过来，二进制图案被缩小，图像尺寸减小，而合同图案的连接被保存并存储在第二存储器中。 然后，从第一存储器读出扩展模式，并且选择模式的连接。 从第二模式读出收缩模式，并提取模式的连接。 将所选择的连接性与正常模式的连接进行比较以检测不重合。 具有短路或半短路缺陷的电路图案以及具有开路或半开路缺陷的电路图案被分类并响应于这些非重合而选择。 此外，分析存储在第一存储器中的图案形状以指定存在短路或半短路缺陷的位置。

公开(公告)号：US08629985B2

公开(公告)日：2014-01-14

申请号：US13605395

申请日：2012-09-06

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01Q20/02 ,  G01B9/02014 ,  G01B9/02057 ,  G01B9/02058 ,  G01B9/02076 ,  G01B2290/45 ,  G01B2290/70 ,  G01S17/50

摘要： A displacement measurement method, an apparatus thereof, and a probe microscope. which enable stable measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air and mechanical vibration. A pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. An optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.

摘要翻译： 位移测量方法，其装置和探针显微镜。 这使得能够以亚纳米级或更低的精度稳定地测量被测物体的位移量和移动距离，而不受诸如空气波动和机械振动之类的扰动的影响。 脉冲束被分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束在相对的方向上通过相同的延迟光路被发送到被测物体的一个脉冲周期的延迟，然后被测量对象反射。 通过对两束脉冲光束进行干涉而获得由测量对象的运动引起的光学相位变化。

公开(公告)号：US08284406B2

公开(公告)日：2012-10-09

申请号：US12063860

申请日：2006-08-09

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01Q20/02 ,  G01B9/02014 ,  G01B9/02057 ,  G01B9/02058 ,  G01B9/02076 ,  G01B2290/45 ,  G01B2290/70 ,  G01S17/50

摘要： The present invention provides a displacement measurement method, an apparatus thereof, a probe microscope. which make it possible to stably measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air, mechanical vibration.Specifically, with the present invention, a pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. Then, an optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.

摘要翻译： 本发明提供一种位移测量方法，其装置，探针显微镜。 这使得可以在不受空气波动，机械振动等干扰的影响的情况下以亚纳米级或更低的精度来稳定地测量被测物体的位移量和移动距离。 具体地说，利用本发明，将脉冲光束分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束以相同的方向通过相同的延迟光路，直到被测物体的延迟为一个脉冲周期，然后被测量对象反射。 然后，通过对两个脉冲光束进行干涉来获得由测量对象的运动引起的光学相位变化。

公开(公告)号：US07834353B2

公开(公告)日：2010-11-16

申请号：US12021714

申请日：2008-01-29

申请人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

发明人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

IPC分类号： H01L31/0376 ,  H01L21/00

CPC分类号： H01L29/04 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0665 ,  B23K26/0732 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02683 ,  H01L21/268 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/66757 ,  H01L29/78675

摘要： A TFT device having a pixel portion and a driving circuit portion formed on a glass substrate; wherein at least the active layer (active region) of a transistor constituting said driving circuit comprises polycrystalline silicon including crystals that do not have crystal grain boundaries which cross the direction of current flow.

摘要翻译： 一种具有形成在玻璃基板上的像素部分和驱动电路部分的TFT器件; 其中构成所述驱动电路的晶体管的至少有源层（有源区）包括多晶硅，其包括不具有与电流流动方向交叉的晶界的晶体。

公开(公告)号：US20080145517A1

公开(公告)日：2008-06-19

申请号：US11834036

申请日：2007-08-06

申请人： Hideaki SASAZAWA ,  Mineo Nomoto ,  Kouji Kashiwagi ,  Shigeru Saitou ,  Tomohiko Murase

发明人： Hideaki SASAZAWA ,  Mineo Nomoto ,  Kouji Kashiwagi ,  Shigeru Saitou ,  Tomohiko Murase

IPC分类号： C23C14/54

CPC分类号： H01J11/42 ,  H01J9/227 ,  H01J11/12

摘要： A method for manufacturing a plasma display comprises: a phosphor painting process for painting phosphor layer in ribs formed on a back plate; and a phosphor inspection process that includes the steps of: irradiating the phosphor layer with ultraviolet light; preparing an imaging system so that the imaging system images the emitted light beam to acquire information on brightness; comparing the brightness information with correlation between a shape model of the phosphor layer and brightness signal information that have been obtained in advance; and obtaining a painted state of the phosphor layer painted in the ribs; and a process for feeding back the applied state of the phosphor layer, which has been obtained in the phosphor inspection process, to the phosphor painting process so that the manufacturing equipment is controlled in the phosphor painting process.

摘要翻译： 一种等离子体显示器的制造方法，其特征在于，包括：在背板上形成的肋上喷涂荧光体层的荧光体涂布工序; 以及荧光体检查处理，其包括以下步骤：用紫外光照射荧光体层; 准备成像系统，使得成像系统对发射的光束进行成像以获取关于亮度的信息; 将亮度信息与荧光体层的形状模型和预先获得的亮度信号信息之间的相关性进行比较; 并且获得在所述肋中涂覆的荧光体层的涂漆状态; 以及将在荧光体检查处理中获得的荧光体层的施加状态反馈到荧光体涂布工序，使得在荧光体涂布工序中控制制造设备的处理。

公开(公告)号：US07119908B2

公开(公告)日：2006-10-10

申请号：US10082430

申请日：2002-02-22

申请人： Mineo Nomoto ,  Takenori Hirose ,  Keiya Saito

发明人： Mineo Nomoto ,  Takenori Hirose ,  Keiya Saito

IPC分类号： G01B11/02

CPC分类号： B24B37/013 ,  B24B49/12 ,  G01B11/0683 ,  G01N21/55 ,  G01N21/8422

摘要： A manufacturing method and manufacturing device for high-precision thin film devices is disclosed, whereby the film thickness and film thickness distribution of a transparent film is measured to a high degree of accuracy during a CMP process without being affected by the film thickness distribution between LSI regions or within the semiconductor wafer surface generated by CMP processing. Film thickness is measured by specifying relatively level measurement regions, according to a characteristic quantity of the spectral waveform of the reflected light from the transparent film, such as the reflection intensity, frequency spectrum intensity, or the like, thereby permitting highly accurate control of film thickness. The leveling process in CMP processing can be optimized on the basis of the film thickness distribution. The film deposition conditions in the film deposition stage and the etching conditions in the etching stage can also be optimized. Accordingly, a high-precision semiconductor device can be manufactured.

摘要翻译： 公开了一种用于高精度薄膜器件的制造方法和制造装置，其中在CMP处理期间以高精度测量透明膜的膜厚度和膜厚度分布，而不受LSI之间的膜厚度分布的影响 区域或通过CMP处理产生的半导体晶片表面内。 根据来自透明膜的反射光的光谱波形的特征量，例如反射强度，频谱强度等，通过指定相对水平的测量区域来测量膜厚度，从而允许对膜的高精度控制 厚度。 可以根据膜厚分布优化CMP加工中的流平过程。 也可以优化膜沉积阶段的成膜条件和蚀刻阶段的蚀刻条件。 因此，可以制造高精度半导体器件。

公开(公告)号：US06897079B2

公开(公告)日：2005-05-24

申请号：US09800495

申请日：2001-03-08

申请人： Takenori Hirose ,  Mineo Nomoto ,  Hiroyuki Kojima ,  Hidemi Sato

发明人： Takenori Hirose ,  Mineo Nomoto ,  Hiroyuki Kojima ,  Hidemi Sato

IPC分类号： B24B53/00 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  B24B53/017 ,  H01L21/304 ,  H01L21/306 ,  H01L21/66 ,  H01L21/302

CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/12

摘要： Laser sources output laser lights L1 and L2 having different wavelengths so as to increase an accuracy of an endpoint detection of polishing processing by enabling an accurate detection of a film thickness of a layer insulating film on a surface of a wafer to be polished by the CMP processing, the lights are emitted from a detection window via a beam splitter to the layer insulating film formed on the surface of the wafer to be polished by a pad, different optical detectors detect interference lights corresponding to the laser lights L1 and L2 reflected and generated from a surface of the layer insulating film and a pattern under the surface via the detection window, the beam splitter, and a dichroic mirror, the detection results are supplied to a film thickness evaluation unit 7, a film thickness of the layer insulation film is detected on the basis of a relationship between intensities of the reflected interference lights to the laser lights L1 and L2 or the intensity ratio, and an endpoint of polishing processing is determined when the film thickness is equal to a predetermined value.

摘要翻译： 激光源输出具有不同波长的激光L 1和L 2 2，以便通过能够精确地检测到膜厚度的精确检测来提高抛光加工的终点检测的精度 通过CMP处理在待抛光的晶片的表面上的层绝缘膜，光从检测窗通过分束器发射到通过垫进行抛光的晶片表面上形成的层绝缘膜，不同的 光检测器检测对应于从层绝缘膜的表面反射和产生的激光L 1和L 2 2的干涉光，以及通过检测窗口在表面下方的图案 分束器和分色镜，将检测结果提供给膜厚评估单元7，根据反射干涉光的强度与激光束之间的关系来检测层间绝缘膜的膜厚度 ts L 1和L 2 2或强度比，并且当膜厚度等于预定值时确定抛光处理的终点。

公开(公告)号：US5973777A

公开(公告)日：1999-10-26

申请号：US880543

申请日：1997-06-23

申请人： Mineo Nomoto ,  Takanori Ninomiya ,  Yuji Takagi

发明人： Mineo Nomoto ,  Takanori Ninomiya ,  Yuji Takagi

IPC分类号： G01N21/88 ,  G01N21/00 ,  G01B11/24 ,  G01B11/30

CPC分类号： G01N21/88

摘要： In order to detect a local shape defect on an inner surface of an ordinary plane member with a high degree of accuracy as a state distinguished from a big waviness deformation, a surface-shape-defect inspecting method and apparatus for identifying the shape defect on the inner surface of the plane member is provided. The method and apparatus provides for scanning optically the entire area of the plane member, extracting a shape of the surface of the plane member as absolute height displacement data at scanning positions, finding a difference between a reference surface shape inferred from the extracted shape of the surface of the plane member and the shape of the surface, and using the difference as relative height displacement data with respect to the reference surface shape, and detecting the shape defect on the surface by identifying the location of the shape defect through comparison of the relative height displacement data with predetermined allowable displacement.

摘要翻译： 为了高精度地检测普通平面构件的内表面上的局部形状缺陷作为与大波纹变形不同的状态，可以使用表面形状缺陷检查方法和装置来识别形状缺陷 提供了平面构件的内表面。 该方法和装置提供扫描平面构件的整个区域的光学扫描，将平面构件的表面的形状作为扫描位置处的绝对高度位移数据提取，从提取的形状推定出的参考表面形状之间的差异 平面构件的表面和表面的形状，并且使用该差作为相对于参考表面形状的相对高度位移数据，并且通过相对于参考表面形状的比较来识别形状缺陷的位置来检测表面上的形状缺陷 具有预定允许位移的高度位移数据。

公开(公告)号：US07612889B2

公开(公告)日：2009-11-03

申请号：US11188732

申请日：2005-07-26

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。