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    METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN
    16.
    发明申请
    METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN 审中-公开
    用于检查图案的方法及其装置

    公开(公告)号：US20080002876A1

    公开(公告)日：2008-01-03

    申请号：US11853500

    申请日：2007-09-11

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

    摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。

    Method and its apparatus for inspecting a pattern
    17.
    发明授权
    Method and its apparatus for inspecting a pattern 有权
    检查图案的方法及其装置

    公开(公告)号：US07269280B2

    公开(公告)日：2007-09-11

    申请号：US10062632

    申请日：2002-02-05

    申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Maki Tanaka ,  Asahiro Kuni ,  Chie Shishido ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

    摘要翻译： 在图案检查装置中，将可以预期相同图案的位置的图像彼此进行比较。 然而，通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题，在高灵敏度条件下检测到的缺陷被认为是缺陷候选，并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外，将如此获得的临界阈值与多个阈值进行比较，从而允许在单次检查中获得多个检查结果。

    Visual inspection method and apparatus therefor
    19.
    发明授权
    Visual inspection method and apparatus therefor 失效
    目视检查方法及其设备

    公开(公告)号：US06587581B1

    公开(公告)日：2003-07-01

    申请号：US09006371

    申请日：1998-01-12

    申请人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

    发明人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

    IPC分类号： G06K900

    CPC分类号： G06T7/001 ,  G01N21/8851 ,  G01N21/95607 ,  G06T5/008 ,  G06T5/40 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2817

    摘要： The present invention provides a scanning electron microscope (SEM) or optical inspection method and apparatus which correct differences in brightness between comparison images and thus which is capable of detecting a fine defect with a high degree of reliability without causing any false defect detection. According to the present invention, the brightness values of a pattern, which should be essentially the same, contained in two detected images to be compared are corrected in such a manner that, even if there may be a brightness difference in a portion free from defects, the brightness difference is reduced to such a degree so that it can be recognized as a normal portion. Also, a limit for the amount of correction is furnished in advance, and correction exceeding such limit value is not performed. Such correction prevents the difference in brightness that should be permitted as non-defective from being falsely recognized as a defect without overlooking great differences in brightness due to a defect.

    摘要翻译： 本发明提供了一种扫描电子显微镜（SEM）或光学检查方法和装置，其校正比较图像之间的亮度差异，从而能够以高可靠性检测精细缺陷而不引起任何假缺陷检测。 根据本发明，将要被比较的两个检测图像中包含的基本上相同的图案的亮度值以这样的方式进行校正：即使在没有缺陷的部分中可能存在亮度差 ，亮度差降低到这样的程度，从而可以将其识别为正常部分。 此外，预先提供校正量的限制，并且不执行超过该限制值的校正。 这样的校正可以防止由于缺陷而将不允许的亮度差错误地识别为缺陷，而不会因为缺陷而忽略亮度的很大差异。