公开(公告)号：US20130189504A1

公开(公告)日：2013-07-25

申请号：US13619525

申请日：2012-09-14

申请人： Paul Franklin Nealey ,  Huiman Kang ,  Guoliang Liu ,  Hiroshi Yoshida ,  Yashuhiko Tada ,  Juan Jose De Pablo ,  Abelardo Ramirez-Hernandez

发明人： Paul Franklin Nealey ,  Huiman Kang ,  Guoliang Liu ,  Hiroshi Yoshida ,  Yashuhiko Tada ,  Juan Jose De Pablo ,  Abelardo Ramirez-Hernandez

IPC分类号： B32B3/10 ,  B32B37/14

CPC分类号： B32B3/10 ,  B32B37/14 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T428/24851

摘要： Provided are methods of fabricating thin film structures that involve assembling block copolymer materials in the presence of condensed phase surfaces on both sides of the thin film, at least one of which is a chemically patterned surface configured to direct the assembly of the block copolymer material. According to various embodiments, the other of the condensed phase surfaces can be a chemically homogenous surface or a chemically patterned surface. Also provided are structures, morphologies, and templates formed in the domain structure of block copolymer materials. In certain embodiments, complex 3-D morphologies and related structures not present in bulk block copolymer materials are provided.

摘要翻译： 提供了制造薄膜结构的方法，其涉及在存在薄膜两侧上的凝聚相表面的情况下组装嵌段共聚物材料，其中至少一个是构造成引导嵌段共聚物材料组装的化学图案化表面。 根据各种实施方案，另一个冷凝相表面可以是化学均匀的表面或化学图案化的表面。 还提供了在嵌段共聚物材料的畴结构中形成的结构，形态和模板。 在某些实施方案中，提供了本体嵌段共聚物材料中不存在的复合体3-D形态和相关结构。

公开(公告)号：US09718250B2

公开(公告)日：2017-08-01

申请号：US13619525

申请日：2012-09-14

申请人： Paul Franklin Nealey ,  Huiman Kang ,  Guoliang Liu ,  Hiroshi Yoshida ,  Yashuhiko Tada ,  Juan Jose De Pablo ,  Abelardo Ramirez-Hernandez

发明人： Paul Franklin Nealey ,  Huiman Kang ,  Guoliang Liu ,  Hiroshi Yoshida ,  Yashuhiko Tada ,  Juan Jose De Pablo ,  Abelardo Ramirez-Hernandez

IPC分类号： B32B3/10 ,  B32B37/14 ,  B82Y30/00 ,  B81C1/00 ,  H01L21/033

CPC分类号： B32B3/10 ,  B32B37/14 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T428/24851

摘要： Provided are methods of fabricating thin film structures that involve assembling block copolymer materials in the presence of condensed phase surfaces on both sides of the thin film, at least one of which is a chemically patterned surface configured to direct the assembly of the block copolymer material. According to various embodiments, the other of the condensed phase surfaces can be a chemically homogenous surface or a chemically patterned surface. Also provided are structures, morphologies, and templates formed in the domain structure of block copolymer materials. In certain embodiments, complex 3-D morphologies and related structures not present in bulk block copolymer materials are provided.

公开(公告)号：US20130230705A1

公开(公告)日：2013-09-05

申请号：US13543667

申请日：2012-07-06

申请人： Paul Franklin Nealey ,  Shengxiang Ji

发明人： Paul Franklin Nealey ,  Shengxiang Ji

IPC分类号： B32B27/28 ,  B32B33/00 ,  B05D3/10

CPC分类号： G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  Y10T428/24851

摘要： Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

摘要翻译： 本文提供了嵌段共聚物薄膜结构和制造方法。 所述方法包括引导ABA三嵌段共聚物的组合，使得所需特征由组装的ABA三嵌段共聚物的结构域形成。 在一些实施方案中，ABA三嵌段共聚物被引导通过化学图案组装。 可以使用与ABA三嵌段共聚物的自然周期大不相同的时期的化学图案来引导ABA三嵌段共聚物的组装。

公开(公告)号：US09580534B2

公开(公告)日：2017-02-28

申请号：US13560016

申请日：2012-07-27

申请人： Paul Franklin Nealey ,  Frank S. Bates ,  Sangwon Kim

发明人： Paul Franklin Nealey ,  Frank S. Bates ,  Sangwon Kim

IPC分类号： C08F8/08 ,  B32B3/10 ,  C08F293/00 ,  C08F297/02 ,  B82Y40/00 ,  C08F236/08 ,  C08F297/04 ,  G03F7/00 ,  G03F7/16 ,  B82Y10/00 ,  C08C19/06 ,  C08F212/08

CPC分类号： C08F297/02 ,  B82Y10/00 ,  B82Y40/00 ,  C08C19/06 ,  C08F8/08 ,  C08F212/08 ,  C08F236/08 ,  C08F297/046 ,  C08F2438/02 ,  G03F7/0002 ,  G03F7/165 ,  Y10T428/24802 ,  C08F220/14 ,  C08F2220/325

摘要： Provided herein are methods of formulating and engineering block copolymer (BCP) systems for directed self-assembly (DSA) processes. In some embodiments, the methods involve engineering a BCP material based on the interaction parameter (χ) of the material and the surface and/or interaction energies of its constituent blocks. Also provided are novel block BCP materials that can be used in DSA techniques. In some embodiments, the BCP systems described herein have micro-phase separating blocks, with at least one block including multiple types of repeat units. Also provided are structures formed by DSA, including structures having a sub-20 nm dimension. Applications included nanolithography for semiconductor devices, fabrication of cell-based assays, nanoprinting, photovoltaic cells, and surface-conduction electron-emitter displays.

摘要翻译： 本文提供了配制和制备用于定向自组装（DSA）方法的嵌段共聚物（BCP）体系的方法。 在一些实施例中，所述方法涉及基于所述材料的相互作用参数（χ）和其组成块的表面和/或相互作用能量来工程化BCP材料。 还提供了可用于DSA技术的新型嵌段BCP材料。 在一些实施例中，本文所述的BCP系统具有微相分离块，其中至少一个块包括多种类型的重复单元。 还提供了由DSA形成的结构，包括具有次20nm尺寸的结构。 应用包括半导体器件的纳米光刻技术，基于细胞的测定法的制造，纳米印刷，光伏电池和表面传导电子发射显示器。

公开(公告)号：US09372398B2

公开(公告)日：2016-06-21

申请号：US13543667

申请日：2012-07-06

申请人： Paul Franklin Nealey ,  Shengxiang Ji

发明人： Paul Franklin Nealey ,  Shengxiang Ji

IPC分类号： B32B27/28 ,  B32B33/00 ,  B05D3/10 ,  G03F7/00 ,  B81C1/00

CPC分类号： G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  Y10T428/24851

摘要： Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

摘要翻译： 本文提供了嵌段共聚物薄膜结构和制造方法。 所述方法包括引导ABA三嵌段共聚物的组合，使得所需特征由组装的ABA三嵌段共聚物的结构域形成。 在一些实施方案中，ABA三嵌段共聚物被引导通过化学图案组装。 可以使用与ABA三嵌段共聚物的自然周期大不相同的时期的化学图案来引导ABA三嵌段共聚物的组装。

公开(公告)号：US08815105B2

公开(公告)日：2014-08-26

申请号：US13036346

申请日：2011-02-28

申请人： Elizabeth Ann Dobisz ,  Ricardo Ruiz ,  Guoliang Liu ,  Paul Franklin Nealey

发明人： Elizabeth Ann Dobisz ,  Ricardo Ruiz ,  Guoliang Liu ,  Paul Franklin Nealey

IPC分类号： B28B7/38 ,  B05D3/10 ,  B05D5/00 ,  G03F7/00 ,  G11B5/855 ,  B81C1/00

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855

摘要： A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold. The disks nanoimprinted by the master mold have reduced defective areas in the transition regions of the chevron servo patterns.

摘要翻译： 用于制造具有最小缺陷的人字形伺服图案的用于纳米压印图案化磁记录盘的母模的方法使用嵌段共聚物的定向自组装。 在母模基板上形成化学改性聚合物刷材料的图案。 该图案包括在这些倾斜条纹组之间的一组倾斜条纹和界面条。 嵌段共聚物材料沉积在图案上，这导致嵌段共聚物的定向自组装作为垂直于衬底的薄片，其形成为嵌段共聚物交替的第一和第二组分的交替倾斜条纹。 该组件也形成在界面条上，而是形成平行于基底的薄片。 然后除去其中一个部件，留下剩余的部件作为栅格，其用作蚀刻基板以形成母模的掩模。 由主模具纳米压印的盘片减少了人字形伺服模式的过渡区域中的缺陷区域。

公开(公告)号：US20140065379A1

公开(公告)日：2014-03-06

申请号：US13601460

申请日：2012-08-31

申请人： Paul Franklin Nealey ,  Hyo Seon Suh ,  Jeong In Lee

发明人： Paul Franklin Nealey ,  Hyo Seon Suh ,  Jeong In Lee

IPC分类号： B32B37/24 ,  B32B3/10

CPC分类号： C08J5/18 ,  G03F7/0002 ,  Y10T428/24802

摘要： Provided are novel methods of fabricating block copolymer thin film structures that allow control over both the lateral structure and vertical orientation of the thin films. In some embodiments, the methods involve directing the assembly of a block copolymer thin film between a chemically patterned surface and a second surface such that the thin film includes domains that are oriented perpendicularly through the thickness of the thin film. In certain embodiments, the second surface can be preferential at least one block of the block copolymer. In certain embodiments, the second surface can be a homopolymer. Also provided are thin film block copolymer structures having perpendicular orientations through the thickness of the thin films. The methods and structures may include block copolymers having large interaction parameters (χ's) and small domain sizes.

摘要翻译： 提供制造嵌段共聚物薄膜结构的新方法，其允许控制薄膜的横向结构和垂直取向。 在一些实施方案中，所述方法包括将嵌段共聚物薄膜的组合引导到化学图案化表面和第二表面之间，使得薄膜包括垂直于薄膜厚度定向的区域。 在某些实施方案中，第二表面可以是优选的至少一个嵌段共聚物嵌段。 在某些实施方案中，第二表面可以是均聚物。 还提供了通过薄膜的厚度具有垂直取向的薄膜嵌段共聚物结构。 方法和结构可以包括具有大的相互作用参数（chi）和小畴尺寸的嵌段共聚物。

公开(公告)号：US20140010990A1

公开(公告)日：2014-01-09

申请号：US13543681

申请日：2012-07-06

申请人： Paul Franklin Nealey ,  Shengxiang Ji

发明人： Paul Franklin Nealey ,  Shengxiang Ji

IPC分类号： B05D5/00 ,  B32B33/00

CPC分类号： B81C1/00111 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24174

摘要： Perpendicular nanostructures with small feature dimensions in thin films and related methods of fabrication are provided. In some embodiments, the methods include directed assembly of poly(styrene-b-glycolic acid) (PS-b-PGA), poly(styrene-b-lactic acid) (PS-b-PLA) and other block copolymers containing PGA or a derivative thereof. The block copolymer films can be directed to assemble on chemical patterns such that the nanostructures extend through the thickness of the film, without forming a wetting layer at the free surface. The nanostructures can have sub-10 nm feature dimensions.

摘要翻译： 提供了薄膜中小特征尺寸的垂直纳米结构和相关制造方法。 在一些实施方案中，所述方法包括聚（苯乙烯-b-乙醇酸）（PS-b-PGA），聚（苯乙烯-b-乳酸）（PS-b-PLA）和包含PGA或其它嵌段共聚物 其衍生物。 嵌段共聚物膜可以被引导以在化学图案上组装，使得纳米结构延伸穿过膜的厚度，而不在自由表面形成润湿层。 纳米结构可以具有低于10nm的特征尺寸。

公开(公告)号：US20120217220A1

公开(公告)日：2012-08-30

申请号：US13036346

申请日：2011-02-28

申请人： Elizabeth Ann Dobisz ,  Ricardo Ruiz ,  Guoliang Liu ,  Paul Franklin Nealey

发明人： Elizabeth Ann Dobisz ,  Ricardo Ruiz ,  Guoliang Liu ,  Paul Franklin Nealey

IPC分类号： B28B7/38 ,  B05D3/10 ,  B05D5/00

CPC分类号： G03F7/0002 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855

摘要： A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold. The disks nanoimprinted by the master mold have reduced defective areas in the transition regions of the chevron servo patterns.

摘要翻译： 用于制造具有最小缺陷的人字形伺服图案的用于纳米压印图案化磁记录盘的母模的方法使用嵌段共聚物的定向自组装。 在母模基板上形成化学改性聚合物刷材料的图案。 该图案包括在这些倾斜条纹组之间的一组倾斜条纹和界面条。 嵌段共聚物材料沉积在图案上，这导致嵌段共聚物的定向自组装作为垂直于衬底的薄片，其形成为嵌段共聚物交替的第一和第二组分的交替倾斜条纹。 该组件也形成在界面条上，而是形成平行于基底的薄片。 然后除去其中一个部件，留下剩余的部件作为栅格，其用作蚀刻基板以形成母模的掩模。 由主模具纳米压印的盘片减少了人字形伺服模式的过渡区域中的缺陷区域。

公开(公告)号：US20160297986A1

公开(公告)日：2016-10-13

申请号：US15043048

申请日：2014-08-14

申请人： Mustafa Serdar ONSES ,  John A. ORGERS ,  Placid FERREIRA ,  Andrew ALLEYNE ,  Paul Franklin NEALEY ,  THE UNIVERSITY OF CHICAGO ,  THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLNOIS

发明人： Mustafa Serdar Onses ,  John A. Rogers ,  Placid Ferreira ,  Andrew Alleyne ,  Paul Franklin Nealey

IPC分类号： C09D153/00 ,  B41J2/06

CPC分类号： C09D153/00 ,  B41J2/06 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  G03F7/0002

摘要： Provided are methods of patterning block copolymer (BCP) films with independent control of the size, periodicity and morphology of the resulting nanoscale domains. Also disclosed are BCP patterns having discrete areas of different self-assembled BCP thin films on a surface, the BCP thin films differing in one or more of molecular weight (MW), composition, morphology, and feature size. In some implementations, multiple BCPs with different MWs can be printed onto a single substrate, thereby providing access to patterns with diverse geometries and feature sizes. The printing approaches can be applied to various BCP chemistries, morphologies and directed self-assembly (DSA) strategies. Also provided are methods of forming BCP thin films on patterns of polymer brushes formed by electrohydrodynamic printing. The methods involve direct, high resolution electrohydrodynamic delivery of random copolymer brushes as surface wetting layers to control the geometries of nanoscale domains in spin-cast and printed BCPs.

摘要翻译： 提供图案化嵌段共聚物（BCP）膜的方法，其独立控制所得纳米尺度域的尺寸，周期和形态。 还公开了在表面上具有不同的自组装BCP薄膜的离散区域的BCP图案，BCP薄膜在分子量（MW），组成，形态和特征尺寸中的一个或多个中不同。 在一些实施方案中，具有不同MW的多个BCP可以印刷到单个基板上，从而提供对具有不同几何形状和特征尺寸的图案的访问。 打印方法可应用于各种BCP化学，形态和定向自组装（DSA）策略。 还提供了通过电动液压印刷形成的聚合物刷的图案上形成BCP薄膜的方法。 该方法涉及直接，高分辨率的电流动力学递送无规共聚物刷作为表面润湿层，以控制旋转铸塑和印刷BCP中纳米级域的几何形状。