公开(公告)号：US5650840A

公开(公告)日：1997-07-22

申请号：US527216

申请日：1995-09-12

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B13/36 ,  G02B7/28 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/52

CPC分类号： G03F9/70

摘要： A method of detecting a focus position of a projection optical system at a high throughput and with high accuracy. A sensor pattern (SP) which is provided on a wafer stage (WS) as a light-receiving part of a photoelectric sensor (PES) is moved in the direction of an optical axis (AX) of a projection optical system (PL), and at the same time, it is moved in a direction (X) perpendicular to the optical axis (AX). While doing so, a reticle pattern (RP) which is provided on a reticle (R) is illuminated by illuminating light (IL) for exposure, and an image of the reticle pattern (RP) is formed on the sensor pattern (SP) through the projection optical system (PL). Light passing through the sensor pattern (SP) is received by the photoelectric sensor (PES), and a focus position is detected on the basis of the intensity of the transmitted light.

摘要翻译： 一种以高吞吐量和高精度检测投影光学系统的聚焦位置的方法。 设置在作为光电传感器（PES）的受光部的晶片台（WS）上的传感器图案（SP）沿着投影光学系统（PL）的光轴（AX）的方向移动， 并且同时沿垂直于光轴（AX）的方向（X）移动。 在这样做的同时，通过用于曝光的照明光（IL）照射设置在掩模版（R）上的掩模版图案（RP），并且在传感器图案（SP）上形成标线图案（RP）的图像，通过 投影光学系统（PL）。 通过传感器图案（SP）的光被光电传感器（PES）接收，并且基于透射光的强度来检测聚焦位置。

公开(公告)号：US5404118A

公开(公告)日：1995-04-04

申请号：US96716

申请日：1993-07-23

申请人： Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

发明人： Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

IPC分类号： H01P1/203 ,  H03H7/01 ,  H03H7/00 ,  H01P7/00

CPC分类号： H01P1/20345 ,  H01P1/20381 ,  H03H7/0123 ,  H03H7/1758 ,  H03H7/1775 ,  H03H2001/0085

摘要： Coil electrodes having a U-shape and shield electrodes having a plane shape are formed on plural dielectric layers. The coil electrodes are connected via through holes which are formed through the dielectric layers, and a spiral electrode is formed. An earth terminal and an input/output terminal are drawn out from the coil electrode to the end portion of the dielectric layer. The shield electrodes are formed on both of the coil electrodes. The dielectric layers are laminated, and the shield electrode and the earth terminal are connected by an external electrode. An external electrode connected to the input/output terminal is formed. A band-pass filter is made by forming plural spiral electrodes and magnetically coupling the spiral electrodes.

摘要翻译： 在多个电介质层上形成具有U形的线圈电极和具有平面形状的屏蔽电极。 线圈电极通过通过电介质层形成的通孔连接，形成螺旋电极。 接地端子和输入/输出端子从线圈电极拉出到电介质层的端部。 屏蔽电极形成在两个线圈电极上。 电介质层被层压，屏蔽电极和接地端子通过外部电极连接。 形成连接到输入/输出端子的外部电极。 通过形成多个螺旋电极并磁耦合螺旋电极来制造带通滤波器。

公开(公告)号：US5400000A

公开(公告)日：1995-03-21

申请号：US112652

申请日：1993-08-26

申请人： Hisatake Okamura ,  Masahiro Kasahara ,  Kenji Ajioka ,  Tetsuo Taniguchi

发明人： Hisatake Okamura ,  Masahiro Kasahara ,  Kenji Ajioka ,  Tetsuo Taniguchi

IPC分类号： H01P1/203 ,  H01P7/08 ,  H03H5/00 ,  H03H7/01 ,  H03H7/00

CPC分类号： H01P1/20381 ,  H01P7/084 ,  H03H5/003 ,  H03H7/0115 ,  H03H2001/0085

摘要： Two coil electrode patterns are formed on one surface of a plate containing a dielectric material. These coil electrode patterns are formed in a loop shape, and disposed in a magnetically connected state with each other. Input/output terminal patterns and earth terminal patterns are drawn out from the coil electrode patterns toward edges on different sides of the plate. The input/output terminal pattern and the earth terminal pattern of one coil electrode pattern are disposed at a selected distance from each other so as to provide a predetermined impedance. An earth electrode pattern is formed opposite the coil electrode patterns with the plate between them. Earth terminal patterns are connected to the earth electrode pattern. The earth terminal patterns of the earth electrode pattern are connected to the earth terminal patterns of the coil electrode patterns. A trimming electrode may be formed for adjusting the passing band frequency of the band-pass filter optionally.

摘要翻译： 在包含介电材料的板的一个表面上形成两个线圈电极图案。 这些线圈电极图案形成为环状，并且彼此以磁性连接状态配置。 输入/输出端子图案和接地端子图案从线圈电极图案向板的不同侧边缘拉出。 一个线圈电极图案的输入/输出端子图案和接地端子图案被设置在彼此选定的距离处，以便提供预定的阻抗。 与线圈电极图案相对地形成接地电极图案，板之间。 接地端子图案连接到接地电极图案。 接地电极图案的接地端子图案连接到线圈电极图案的接地端子图案。 可以形成修整电极，用于可选地调节带通滤波器的通带频率。

公开(公告)号：US5177752A

公开(公告)日：1993-01-05

申请号：US794619

申请日：1991-11-15

申请人： Jun Ohya ,  Tetsuo Taniguchi

发明人： Jun Ohya ,  Tetsuo Taniguchi

IPC分类号： H01S5/06 ,  H01S5/0625

CPC分类号： H01S5/0601 ,  H01S5/0625

摘要： Ultrashort optical pulses of a high peak output are generated by gain-switching of a semiconductor laser possessing a current non-injection region with short current pulses. By coupling this semiconductor laser to a wavelength conversion element, a second harmonic wave is generated, and ultrashort optical pulses of a short wavelength and a high peak output are generated.

摘要翻译： 通过具有短电流脉冲的具有电流非注入区域的半导体激光器的增益切换来产生高峰值输出的超短脉冲光脉冲。 通过将该半导体激光器耦合到波长转换元件，产生二次谐波，并且产生短波长和高峰值输出的超短光脉冲。

公开(公告)号：US08680950B2

公开(公告)日：2014-03-25

申请号：US12880244

申请日：2010-09-13

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H03H7/01

CPC分类号： H01P1/20345 ,  H03H7/09 ,  H03H7/1708 ,  H03H7/1725 ,  H03H7/1775 ,  H03H2001/0085

摘要： In a multilayer bandpass filter, a first capacitor is defined between a first capacitor electrode and a ground electrode. A second capacitor is defined between a second capacitor electrode and the ground electrode. A first inductor is defined by first and second via electrodes and a first inductor electrode. A second inductor is defined by third and fourth via electrodes and a second inductor electrode. Two LC parallel resonators, one of which includes the first inductor and the first capacitor and the other one of which includes the second inductor and the second capacitor, are provided. The second via electrode included in one of the LC parallel resonators and the fourth via electrode included in the other one of the LC parallel resonators are electrically connected to each other by a via coupling electrode.

摘要翻译： 在多层带通滤波器中，在第一电容器电极和接地电极之间限定第一电容器。 在第二电容器电极和接地电极之间限定第二电容器。 第一电感器由第一和第二通孔电极和第一电感器电极限定。 第二电感器由第三和第四通孔电极和第二电感器电极限定。 两个LC并联谐振器，其中之一包括第一电感器和第一电容器，另一个包括第二电感器和第二电容器。 包括在另一个LC并联谐振器中的LC并联谐振器和第四通孔电极之一中的第二通孔电极通过通孔耦合电极彼此电连接。

公开(公告)号：US08482366B2

公开(公告)日：2013-07-09

申请号：US12944810

申请日：2010-11-12

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H03H7/00

CPC分类号： H03H7/09 ,  H03H7/1775 ,  H03H7/42 ,  H03H2001/0085

摘要： A laminated balance filter includes a first capacitor electrode and a ground electrode that are disposed opposite to each other to define a capacitor at an unbalanced side. An unbalanced side coil is provided in a dielectric layer. Three balanced side coils are provided in three dielectric layers. The three balanced side coils preferably have a substantially helical shape and are wound in the same winding directions. The coil located in the center of the three balanced side coils is disposed near the unbalanced side coil so as to be electromagnetic-field-coupled to the unbalanced side coil.

摘要翻译： 层压平衡滤波器包括彼此相对设置以在非平衡侧限定电容器的第一电容器电极和接地电极。 在电介质层中设置不平衡侧线圈。 三个平衡侧线圈设置在三个电介质层中。 三个平衡侧线圈优选地具有大致螺旋形的形状，并且以相同的卷绕方向缠绕。 位于三个平衡侧线圈的中心的线圈设置在不平衡侧线圈附近，以便电磁场耦合到不平衡侧线圈。

公开(公告)号：US20050094115A1

公开(公告)日：2005-05-05

申请号：US11008166

申请日：2004-12-10

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 光学构件OB由污染保护装置98。 或者，设置在给定位置的光学构件OB在不执行图案转印时被污染检查装置84检查，并且基于结果执行图案转印或光学构件的清洁或更换 。

公开(公告)号：US06753948B2

公开(公告)日：2004-06-22

申请号：US10268907

申请日：2002-10-11

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2772

CPC分类号： G03F7/70725 ,  G03B27/42 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70458 ,  G03F7/70525 ,  G03F7/70633

摘要： An apparatus is provided with an illumination optical system for irradiating illumination light from a light source onto a predetermined illumination area on a mask and a projection optical system for projecting a pattern formed on the mask onto a photosensitive substrate. The apparatus synchronously moves the mask and the substrate in predetermined scanning directions perpendicular to an optical axis of the projection optical system thereby to effect scanning exposure of a projected image of the pattern on the substrate. The apparatus comprises a device for inputting information on a distortion of a pattern having been already formed on the substrate, in a direction perpendicular to the scanning directions, and a device for controlling imaging characteristics of the projection optical system, based on the information thus input.

摘要翻译： 一种装置设置有用于将来自光源的照明光照射到掩模上的预定照明区域上的照明光学系统和用于将形成在掩模上的图案投影到感光基板上的投影光学系统。 该装置在与投影光学系统的光轴垂直的预定扫描方向上同步移动掩模和基板，从而实现图案的投影图像在基板上的扫描曝光。 该装置包括用于输入关于已经形成在基板上的图案的失真的信息的设备，在垂直于扫描方向的方向上，以及用于根据所输入的信息控制投影光学系统的成像特性的设备 。

公开(公告)号：US06317195B1

公开(公告)日：2001-11-13

申请号：US09185101

申请日：1998-11-03

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  B60R16/027 ,  B60R21/017 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70891

摘要： A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding the mask and moving the mask within a plane perpendicular to the optical axis of the projection optical system, a substrate stage for moving the photosensitive substrate within a plane conjugate to the plane with respect to the projection optical system, and an imaging characteristic correction system for correcting an imaging characteristic of the projection optical system. The apparatus synchronously moves the mask and the photosensitive substrate along the optical axis of the projection optical system so as to expose the entire pattern surface of the mask. The apparatus includes an incident light intensity input system for inputting the intensity of the illumination light, which is incident on the projection optical system through the mask, in accordance with the position of the mask, and an imaging characteristic calculation device for calculating a variation in imaging characteristic of the projection optical system on the basis of information from the incident light intensity input system. The imaging characteristic correction system is controlled on the basis of a result obtained by the imaging characteristic calculation device.

摘要翻译： 投影曝光装置具有照明光学系统，用于照射来自光源的光，其上形成有预定图案的掩模，用于在感光基板上形成掩模图案的图像的投影光学系统，掩模 用于保持掩模并在与投影光学系统的光轴垂直的平面内移动掩模的阶段，用于在与投影光学系统共面于该平面的平面内移动感光基板的基板台，以及成像特性 用于校正投影光学系统的成像特性的校正系统。 该装置沿着投影光学系统的光轴同步移动掩模和感光基片，以露出掩模的整个图案表面。 该装置包括：入射光强度输入系统，用于根据掩模的位置输入入射在投影光学系统上的照明光的强度;以及成像特征计算装置，用于计算变化 基于来自入射光强输入系统的信息，投影光学系统的成像特性。 基于由成像特征计算装置获得的结果来控制成像特性校正系统。

公开(公告)号：US06304317B1

公开(公告)日：2001-10-16

申请号：US08798003

申请日：1997-02-12

申请人： Tetsuo Taniguchi ,  Naomasa Shiraishi

发明人： Tetsuo Taniguchi ,  Naomasa Shiraishi

IPC分类号： G03B2752

CPC分类号： G03F7/70566 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891 ,  G03F7/70916

摘要： A projection exposure apparatus having an illuminating system for irradiating a mask, which has a pattern, with illuminating light for exposure and a projection optical system having a plurality of optical elements arranged along an optical axis to project an image of a pattern illuminated with light onto a substrate. One of a plurality of optical plates having different optical characteristics is interposed between the pattern and the substrate depending on the pattern. An adjusting system adjusts a characteristic of the projected image based on a calculation using one of a plurality of parameters corresponding to the optical plates, the one parameter being selected in accordance with the one optical plate to compensate for a change in an optical property of the projection optical system caused by the change of the optical plate. The projection exposure apparatus may include an optical filter for making light passing through a partial area, which is centered at an optical axis of the projection optical system and light passing through an area other than the partial area different from each other in phase or transmittance, or for reducing coherence between light passing through the said two areas. The projection exposure apparatus also may include a transparent plate having an optical thickness which is approximately equal to that of the optical filter, in which one of the optical filter and the transparent plate is disposed on a pupil plate of the projection optical system or a plane in the neighborhood of the pupil plane during exposure.

摘要翻译： 一种投影曝光装置，具有用于照射具有图案的掩模的照明系统，该照明系统具有用于曝光的照明光和具有沿光轴布置的多个光学元件的投影光学系统，以将用光照射的图案的图像投影到 底物。 根据图案，在图案和基板之间插入具有不同光学特性的多个光学板中的一个。 调整系统基于使用与光学板对应的多个参数中的一个的计算来调整投影图像的特性，根据该光学板选择一个参数以补偿光学特性的变化 投影光学系统由光学板的变化引起。 投影曝光装置可以包括：滤光器，用于使光通过以投影光学系统的光轴为中心的部分区域，以及通过相位或透射率彼此不同的部分区域以外的区域的光， 或用于减少穿过所述两个区域的光之间的一致性。 投影曝光装置还可以包括具有近似等于滤光器的光学厚度的透明板，其中滤光器和透明板中的一个设置在投影光学系统的光瞳板上或平面 在瞳孔附近曝光。