公开(公告)号：US08354133B2

公开(公告)日：2013-01-15

申请号：US13264714

申请日：2010-04-02

申请人： Midori Sakai ,  Masayuki Murayama

发明人： Midori Sakai ,  Masayuki Murayama

IPC分类号： A23D9/00

CPC分类号： C11C3/00 ,  A23D9/00 ,  C11C3/04 ,  C12P7/6454

摘要： Provided are a modifying agent for a plastic fat to be used in a plastic fat comprising palm oil, which inhibits changes in physical properties of the plastic fat such as hardness or crude crystal formation and gives an air-containing plastic fat; and a plastic fat using the same. A plastic fat is prepared by using, as modifying agent, an appropriate amount of a fat composition which comprised triglycerides comprising, as constituting fatty acids, a saturated fatty acid (A) having a melting point of 60° C. or higher and a saturated fatty acid (B) having a melting point of 40° C. or lower, wherein the fat composition contains 40-85 wt %, relative to the total fat composition, of ABB type triglycerides, and the weight ratio (ABB/AAB) of said ABB type triglycerides o AAB type triglycerides is 2-15.

摘要翻译： 本发明提供一种用于包含棕榈油的塑料脂肪中的塑料脂肪改性剂，其抑制塑料脂肪的物理性质的变化，例如硬度或粗晶形成，并产生含空气的塑料脂肪; 和使用其的塑料脂肪。 通过使用适量的脂肪组合物制备塑料脂肪，所述脂肪组合物包含作为构成脂肪酸的含有熔点为60℃以上的饱和脂肪酸（A）和饱和脂肪酸 脂肪酸（B）的熔点为40℃或更低，其中脂肪组合物相对于总脂肪组成为40-85重量％的ABB型甘油三酯，重量比（ABB / AAB）为 所说的ABB型甘油三酸酯oAAB型甘油三酯是2-15。

公开(公告)号：US06825932B2

公开(公告)日：2004-11-30

申请号：US10212764

申请日：2002-08-07

申请人： Kousuke Suzuki ,  Masayuki Murayama

发明人： Kousuke Suzuki ,  Masayuki Murayama

IPC分类号： G01B1100

CPC分类号： G03F7/70066 ,  G03F7/70133 ,  G03F7/70358 ,  G03F7/706 ,  G03F7/70616

摘要： An exposure apparatus and a method of operating the exposure apparatus. The exposure apparatus includes a light source generating illumination light and a projection optical system. A detector detects illumination light reaching a plurality of measuring positions within an image field of the projection optical system. An illumination area setting and changing device arranged between the light source and the detector sets an illumination area on a mask to illuminate a pattern on the mask, and changes the illumination area during detection of a projected image of the pattern by the detector while illumination light is maintained on the mask. The illumination area setting and changing device changes the illumination area from a first illumination area illuminating a first pattern on the mask to a second illumination area illuminating both the first pattern and a second pattern which differs from the first pattern.

摘要翻译： 曝光装置和操作曝光装置的方法。 曝光装置包括产生照明光的光源和投影光学系统。 检测器检测到达投影光学系统的图像场内的多个测量位置的照明光。 布置在光源和检测器之间的照明区域设置和改变设备设置掩模上的照明区域以照亮掩模上的图案，并且在检测到图案的投影图像的同时改变照明区域，同时照明光 保持在面具上。 照明区域设置和改变装置将照亮面罩上的第一图案的第一照明区域的照明区域改变为照亮与第一图案不同的第一图案和第二图案的第二照明区域。

公开(公告)号：US07061575B2

公开(公告)日：2006-06-13

申请号：US11008166

申请日：2004-12-10

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G03B27/52 ,  G03B27/42 ,  G01N21/00

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 光学构件OB由污染保护装置98。 或者，设置在给定位置的光学构件OB在不执行图案转印时被污染检查装置84检查，并且基于结果执行图案转印或光学构件的清洁或更换 。

公开(公告)号：US06496257B1

公开(公告)日：2002-12-17

申请号：US09577020

申请日：2000-05-22

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G01N2188

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 通过污染保护装置98进行光学构件OB.或者，在不执行图案转印时，检查布置在给定位置处的光学构件OB被污染检查装置84污染，并且图案转印或清洁或更换 基于该结果来执行光学部件。

公开(公告)号：US20120040077A1

公开(公告)日：2012-02-16

申请号：US13264714

申请日：2010-04-02

申请人： Midori Sakai ,  Masayuki Murayama

发明人： Midori Sakai ,  Masayuki Murayama

IPC分类号： A23D7/005 ,  A23D9/007

CPC分类号： C11C3/00 ,  A23D9/00 ,  C11C3/04 ,  C12P7/6454

摘要： Provided are a modifying agent for a plastic fat to be used in a plastic fat comprising palm oil, which inhibits changes in physical properties of the plastic fat such as hardness or crude crystal formation and gives an air-containing plastic fat; and a plastic fat using the same. A plastic fat is prepared by using, as modifying agent, an appropriate amount of a fat composition which comprised triglycerides comprising, as constituting fatty acids, a saturated fatty acid (A) having a melting point of 60° C. or higher and a saturated fatty acid (B) having a melting point of 40° C. or lower, wherein the fat composition contains 40-85 wt %, relative to the total fat composition, of ABB type triglycerides, and the weight ratio (ABB/AAB) of said ABB type triglycerides o AAB type triglycerides is 2-15.

摘要翻译： 本发明提供一种用于包含棕榈油的塑料脂肪中的塑料脂肪改性剂，其抑制塑料脂肪的物理性质的变化，例如硬度或粗晶形成，并产生含空气的塑料脂肪; 和使用其的塑料脂肪。 通过使用适量的脂肪组合物制备塑料脂肪，所述脂肪组合物包含作为构成脂肪酸的含有熔点为60℃以上的饱和脂肪酸（A）和饱和脂肪酸 脂肪酸（B）的熔点为40℃或更低，其中脂肪组合物相对于总脂肪组成为40-85重量％的ABB型甘油三酯，重量比（ABB / AAB）为 所说的ABB型甘油三酸酯oAAB型甘油三酯是2-15。

公开(公告)号：US20050094115A1

公开(公告)日：2005-05-05

申请号：US11008166

申请日：2004-12-10

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 光学构件OB由污染保护装置98。 或者，设置在给定位置的光学构件OB在不执行图案转印时被污染检查装置84检查，并且基于结果执行图案转印或光学构件的清洁或更换 。

公开(公告)号：US06341006B1

公开(公告)日：2002-01-22

申请号：US09422862

申请日：1999-10-25

申请人： Masayuki Murayama ,  Haruo Ozawa

发明人： Masayuki Murayama ,  Haruo Ozawa

IPC分类号： G03B2742

CPC分类号： G03F7/70058 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70883 ,  G03F7/70975 ,  Y10S438/946

摘要： A projection exposure apparatus for projecting a pattern image of an illuminated mask onto a substrate. The optical path can be divided into a plurality of hermetic blocks each having an inert gas sealed therein by a plurality of partition devices. According a one aspect of the invention, a hermetic sealing member is disposed in the space between the substrate-side of the projection optical system and the substrate for replacing the atmosphere existing in the optical path of the illuminating light in that space by a substance other than oxygen. According to another aspect of the invention, a plurality of independent chambers are formed in a frame. Lids, piping, and valves in the chambers are opened or closed in response to the value detected by oxygen density sensors.

摘要翻译： 一种用于将照射的掩模的图案图像投影到基板上的投影曝光装置。 光路可以分为多个密封块，每个密封块具有通过多个分隔装置密封在其中的惰性气体。 根据本发明的一个方面，气密密封部件设置在投影光学系统的基板侧和基板之间的空间中，用于替换存在于该空间中的照明光的光路中的气氛 比氧气。 根据本发明的另一方面，在框架中形成多个独立的室。 响应于由氧浓度传感器检测到的值，腔室中的盖子，管道和阀门被打开或关闭。

公开(公告)号：US06961114B2

公开(公告)日：2005-11-01

申请号：US10446000

申请日：2003-05-27

申请人： Masayuki Murayama ,  Kyoji Nakamura ,  Taro Ogata ,  Susumu Mori

发明人： Masayuki Murayama ,  Kyoji Nakamura ,  Taro Ogata ,  Susumu Mori

IPC分类号： G03F7/20 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70058 ,  G03F7/70808 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70983

摘要： An optical apparatus having at least one optical element arranged along an optical path of an irradiation light. A first hermetic chamber is defined along the optical path separating the optical path from ambient air and charged with a predetermined gas. A second hermetic chamber is located in the first hermetic chamber separating the optical path from the gas in the first hermetic chamber and retaining the optical elements.

摘要翻译： 一种具有沿着照射光的光路布置的至少一个光学元件的光学装置。 沿着将光路与环境空气分开并且充以预定气体的光路限定第一密封室。 第二密封室位于第一密封室中，其将光路与第一密封室中的气体分离并保持光学元件。

公开(公告)号：US06456377B1

公开(公告)日：2002-09-24

申请号：US09456010

申请日：1999-12-07

申请人： Kousuke Suzuki ,  Masayuki Murayama

发明人： Kousuke Suzuki ,  Masayuki Murayama

IPC分类号： G01B1100

CPC分类号： G03F7/70066 ,  G03F7/70133 ,  G03F7/70358 ,  G03F7/706 ,  G03F7/70616

摘要： A disclosed exposure apparatus comprises a photo-electric sensor having a light receiving portion supported by the substrate stage for a shifting movement within the shot area along the plane, a blind disposed between the light source and the project ion optical system and adapted to shield the illumination light reaching the shot area excluding an area surrounding the light receiving portion while the light receiving portion is being shifted along the plane.

摘要翻译： 所公开的曝光装置包括光电传感器，其具有由基板载台支撑的光接收部分，用于在沿着该平面的射出区域内的移动运动;盲设置在光源和投影离子光学系统之间， 当光接收部分沿着平面移动时，照射光到达除了受光部周围的区域之外的照射区域。

公开(公告)号：US06172373B2

公开(公告)日：2001-01-09

申请号：US09419771

申请日：1999-10-18

申请人： Hideaki Hara ,  Yuji Imai ,  Masayuki Murayama

发明人： Hideaki Hara ,  Yuji Imai ,  Masayuki Murayama

IPC分类号： G01N2186

CPC分类号： G03F9/7026 ,  G03F7/707 ,  G03F7/70716 ,  G03F9/7003 ,  G03F9/7034

摘要： An exposure apparatus comprises a projection optical system, which projects a pattern formed on a mask on a photosensitive substrate, a mounting object table, which holds the photosensitive substrate, a positioning stage, which positions the mounting object table along a 2-dimensional movement coordinate system, a stage coordinate measurement device, which detects the position of the mounting object table in the 2-dimensional movement coordinate system, a height measurement device, which detects the deviation in the optical axis direction of the projection optical system from the surface of the photosensitive substrate to a specified standard surface in a measurement point fixed with regard to the 2-dimensional movement coordinate system, a levelling device, which adjusts the inclination of the mounting object table with regard to the positioning stage, a computation device, which calculates the amount of levelling necessary to match the surface of the photosensitive substrate with the standard surface, a control device, which controls the levelling device based on the calculation results of the computation device, and a memory device, which stores the optical axis direction displacement amount of the mounting object table produced at a measurement point when the positioning stage is moved along the 2-dimensional movement coordinate system corresponding to the position of the mounting object table detected by the stage coordinate measurement device, wherein, the computation device calculates the amount of the levelling necessary based on a value obtained by subtracting the optical axis direction displacement amount of the mounting object table stored in the memory device from the deviation detected by the height measurement device.

摘要翻译： 曝光装置包括投影光学系统，其投影形成在感光基板上的掩模上的图案，保持感光基板的安装物台;定位台，其将安装对象台沿着二维运动坐标 系统，台架坐标测量装置，其检测安装对象台在二维运动坐标系中的位置;高度测量装置，其从投影光学系统的表面检测投影光学系统的光轴方向上的偏差; 感光性基板在与二维运动坐标系固定的测量点中的指定的标准表面上，调整装置，其调整安装对象台相对于定位台的倾斜度;计算装置，其计算 与感光基片的表面匹配所需的调平量 基于计算装置的计算结果来控制调平装置的控制装置和存储装置，该存储装置存储在定位阶段为测量点时生成的安装对象工作台的光轴方向位移量 沿着与由平台坐标测量装置检测的安装对象表的位置相对应的二维运动坐标系移动，其中，计算装置基于通过减去光轴方向位移获得的值来计算所需的平整量 根据由高度测量装置检测到的偏差，存储在存储装置中的安装对象表的量。