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18 条记录 (耗时 0.028 秒)

    Microscope, especially microscope used for inspection in semiconductor manufacture
    13.
    发明授权
    Microscope, especially microscope used for inspection in semiconductor manufacture 有权
    显微镜，特别是用于半导体制造检验的显微镜

    公开(公告)号：US07167310B2

    公开(公告)日：2007-01-23

    申请号：US10875934

    申请日：2004-06-24

    申请人： Thomas Engel ,  Wolfgang Harnisch ,  Roland Scheler

    发明人： Thomas Engel ,  Wolfgang Harnisch ,  Roland Scheler

    IPC分类号： G02B13/20 ,  G02B21/06 ,  G02B5/32

    CPC分类号： G02B5/0226 ,  G02B5/02 ,  G02B5/0252 ,  G02B21/16

    摘要： A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.

    摘要翻译： 公开了一种显微镜，特别是用于半导体制造中检查的显微镜。 显微镜包括用于照明的脉冲激光，优选在UV范围内。 至少一个旋转扩散盘设置在激光器的下游，以使照明均匀化。 优选地，具有相反旋转感测的两个旋转扩散盘直接或间接地一个在另一个之后设置在照明光束路径中。

    Device for flat illumination of an object field
    14.
    发明授权
    Device for flat illumination of an object field 失效
    物体场平面照明的装置

    公开(公告)号：US06925225B2

    公开(公告)日：2005-08-02

    申请号：US10473834

    申请日：2002-06-26

    申请人： Thomas Engel ,  Wolfgang Harnisch ,  Juergen Heise

    发明人： Thomas Engel ,  Wolfgang Harnisch ,  Juergen Heise

    IPC分类号： G02B6/00 ,  G02B21/06 ,  G02B21/16 ,  G02B6/26

    CPC分类号： G02B21/06 ,  Y10S385/901

    摘要： The invention is directed to a device for flat illumination of an object field in an optical instrument and to an optical instrument with a device of this kind. Optical instruments of this type are, for example, microscopes, including microlithography simulation microscopes in which a flat illumination, i.e., illumination extending beyond a singular object point, of the object to be examined is required. The device comprises a laser light source and a light-conducting cable with at least one optical fiber through which the light from the laser light source is guided to the object field. The optical fiber is constructed and dimensioned in such a way that the intensity of the illumination light within the cross section of the optical fiber becomes increasingly more uniform along the path from the input-side end to the output-side end, and the illumination light is directed from the output-side end of the optical fiber to the object with substantially homogeneous intensity distribution.

    摘要翻译： 本发明涉及一种用于平面照明光学仪器中的物体的装置以及具有这种装置的光学仪器。 这种类型的光学仪器例如是显微镜，其中包括显微照相模拟显微镜，其中需要待检测对象的平坦照明，即超出单个物体点的照明。 该装置包括激光源和具有至少一个光纤的导光电缆，来自激光光源的光通过该导光线被引导到物场。 光纤被构造和尺寸设计成使得光纤横截面内的照明光的强度沿着从输入侧端到输出侧端的路径变得越来越均匀，照明光 从光纤的输出侧端部以基本均匀的强度分布被引导到物体。

    Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices
    15.
    发明申请
    Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices 审中-公开
    孔径光阑和/或滤光片的布置，具有光学元件的特性

    公开(公告)号：US20060291031A1

    公开(公告)日：2006-12-28

    申请号：US11429428

    申请日：2006-05-08

    申请人： Klaus Boehm ,  Peter Schaeffer ,  Wolfgang Harnisch ,  Thomas Engel ,  Axel Zibold ,  Bernd Geh

    发明人： Klaus Boehm ,  Peter Schaeffer ,  Wolfgang Harnisch ,  Thomas Engel ,  Axel Zibold ,  Bernd Geh

    IPC分类号： G02F1/01

    CPC分类号： G03F7/701 ,  G02B5/005 ,  G02B21/24 ,  G02B26/007

    摘要： An arrangement making use of two-dimensional arrays consisting of individually controllable elements, for forming aperture diaphragms in the beam paths of optical devices. In an arrangement of diaphragm apertures and/or filters, in which the form, position and/or optical characteristics can be changed, for use in optical devices, at least one two-dimensional array, consisting of individually controllable elements, is arranged for forming the diaphragm apertures and/or filters in the optical imaging and/or illumination beam paths and is connected with a control unit for controlling the individual elements In this way, the geometry, the optical characteristics and/or the position of the aperture diaphragms and/or the filters can be controlled very quickly. These changes can also be made “online” during the process of measurement or adjustment in the sense of optical fine tuning. Furthermore, using these systems, the elaborate and time consuming preparation of the diaphragm apertures with geometric forms can be omitted.

    摘要翻译： 使用由独立可控元件组成的二维阵列的装置，用于在光学装置的光束路径中形成孔径光阑。 在其中可以改变形式，位置和/或光学特性的隔膜孔和/或滤光器的布置中，用于光学装置中，布置有由独立可控元件组成的至少一个二维阵列，用于形成 光学成像和/或照明光束路径中的隔膜孔和/或滤光器，并与用于控制各个元件的控制单元连接。以这种方式，孔径光阑的几何形状，光学特性和/或位置和/ 或者可以非常快速地控制过滤器。 这些变化也可以在光学微调的测量或调整过程中“联机”。 此外，使用这些系统，可以省略精细和耗时的几何形式的隔膜孔的准备。

    Method and arrangement for repairing photolithography masks
    16.
    发明授权
    Method and arrangement for repairing photolithography masks 有权
    修复光刻掩模的方法和布置

    公开(公告)号：US07916930B2

    公开(公告)日：2011-03-29

    申请号：US11900946

    申请日：2007-09-14

    申请人： Axel Zibold ,  Wolfgang Harnisch ,  Oliver Kienzle

    发明人： Axel Zibold ,  Wolfgang Harnisch ,  Oliver Kienzle

    IPC分类号： G06K9/00

    CPC分类号： G03F1/72 ,  G03F1/84

    摘要： A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect, and these defects are repaired.

    摘要翻译： 用于修复光刻掩模的方法和装置，其中检查光刻掩模是否存在缺陷，并且产生缺陷的列表，其中至少一种类型的缺陷，其范围及其在光刻掩模上的位置 被分配给每个缺陷，并且这些缺陷被修复。

    Method for Mask Inspection for Mask Design and Mask Production
    17.
    发明申请
    Method for Mask Inspection for Mask Design and Mask Production 有权
    面膜设计和面膜生产面膜检查方法

    公开(公告)号：US20080247632A1

    公开(公告)日：2008-10-09

    申请号：US11885095

    申请日：2006-02-04

    申请人： Klaus Boehm ,  Christian Kalus ,  Thomas Schmoeller ,  Wolfgang Harnisch ,  Axel Zibold

    发明人： Klaus Boehm ,  Christian Kalus ,  Thomas Schmoeller ,  Wolfgang Harnisch ,  Axel Zibold

    IPC分类号： G03F7/20

    CPC分类号： G03F1/84 ,  G03F7/7065 ,  G03F7/70666

    摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

    摘要翻译： 本发明涉及一种掩模检查方法，可用于设计和生产掩模，以便早期检测相关的弱点并进行纠正。 根据所述掩模检查方法，基于转换为掩模布局的掩模设计，进行空中图像模拟，优选全面的空间图像模拟，以便确定热点列表。 通过AIMS工具分析掩模/测试掩模，从而产生真实的航空图像并与模拟的航空图像进行比较。 使用确定的空间图像之间的差异来改进掩模设计。 本发明的布置使得能够进行用于掩模设计和掩模生产的掩模检查的方法。 直接在掩模生产过程中使用AIMS工具基本上加快了掩模生产，同时降低了错误率和成本。

    Method and apparatus for the repair of photolithography masks
    18.
    发明申请
    Method and apparatus for the repair of photolithography masks 有权
    用于修复光刻掩模的方法和装置

    公开(公告)号：US20080069431A1

    公开(公告)日：2008-03-20

    申请号：US11900946

    申请日：2007-09-14

    申请人： Axel Zibold ,  Wolfgang Harnisch ,  Oliver Kienzle

    发明人： Axel Zibold ,  Wolfgang Harnisch ,  Oliver Kienzle

    IPC分类号： G06K9/00

    CPC分类号： G03F1/72 ,  G03F1/84

    摘要： A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect, and these defects are repaired.

    摘要翻译： 用于修复光刻掩模的方法和装置，其中检查光刻掩模是否存在缺陷，并且产生缺陷的列表，其中至少一种类型的缺陷，其范围及其在光刻掩模上的位置 被分配给每个缺陷，并且这些缺陷被修复。