公开(公告)号：US20090000738A1

公开(公告)日：2009-01-01

申请号：US12145393

申请日：2008-06-24

Applicant: Neil Benjamin

Inventor： Neil Benjamin

IPC: C23C16/52

CPC classification number: H01J37/321

Abstract: An arrangement for enabling local control of power delivery within a plasma processing system having a plasma processing chamber during processing of a substrate is provided. The arrangement includes a dielectric window and an inductive arrangement. The inductive arrangement is disposed above the dielectric window to enable power to couple with a plasma in the plasma processing system. The inductive arrangement includes a set of inductive elements, which provides the local control of power delivery to create a substantially uniform plasma in the plasma processing chamber.

Abstract translation: 提供了一种用于在处理基板期间具有等离子体处理室的等离子体处理系统内的功率输送的局部控制的装置。 该装置包括电介质窗和感应布置。 感应布置设置在电介质窗口之上，以使功率与等离子体处理系统中的等离子体耦合。 感应装置包括一组电感元件，其提供功率输送的局部控制以在等离子体处理室中产生基本均匀的等离子体。

公开(公告)号：US07274004B2

公开(公告)日：2007-09-25

申请号：US11001218

申请日：2004-11-30

Applicant: Neil Benjamin ,  Robert Steger

Inventor： Neil Benjamin ,  Robert Steger

IPC: H05B3/68 ,  C23C16/00

CPC classification number: H01J37/20 ,  H01J2237/2001 ,  H01L21/67103 ,  H01L21/67248

Abstract: A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over the temperature-controlled base. The flat-support holds a workpiece and is disposed over the thermal insulator. A heater is embedded within the flat support and/or disposed on an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently.

Abstract translation: 用于等离子体处理器的卡盘包括温度控制的基座，绝热体，平坦的支架和加热器。 温度控制的基座的温度低于工件所需的温度。 热绝缘体设置在温度控制的基座上。 平坦支撑件保持工件并设置在绝热体上。 加热器嵌入在平坦支撑件内和/或设置在平坦支撑件的下侧上。 加热器包括多个加热元件，其加热多个相应的加热区。 每个加热元件的供电功率和/或温度都是独立控制的。

公开(公告)号：US07152011B2

公开(公告)日：2006-12-19

申请号：US10927161

申请日：2004-08-25

Applicant: Neil Benjamin ,  Richard Alan Gottscho ,  Nicolas Bright ,  Robert Steger

Inventor： Neil Benjamin ,  Richard Alan Gottscho ,  Nicolas Bright ,  Robert Steger

IPC: G06F19/00

CPC classification number: G01R31/3187 ,  G05B19/4184 ,  G05B2219/31362 ,  G05B2219/31463 ,  Y02P90/14 ,  Y02P90/86

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

Abstract translation: 公开了一种基板处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，多个组件的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一的标识数据。 该方法另外包括：如果在预期第一组件识别数据时多个组件的第一组件不能提供第一组件唯一标识数据，则标记第一组件以用于校正动作。

公开(公告)号：US20060047458A1

公开(公告)日：2006-03-02

申请号：US10927161

申请日：2004-08-25

Applicant: Neil Benjamin ,  Richard Gottscho ,  Nicolas Bright ,  Robert Steger

Inventor： Neil Benjamin ,  Richard Gottscho ,  Nicolas Bright ,  Robert Steger

IPC: G06F19/00

CPC classification number: G01R31/3187 ,  G05B19/4184 ,  G05B2219/31362 ,  G05B2219/31463 ,  Y02P90/14 ,  Y02P90/86

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

公开(公告)号：US06847014B1

公开(公告)日：2005-01-25

申请号：US10062395

申请日：2002-02-01

Applicant: Neil Benjamin ,  Robert Steger

Inventor： Neil Benjamin ,  Robert Steger

IPC: H01L21/00 ,  H05B3/68

CPC classification number: H01L21/67248 ,  H01J2237/2001 ,  H01L21/67103

Abstract: A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over the temperature-controlled base. The flat support holds a workpiece and is disposed over the thermal insulator. A heater is embedded within the flat support and/or disposed on an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently.

公开(公告)号：US5708250A

公开(公告)日：1998-01-13

申请号：US623774

申请日：1996-03-29

Applicant: Neil Benjamin ,  Seyed Jafar Jafarian-Tehrani ,  Max Artusy

Inventor： Neil Benjamin ,  Seyed Jafar Jafarian-Tehrani ,  Max Artusy

IPC: H01L21/683 ,  H02N13/00 ,  B23K10/00

CPC classification number: H02N13/00 ,  H01L21/6831 ,  H01L21/6833 ,  Y10S269/903

Abstract: An r.f. excited vacuum plasma processor has a workpiece held in place by a monopolar or bipolar electrostatic chuck having an electrode that develops peak r.f. voltages over a wide amplitude range. A chuck DC power supply source is connected to the chuck. An r.f. peak detecting circuit coupled with the electrode is part of a circuit for controlling the DC voltage applied by the chuck power supply to the chuck. The control circuit supplies an unamplified replica of a DC voltage derived by the peak detecting circuit to the chuck DC power supply source via a DC circuit including only passive elements so the level of the DC voltage applied to the chuck varies in response to variations in the peak amplitude of the r.f. voltage. The peak detector includes at least several series connected diodes having electrodes polarized in the same direction or two stacks of series connected diodes. In one of the stacks, the diode electrodes are polarized in one direction and in the other stack the diode electrodes are polarized in the other direction. The diodes of the peak detecting circuit are arranged so the DC bias voltage supplied to the chuck and the peak value of the r.f. voltage developed at the electrode have the same order of magnitude.

Abstract translation: 一个r.f. 激发真空等离子体处理器通过具有产生峰值r.f的电极的单极或双极静电卡盘将工件保持在适当位置。 电压在宽幅度范围内。 卡盘直流电源连接到卡盘。 一个r.f. 与电极耦合的峰值检测电路是用于控制由卡盘电源向卡盘施加的直流电压的电路的一部分。 控制电路通过仅包括无源元件的DC电路向峰值检测电路提供由峰值检测电路导出的直流电压的未放大副本给卡盘直流电源，因此施加到卡盘上的直流电压的电平随着 峰的振幅 电压。 峰值检测器包括至少几个串联连接的二极管，其具有在相同方向上极化的电极或两个串联连接的二极管。 在一个堆叠中，二极管电极在一个方向上极化，而在另一个堆叠中，二极管电极在另一个方向上极化。 峰值检测电路的二极管布置成提供给卡盘的直流偏置电压和r.f.的峰值。 在电极处产生的电压具有相同的数量级。

公开(公告)号：US09287096B2

公开(公告)日：2016-03-15

申请号：US12237179

申请日：2008-09-24

Applicant: Alexei Marakhtanov ,  Eric Hudson ,  Rajinder Dhindsa ,  Neil Benjamin

Inventor： Alexei Marakhtanov ,  Eric Hudson ,  Rajinder Dhindsa ,  Neil Benjamin

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32532 ,  H01J37/3266 ,  H01J37/32669 ,  H01J2237/332 ,  H01J2237/334

Abstract: A capacitively-coupled plasma (CCP) processing system having a plasma processing chamber for processing a substrate is provided. The capacitively-coupled Plasma (CCP) processing system includes an upper electrode and a lower electrode for processing the substrate, which is disposed on the lower electrode during plasma processing. The capacitively-coupled Plasma (CCP) processing system also includes an array of inductor coils arrangement configured to inductively sustain plasma in a gap between the upper electrode and the lower electrode.

Abstract translation: 提供具有用于处理衬底的等离子体处理室的电容耦合等离子体（CCP）处理系统。 电容耦合等离子体（CCP）处理系统包括用于处理衬底的上电极和下电极，其在等离子体处理期间设置在下电极上。 电容耦合等离子体（CCP）处理系统还包括电感线圈布置阵列，其被配置为在上电极和下电极之间的间隙中感应维持等离子体。

公开(公告)号：US09105449B2

公开(公告)日：2015-08-11

申请号：US12145389

申请日：2008-06-24

Applicant: Neil Benjamin

Inventor： Neil Benjamin

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

CPC classification number: H01J37/32045 ,  H01J37/32174 ,  Y10T307/258

Abstract: A distributed power arrangement to provide local power delivery in a plasma processing system during substrate processing is provided. The distributed power arrangement includes a set of direct current (DC) power supply units. The distributed power arrangement also includes a plurality of power generators, which is configured to receive power from the set of DC power supply units. Each power generator of the plurality of power generators is coupled to a set of electrical elements, thereby enabling the each power generator of the plurality of power generators to control the local power delivery.

Abstract translation: 提供了一种用于在衬底处理期间在等离子体处理系统中提供局部电力输送的分布式电力装置。 分布式电源装置包括一组直流（DC）电源单元。 分布式电力布置还包括多个发电机，其被配置为从所述一组直流电源单元接收电力。 多个发电机的每个发电机耦合到一组电气元件，从而使多个发电机中的每个发电机能够控制局部电力输送。

公开(公告)号：US08536494B2

公开(公告)日：2013-09-17

申请号：US11001219

申请日：2004-11-30

Applicant: Neil Benjamin ,  Robert Steger

Inventor： Neil Benjamin ,  Robert Steger

IPC: H05B3/68 ,  C23C16/00

CPC classification number: H01J37/20 ,  H01J2237/2001 ,  H01L21/67103 ,  H01L21/67248

Abstract: A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over the temperature-controlled base. The flat support holds a workpiece and is disposed over the thermal insulator. A heater is embedded within the flat support and/or disposed on an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently.

Abstract translation: 用于等离子体处理器的卡盘包括温度控制的基座，绝热体，平坦的支架和加热器。 温度控制的基座的温度低于工件所需的温度。 热绝缘体设置在温度控制的基座上。 平面支撑件保持工件并且设置在绝热体上方。 加热器嵌入在平坦支撑件内和/或设置在平坦支撑件的下侧上。 加热器包括多个加热元件，其加热多个相应的加热区。 每个加热元件的供电功率和/或温度都是独立控制的。

公开(公告)号：US07571697B2

公开(公告)日：2009-08-11

申请号：US10242795

申请日：2002-09-13

Applicant: Neil Benjamin ,  David Cooperberg

Inventor： Neil Benjamin ,  David Cooperberg

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H05H1/46 ,  H01J37/321

Abstract: A plasma processor coil can include a shorting turn ohmically or only reactively coupled to plural multi-turn, co-planar, interleaved spiral, parallel connected windings. A separate capacitor can be associated with each winding to shunt current from one portion of that winding to another portion of the winding. The spacing between adjacent turns of peripheral portions of each winding can differ from the spacing between adjacent turns of interior portions of each winding. The coil can have a length that is short relative to the wavelength of RF excitation for the coil.

Abstract translation: 等离子体处理器线圈可以包括欧姆地或仅反应地耦合到多个多匝，共面，交错的螺旋，并联的绕组的短路匝。 单独的电容器可以与每个绕组相关联以将电流从该绕组的一部分分流到绕组的另一部分。 每个绕组的周边部分的相邻匝之间的间隔可以不同于每个绕组的内部部分的相邻匝间的间隔。 线圈可以具有相对于线圈的RF激励波长短的长度。