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公开(公告)号：US10397529B2
公开(公告)日：2019-08-27
申请号：US15582296
申请日：2017-04-28
Applicant: PALO ALTO RESEARCH CENTER INCORPORATED
Inventor： Jengping Lu , Patrick Y. Maeda , Sourobh Raychaudhuri , David K. Biegelsen , Eugene M. Chow
Abstract: A backplane has an array of output terminals arranged on an output surface of the backplane, and an array of solid state optical switches, each optical switch corresponding to one of the output terminals, wherein the solid state optical switches are responsive to light of a control wavelength and are transparent to light of a sensing wavelength, wherein the backplane is of a material transparent to light of a sensing wavelength different from the control wavelength. An optical system includes a backplane having an array of optocouplers, a projector to generate light of a control wavelength to which the optocouplers are responsive, optics to direct the control light onto the array of optocouplers on a backplane, an imaging system responsive to light of a sensing wavelength, wherein the backplane is at least partially transparent to the sensing wavelength.
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公开(公告)号：US09927804B2
公开(公告)日：2018-03-27
申请号：US15005562
申请日：2016-01-25
Applicant: PALO ALTO RESEARCH CENTER INCORPORATED
Inventor： Sourobh Raychaudhuri , Jeng Ping Lu
IPC: G05B19/41 , G05B19/414
CPC classification number: G05B19/4142 , G05B19/41805 , G05B2219/34008 , Y02P90/04 , Y02P90/18
Abstract: A microassembler system includes an alignment surface, a two-dimensional array of electrodes adjacent the alignment surface, a sensor network arranged adjacent the array of electrodes, and a control computer electrically connected to the array of electrodes and the sensor network, the control computer to receive signals from the sensor network indicating a position of at least one chiplet and to actuate the electrodes to change the position of the chiplet based upon the signals. A method of assembling chiplets includes receiving, at one of an array of control logic units, a signal from a control computer identifying an assembly location in a block of an assembly template at which a chiplet is to be located, using a sensor to determine a chiplet location of a nearest chiplet, and generating, using electrodes corresponding to the control logic unit, a traveling wave pattern to translate and orient the nearest chiplet to the location.
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公开(公告)号：US20160062318A1
公开(公告)日：2016-03-03
申请号：US14473302
申请日：2014-08-29
Applicant: Palo Alto Research Center Incorporated
Inventor： Ramkumar Abhishek , Sourobh Raychaudhuri , Ashish Pattekar
CPC classification number: G04F1/00 , A61J7/0409 , A61J7/0427 , A61J2200/70 , A61M5/31 , A61M2205/584 , B65D1/02 , B65D25/205 , B65D75/367 , B65D75/54 , G01N31/229 , G04F7/00
Abstract: An elapsed timer device includes a timer element comprising a timer chamber, a timer chamber conditioning material disposed within the timer chamber, and a sensor arranged to sense a timer chemical within the timer chamber. The sensor indicates elapsed time in response to a threshold level of the chemical being present within the timer chamber. The timer chamber, timer chemical adsorption/desorption characteristics of the timer chamber conditioning material, and the sensor are configured so that an amount of the timer chemical within the timer chamber reaches the threshold level within a predetermined time after initialization of the timer element.
Abstract translation: 经过的定时器装置包括定时器元件，定时器元件包括定时器腔室，设置在定时器腔室内的定时器室调节材料，以及布置成感测定时器腔室内的计时器化学物质的传感器。 传感器响应于定时器室内存在化学物质的阈值水平而指示经过时间。 定时器室，定时器室调节材料的定时器化学吸附/解吸特性和传感器被配置为使得定时器室中的定时器化学物质的量在定时器元件初始化之后的预定时间内达到阈值水平。
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公开(公告)号：US11648762B2
公开(公告)日：2023-05-16
申请号：US17889514
申请日：2022-08-17
Applicant: PALO ALTO RESEARCH CENTER INCORPORATED
Inventor： JengPing Lu , Eugene M. Chow , Sourobh Raychaudhuri
IPC: B32B37/00 , B32B37/10 , B32B38/04 , B32B38/18 , H01L21/677
CPC classification number: B32B37/025 , B32B37/0046 , B32B37/10 , B32B38/04 , B32B38/1808 , B32B2457/14 , H01L21/67721
Abstract: A system includes a separation tool that separates a carrier wafer to form a plurality of chiplet carriers. The carrier wafer having sheets of thin film material attached. A sensor and processor of the system determine an orientation of the portions of the sheets of thin film material relative to the chiplets to determine a mapping therebetween. A fluid carrier of the system places the chiplet carriers on an assembly surface in a disordered pattern. The system includes a micro assembler that arranges the chiplet carriers from the disordered pattern to a predetermined pattern based on the mapping. A carrier of the system transfers the portions of the thin film material from the chiplet carriers to a target substrate.
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公开(公告)号：US11148941B2
公开(公告)日：2021-10-19
申请号：US16237316
申请日：2018-12-31
Applicant: Palo Alto Research Center Incorporated
Inventor： Anne Plochowietz , Eugene M. Chow , Jengping Lu , Julie A. Bert , David K. Biegelsen , Bradley Rupp , Sourobh Raychaudhuri
Abstract: Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause phototransistors or electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler.
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Patent Agency Ranking
公开(公告)号：US20200173026A1
公开(公告)日：2020-06-04
申请号：US16781813
申请日：2020-02-04
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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公开(公告)号：US10604843B2
公开(公告)日：2020-03-31
申请号：US15591959
申请日：2017-05-10
Applicant: Xerox Corporation , Palo Alto Research Center Incorporated
Inventor： Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
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公开(公告)号：US20180182650A1
公开(公告)日：2018-06-28
申请号：US15391140
申请日：2016-12-27
Applicant: Palo Alto Research Center Incorporated
Inventor： Julie A. Bert , David K. Biegelsen , Sourobh Raychaudhuri
IPC: H01L21/67 , H01L21/68 , H01L21/683
CPC classification number: H01L21/67121 , B81C3/004 , B81C99/002 , H01L21/68 , H01L21/6835 , H01L21/6875 , H01L23/5386 , H01L24/95 , H01L25/0655 , H01L25/50 , H01L2221/68368 , H01L2224/95085 , H01L2224/95133
Abstract: An apparatus including a bumped electrode array and a method of fabricating a bumped electrode array is disclosed. The method includes providing a substrate for the electrode array. The method also includes disposing a plurality of non-planar structures including electrodes above the substrate of the electrode array. The method further includes disposing a dielectric layer above the plurality of non-planar structures having a defined radius of curvature.
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公开(公告)号：US09529335B2
公开(公告)日：2016-12-27
申请号：US14473302
申请日：2014-08-29
Applicant: Palo Alto Research Center Incorporated
Inventor： Ramkumar Abhishek , Sourobh Raychaudhuri , Ashish Pattekar
CPC classification number: G04F1/00 , A61J7/0409 , A61J7/0427 , A61J2200/70 , A61M5/31 , A61M2205/584 , B65D1/02 , B65D25/205 , B65D75/367 , B65D75/54 , G01N31/229 , G04F7/00
Abstract: An elapsed timer device includes a timer element comprising a timer chamber, a timer chamber conditioning material disposed within the timer chamber, and a sensor arranged to sense a timer chemical within the timer chamber. The sensor indicates elapsed time in response to a threshold level of the chemical being present within the timer chamber. The timer chamber, timer chemical adsorption/desorption characteristics of the timer chamber conditioning material, and the sensor are configured so that an amount of the timer chemical within the timer chamber reaches the threshold level within a predetermined time after initialization of the timer element.
Abstract translation: 经过的定时器装置包括定时器元件，定时器元件包括定时器腔室，设置在定时器腔室内的定时器室调节材料，以及布置成感测定时器腔室内的计时器化学物质的传感器。 传感器响应于定时器室内存在化学物质的阈值水平而指示经过时间。 定时器室，定时器室调节材料的定时器化学吸附/解吸特性和传感器被配置为使得定时器室中的定时器化学物质的量在定时器元件初始化之后的预定时间内达到阈值水平。
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20.发明授权Systems and methods for implementing advanced single pass cleaning of a reimageable surface in a variable data digital lithographic printing device 有权用于在可变数据数字平版印刷装置中实现可再成像表面的高级单遍清洁的系统和方法公开(公告)号：US09507266B2
公开(公告)日：2016-11-29
申请号：US14318651
申请日：2014-06-29
Applicant: Palo Alto Research Center Incorporated
Inventor： Timothy D Stowe , Bruce Earl Thayer , Sourobh Raychaudhuri , Gregory B Anderson , Marty J. Sheridan
CPC classification number: G03F7/24 , B41F35/006 , B41F35/02
Abstract: A system and method are provided for enclosing a plurality of cleaning unit components in a moist cleaning unit environment, the plurality of cleaning unit components cooperating to employ a cleaner roller in an image forming device to facilitate effective cleaning of a reimageable surface in an image forming device using a proposed variable data digital lithographic image forming architecture. A range of solvents may be applied to a hard smooth high surface energy surface of the cleaner roll and a cleaning unit component internally positioned within the cleaning enclosure to clean the surface of the cleaner roll. Mechanical components are properly placed prior to the cleaner roll-reimageable surface nip to ensure that residual liquid on a surface of the cleaner roll is removed.
Abstract translation: 提供了一种用于在多个清洁单元环境中封闭多个清洁单元部件的系统和方法，所述多个清洁单元部件协同在图像形成装置中采用清洁辊，以便有助于在图像形成中有效地清洁可再成像的表面 设备使用提出的可变数据数字平版印刷图像形成架构。 可以将一系列溶剂施加到清洁辊的硬光滑高表面能表面和内部定位在清洁外壳内的清洁单元部件，以清洁清洁辊的表面。 机械部件在更清洁的辊可再成像的表面压区之前被适当地放置，以确保去除清洁辊的表面上的残留液体。
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