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11.发明授权Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors 有权使用初级和次级反射器用UV辐射处理衬底的装置和方法公开(公告)号：US07566891B2
公开(公告)日：2009-07-28
申请号：US11686878
申请日：2007-03-15
申请人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Dale R. Du Bois , Sanjeev Baluja , Scott A. Hendrickson , Dustin W. Ho , Andrzei Kaszuba , Tom K. Cho
发明人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Dale R. Du Bois , Sanjeev Baluja , Scott A. Hendrickson , Dustin W. Ho , Andrzei Kaszuba , Tom K. Cho
CPC分类号： B05D3/067
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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公开(公告)号：US20090162259A1
公开(公告)日：2009-06-25
申请号：US12393851
申请日：2009-02-26
申请人： Thomas Nowak , Juan Carlos Rocha-Alvarez , Andrzej Kaszuba , Scott A. Hendrickson , Dustin W. Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'saad
发明人： Thomas Nowak , Juan Carlos Rocha-Alvarez , Andrzej Kaszuba , Scott A. Hendrickson , Dustin W. Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'saad
IPC分类号： B01J19/08
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV sources per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV sources can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV源被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV源可以是利用诸如微波或射频之类的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。
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公开(公告)号：US08841629B2
公开(公告)日：2014-09-23
申请号：US13534575
申请日：2012-06-27
IPC分类号： G01J1/42
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译： 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。 可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板， 壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。
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公开(公告)号：US20140000515A1
公开(公告)日：2014-01-02
申请号：US13534575
申请日：2012-06-27
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译： 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。 可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板， 壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。
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公开(公告)号：US20070295012A1
公开(公告)日：2007-12-27
申请号：US11556642
申请日：2006-11-03
申请人： Dustin W. Ho , Juan Carlos Rocha-Alvarez , Dale R. Du Bois , Scott A. Hendrickson , Sanjeev Baluja , Ndanka O. Mukuti
发明人： Dustin W. Ho , Juan Carlos Rocha-Alvarez , Dale R. Du Bois , Scott A. Hendrickson , Sanjeev Baluja , Ndanka O. Mukuti
IPC分类号： F25D3/12
CPC分类号： H01L21/67109 , H01L21/67115
摘要： A re-circulating cooling system can be used with a curing system in order to reduce the exhaust requirements for the system. Further, using a cooling fluid such as nitrogen reduces the production of ozone and the sealing requirements for the system. A simple heat exchanger can be used between return and supply reservoirs in order to remove heat added to the re-circulating fluid during circulation past the curing radiation source. The nitrogen can come from a nitrogen source, or from a membrane or other device operable to split feed gas into its molecular components to provide a source of gas rich in nitrogen. An ozone destruction unit can be used with such a cooling system to reduce the amount of ozone to acceptable levels, and to minimize consumption of the nitrogen. A catalyst can be used to deplete the ozone that does not get consumed during the reaction.
摘要翻译： 再循环冷却系统可以与固化系统一起使用，以减少系统的排气要求。 此外，使用诸如氮气的冷却流体减少臭氧的产生和系统的密封要求。 在回流和供应储存器之间可以使用简单的热交换器，以便在循环通过固化辐射源之前除去添加到再循环流体中的热量。 氮气可以来自氮源，或者来自可以将进料气体分解成其分子组分以提供富含氮的气体源的膜或其它装置。 臭氧破坏装置可与这种冷却系统一起使用，以将臭氧的量减少至可接受的水平，并最大限度地减少氮的消耗。 可以使用催化剂来消耗在反应期间不消耗的臭氧。
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公开(公告)号：US20070298167A1
公开(公告)日：2007-12-27
申请号：US11556787
申请日：2006-11-06
申请人： DUSTIN W. HO , Juan Carlos Rocha-Alvarez , Dale R. Du Bois , Scott A. Hendrickson , Sanjeev Baluja , Ndanka O. Mukuti
发明人： DUSTIN W. HO , Juan Carlos Rocha-Alvarez , Dale R. Du Bois , Scott A. Hendrickson , Sanjeev Baluja , Ndanka O. Mukuti
IPC分类号： B05D7/22
CPC分类号： B05D3/067 , B01D53/8675 , B01D2255/1023 , B01D2255/2073 , B01D2255/20761 , B05D3/0486
摘要： A re-circulating cooling system can be used with a curing system in order to reduce the exhaust requirements for the system. Further, using a cooling fluid such as nitrogen reduces the production of ozone and the sealing requirements for the system. A simple heat exchanger can be used between return and supply reservoirs in order to remove heat added to the re-circulating fluid during circulation past the curing radiation source. The nitrogen can come from a nitrogen source, or from a membrane or other device operable to split feed gas into its molecular components to provide a source of gas rich in nitrogen. An ozone destruction unit can be used with such a cooling system to reduce the amount of ozone to acceptable levels, and to minimize consumption of the nitrogen. A catalyst can be used to deplete the ozone that does not get consumed during the reaction.
摘要翻译： 再循环冷却系统可以与固化系统一起使用，以减少系统的排气要求。 此外，使用诸如氮气的冷却流体减少臭氧的产生和系统的密封要求。 在回流和供应储存器之间可以使用简单的热交换器，以便在循环通过固化辐射源之前除去添加到再循环流体中的热量。 氮气可以来自氮源，或者来自可以将进料气体分解成其分子组分以提供富含氮的气体源的膜或其它装置。 臭氧破坏装置可与这种冷却系统一起使用，以将臭氧的量减少至可接受的水平，并最大限度地减少氮的消耗。 可以使用催化剂来消耗在反应期间不消耗的臭氧。
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公开(公告)号：US20120129275A1
公开(公告)日：2012-05-24
申请号：US13011687
申请日：2011-01-21
申请人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
发明人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。
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公开(公告)号：US20060249175A1
公开(公告)日：2006-11-09
申请号：US11230975
申请日：2005-09-20
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B08B3/12 , B08B7/00 , B08B9/00 , H01L21/306
CPC分类号： B08B7/0035 , C23C16/4405
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。
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公开(公告)号：US08338809B2
公开(公告)日：2012-12-25
申请号：US13164745
申请日：2011-06-20
申请人： Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
发明人： Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译： 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面，并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号：US08309421B2
公开(公告)日：2012-11-13
申请号：US13011687
申请日：2011-01-21
申请人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
发明人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
IPC分类号： H01L21/336 , H01L21/76
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。
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