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公开(公告)号:US08841629B2
公开(公告)日:2014-09-23
申请号:US13534575
申请日:2012-06-27
IPC分类号: G01J1/42
CPC分类号: H05B3/0047
摘要: Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译: 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移,以确定设备是否损坏,如屏幕撕裂或UV灯头的组装不当。 可以使用射频(RF)检测器来检测约0.2-5mW / cm 2范围内的微波,其中RF检测器包括具有环形部分的天线,具有二极管检测器和放大器电路的电路板, 壳体和联接到壳体的支架,其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值,其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。
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公开(公告)号:US20140000515A1
公开(公告)日:2014-01-02
申请号:US13534575
申请日:2012-06-27
CPC分类号: H05B3/0047
摘要: Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译: 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移,以确定设备是否损坏,如屏幕撕裂或UV灯头的组装不当。 可以使用射频(RF)检测器来检测约0.2-5mW / cm 2范围内的微波,其中RF检测器包括具有环形部分的天线,具有二极管检测器和放大器电路的电路板, 壳体和联接到壳体的支架,其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值,其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。
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公开(公告)号:US08338809B2
公开(公告)日:2012-12-25
申请号:US13164745
申请日:2011-06-20
申请人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
发明人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC分类号: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面,并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号:US07964858B2
公开(公告)日:2011-06-21
申请号:US12255609
申请日:2008-10-21
申请人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
发明人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC分类号: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译: 用于紫外灯的反射器可用于基板处理装置。 反射器包括延伸紫外灯长度的纵向条。 纵向条具有弯曲的反射表面,并且包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号:US20110248183A1
公开(公告)日:2011-10-13
申请号:US13164745
申请日:2011-06-20
申请人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
发明人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC分类号: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面,并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号:US20100096564A1
公开(公告)日:2010-04-22
申请号:US12255609
申请日:2008-10-21
申请人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
发明人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC分类号: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译: 用于紫外灯的反射器可用于基板处理装置。 反射器包括延伸紫外灯长度的纵向条。 纵向条具有弯曲的反射表面,并且包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号:US10227695B2
公开(公告)日:2019-03-12
申请号:US12974365
申请日:2010-12-21
申请人: Dale R. Du Bois , Mohamad A. Ayoub , Robert Kim , Amit Bansal , Mark Fodor , Binh Nguyen , Siu F. Cheng , Hang Yu , Chiu Chan , Ganesh Balasubramanian , Deenesh Padhi , Juan Carlos Rocha
发明人: Dale R. Du Bois , Mohamad A. Ayoub , Robert Kim , Amit Bansal , Mark Fodor , Binh Nguyen , Siu F. Cheng , Hang Yu , Chiu Chan , Ganesh Balasubramanian , Deenesh Padhi , Juan Carlos Rocha
IPC分类号: C23C14/04 , C23C16/04 , C23C16/44 , C23C16/455 , C23C16/458 , C30B25/12 , H01J37/32 , H01J37/34 , H01L21/687
摘要: Embodiments of the invention contemplate a shadow ring that provides increased or decreased and more uniform deposition on the edge of a wafer. By removing material from the top and/or bottom surfaces of the shadow ring, increased edge deposition and bevel coverage can be realized. In one embodiment, the material on the bottom surface is reduced by providing a recessed slot on the bottom surface. By increasing the amount of material of the shadow ring, the edge deposition and bevel coverage is reduced. Another approach to adjusting the deposition at the edge of the wafer includes increasing or decreasing the inner diameter of the shadow ring. The material forming the shadow ring may also be varied to change the amount of deposition at the edge of the wafer.
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公开(公告)号:US20110159211A1
公开(公告)日:2011-06-30
申请号:US12974365
申请日:2010-12-21
申请人: Dale R. Du Bois , Mohamad A. Ayoub , Robert Kim , Amit Bansal , Mark Fodor , Binh Nguyen , Siu F. Cheng , Hang Yu , Chiu Chan , Ganesh Balasubramanian , Deenesh Padhi , Juan Carlos Rocha
发明人: Dale R. Du Bois , Mohamad A. Ayoub , Robert Kim , Amit Bansal , Mark Fodor , Binh Nguyen , Siu F. Cheng , Hang Yu , Chiu Chan , Ganesh Balasubramanian , Deenesh Padhi , Juan Carlos Rocha
CPC分类号: C23C16/04 , C23C14/04 , C23C14/042 , C23C16/042 , C23C16/4401 , C23C16/45589 , C23C16/4585 , C30B25/12 , H01J37/32642 , H01J37/32651 , H01J37/32715 , H01J37/3441 , H01L21/68721 , H01L21/68735
摘要: Embodiments of the invention contemplate a shadow ring that provides increased or decreased and more uniform deposition on the edge of a wafer. By removing material from the top and/or bottom surfaces of the shadow ring, increased edge deposition and bevel coverage can be realized. In one embodiment, the material on the bottom surface is reduced by providing a recessed slot on the bottom surface. By increasing the amount of material of the shadow ring, the edge deposition and bevel coverage is reduced. Another approach to adjusting the deposition at the edge of the wafer includes increasing or decreasing the inner diameter of the shadow ring. The material forming the shadow ring may also be varied to change the amount of deposition at the edge of the wafer.
摘要翻译: 本发明的实施例设想一种阴影环,其在晶片的边缘上提供增加或减少的和更均匀的沉积。 通过从阴影环的顶部和/或底部表面去除材料,可以实现增加的边缘沉积和斜面覆盖。 在一个实施例中,通过在底表面上设置凹槽来减小底表面上的材料。 通过增加阴影环的材料量,降低了边缘沉积和斜面覆盖。 调整晶片边缘处沉积的另一种方法包括增加或减小阴影环的内径。 形成阴影环的材料也可以改变以改变晶片边缘处的沉积量。
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