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公开(公告)号:US20190088591A1
公开(公告)日:2019-03-21
申请号:US15707807
申请日:2017-09-18
Applicant: QUALCOMM Incorporated
Inventor: Renukprasad Hiremath , Hyeokjin Lim , Foua Vang , Xiangdong Chen , Venugopal Boynapalli
IPC: H01L23/522 , H01L23/528 , H01L27/092
Abstract: In certain aspects, a semiconductor die includes a first doped region, a second doped region, and an interconnect formed from a first middle of line (MOL) layer, wherein the interconnect electrically couples the first doped region to the second doped region. The semiconductor die also includes a first metal line formed from a first interconnect metal layer, and a first via electrically coupling the interconnect to the first metal line.
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公开(公告)号:US09887209B2
公开(公告)日:2018-02-06
申请号:US14279250
申请日:2014-05-15
Applicant: QUALCOMM Incorporated
Inventor: Mukul Gupta , Xiangdong Chen , Ohsang Kwon , Foua Vang , Stanley Seungchul Song , Kern Rim
IPC: H01L21/44 , H01L27/118 , H01L23/535 , H01L27/092 , H01L27/02 , H01L23/528 , H01L21/8234 , H01L21/8238
CPC classification number: H01L27/11807 , H01L21/823475 , H01L21/823871 , H01L23/5286 , H01L23/535 , H01L27/0207 , H01L27/092 , H01L2027/11874 , H01L2924/0002 , H01L2924/00
Abstract: A standard cell CMOS device includes metal oxide semiconductor transistors having gates formed from gate interconnects. The gate interconnects extend in a first direction. The device further includes power rails that provide power to the transistors. The power rails extend in a second direction orthogonal to the first direction. The device further includes M1 layer interconnects extending between the power rails. At least one of the M1 layer interconnects is coupled to at least one of the transistors. The M1 layer interconnects are parallel to the gate interconnects and extend in the first direction only.
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公开(公告)号:US11290109B1
公开(公告)日:2022-03-29
申请号:US17030087
申请日:2020-09-23
Applicant: QUALCOMM Incorporated
Inventor: Foua Vang , Hyeokjin Lim , Seung Hyuk Kang , Venugopal Boynapalli , Shitiz Arora
IPC: H01L21/00 , H03K19/094 , H01L23/528
Abstract: A MOS IC includes a MOS logic cell that includes first and second sets of transistor logic in first and second subcells, respectively. The first and second sets of transistor logic are functionally isolated from each other. The MOS logic cell includes a first set of Mx layer interconnects on an Mx layer extending in a first direction over the first and second subcells. A first subset of the first set of Mx layer interconnects is coupled to inputs/outputs of the first set of transistor logic in the first subcell and is unconnected to the second set of transistor logic. Each of the first subset of the first set of Mx layer interconnects extends from the corresponding input/output of the first set of transistor logic of the first subcell to the second subcell, and is the corresponding input/output of the first set of transistor logic.
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公开(公告)号:US11237580B1
公开(公告)日:2022-02-01
申请号:US17015486
申请日:2020-09-09
Applicant: QUALCOMM Incorporated
Inventor: Giby Samson , Foua Vang , Ramaprasath Vilangudipitchai , Seung Hyuk Kang , Venugopal Boynapalli
Abstract: A system includes: a first power supply; a second power supply; a headswitch disposed between the first power supply and logic circuitry; an enable driver coupling the second power supply to a control terminal of the headswitch; and a voltage generator operable to adjust a control voltage from the second power supply to the control terminal of the headswitch in response to a first voltage level of the first power supply exceeding a reference voltage level.
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公开(公告)号:US10175571B2
公开(公告)日:2019-01-08
申请号:US15182510
申请日:2016-06-14
Applicant: QUALCOMM Incorporated
Inventor: Xiangdong Chen , Hyeokjin Bruce Lim , Ohsang Kwon , Mickael Malabry , Jingwei Zhang , Raymond George Stephany , Haining Yang , Kern Rim , Stanley Seungchul Song , Mukul Gupta , Foua Vang
Abstract: In an aspect of the disclosure, a method, a computer-readable medium, and an apparatus for assigning feature colors for a multiple patterning process are provided. The apparatus receives integrated circuit layout information including a set of features and an assigned color of a plurality of colors for each feature of a first subset of features of the set of features. In addition, the apparatus performs color decomposition on a second subset of features to assign colors to features in the second subset of features. The second subset of features includes features in the set of features that are not included in the first subset of features with an assigned color.
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公开(公告)号:US09379058B2
公开(公告)日:2016-06-28
申请号:US14274184
申请日:2014-05-09
Applicant: QUALCOMM Incorporated
Inventor: Stanley Seungchul Song , Zhongze Wang , Ohsang Kwon , Kern Rim , John Jianhong Zhu , Xiangdong Chen , Foua Vang , Raymond George Stephany , Choh Fei Yeap
IPC: H01L29/423 , H01L29/417 , H01L23/528 , H01L23/522 , H01L27/088 , H01L21/768 , H01L27/118
CPC classification number: H01L23/5283 , H01L21/76831 , H01L21/76877 , H01L21/76895 , H01L21/76897 , H01L23/485 , H01L23/5226 , H01L27/088 , H01L29/41775 , H01L29/42312 , H01L2027/11866 , H01L2924/0002 , H01L2924/00
Abstract: A semiconductor device includes a gate and a first active contact adjacent to the gate. Such a device further includes a first stacked contact electrically coupled to the first active contact, including a first isolation layer on sidewalls electrically isolating the first stacked contact from the gate. The device also includes a first via electrically coupled to the gate and landing on the first stacked contact. The first via electrically couples the first stacked contact and the first active contact to the gate to ground the gate.
Abstract translation: 半导体器件包括栅极和邻近栅极的第一有源触点。 这种器件还包括电耦合到第一有源触点的第一堆叠触点,包括在侧壁上电隔离第一堆叠触头与栅极的第一隔离层。 该装置还包括电连接到门的第一通孔和第一堆叠接触件上的着陆。 第一通孔将第一堆叠触点和第一有源触点电耦合到栅极以将栅极接地。
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