公开(公告)号：US20180114707A1

公开(公告)日：2018-04-26

申请号：US15793263

申请日：2017-10-25

Applicant: SEMES CO., LTD.

Inventor： Do-Youn Lim ,  Joonho Won ,  Kisang Eum ,  Boong Kim ,  Joo Jib Park

IPC: H01L21/67 ,  F26B5/04 ,  H01L21/02

CPC classification number: H01L21/67034 ,  F26B5/04 ,  H01L21/02052 ,  H01L21/02101 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/6719 ,  H01L21/68742

Abstract: Embodiments of the inventive concept relate to an apparatus for treating a substrate in a high-pressure atmosphere. The apparatus includes a process chamber having an upper body and a lower body that are combined with each other to provide a treatment space therein, an elevation member configured to elevate any one of the upper body and the lower body to an opening location at which the upper body and the lower body is spaced apart or a closing location at which the upper body and the lower body is attached, a clamping member configured to clamp the upper body and the lower body located at the closing location, and a movable member configured to move the clamping member to a locking location at which the clamping member clamps the process chamber or to the release location at which the clamping member is spaced apart from the process chamber.

公开(公告)号：US20130318812A1

公开(公告)日：2013-12-05

申请号：US13905676

申请日：2013-05-30

Applicant: SEMES CO., LTD.

Inventor： Boong Kim ,  Ki Bong Kim ,  Gil Hun Song ,  Oh Jin Kwon

IPC: F26B21/12

CPC classification number: F26B21/12 ,  F26B5/005 ,  H01L21/67017 ,  H01L21/67034

Abstract: Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.

Abstract translation: 提供了一种用于干燥基板的装置和方法。 该装置包括壳体，基板支撑构件，流体供应构件和排出构件。 壳体提供进行干燥处理的空间。 衬底支撑构件设置在壳体中以支撑衬底。 流体供给构件包括用于将超临界状态的处理流体供给到壳体的供给管线。 排出构件包括用于从壳体排出工艺流体的排出管线。 这里，供应管线包括用于以第一供应流量将工艺流体供应到壳体的第一供应管线和设置成以第二供应流量将工艺流体供应到壳体的第二供应管线。