DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230240104A1

    公开(公告)日:2023-07-27

    申请号:US18094393

    申请日:2023-01-09

    Abstract: A display device includes the following elements: a semiconductor layer positioned on a substrate; a first gate insulating layer positioned on the semiconductor layer; a first gate conductive layer positioned on the first gate insulating layer; a second gate insulating layer positioned on the first gate conductive layer; a second gate conductive layer positioned on the second gate insulating layer; a first insulating layer positioned on the second gate conductive layer; a first contact hole passing through the first insulating layer, the second gate insulating layer, and the first gate insulating layer; a second contact hole passing through the first insulating layer; and a third contact hole passing through the first insulating layer and the second gate insulating layer. A cross-section of the first insulating layer in a plane perpendicular to the substrate has a curved profile.

    DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

    公开(公告)号:US20250101626A1

    公开(公告)日:2025-03-27

    申请号:US18680397

    申请日:2024-05-31

    Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

    METHOD FOR ETCHING INSULATING LAYER, METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME, AND DISPLAY DEVICE

    公开(公告)号:US20220068979A1

    公开(公告)日:2022-03-03

    申请号:US17212812

    申请日:2021-03-25

    Abstract: A method for etching an insulating layer includes: sequentially forming a first gate insulating layer, an amorphous silicon layer, a first interlayer insulating layer, and a second interlayer insulating layer on a substrate; applying a photoresist on the second interlayer insulating layer, and patterning the photoresist through a photo-process; first etching the second interlayer insulating layer and the first interlayer insulating layer until at least a portion of the amorphous silicon layer is exposed by using the patterned photoresist as a mask; second etching the second interlayer insulating layer and the first interlayer insulating layer; third etching the amorphous silicon layer; and fourth etching the first gate insulating layer, wherein an etching gas used in the second etching includes a material having a higher etching selection ratio of the first and second interlayer insulating layers to the amorphous silicon layer than an etching gas used in the first etching.

    DISPLAY DEVICE
    19.
    发明申请
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20180157083A1

    公开(公告)日:2018-06-07

    申请号:US15814623

    申请日:2017-11-16

    Abstract: Provided herein may be a display device. The display device may include a first substrate including a first substrate having a plurality of pixel areas; a second substrate having a second base substrate facing the first substrate, first to third color filters provided on the second base substrate, the first to third color filters being respectively disposed on locations corresponding to respective pixel areas of the plurality of pixel areas and embodying different colors, and an infrared sensor disposed between the plurality of pixel areas in a plan view and configured to sense infrared light; a liquid crystal layer disposed between the first substrate and the second substrate; and a backlight unit configured to provide single-color light to the liquid crystal layer. At least one of the first to third color filters may include infrared quantum dot material which converts light provided from the backlight unit into infrared light.

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