-
公开(公告)号:US20250059637A1
公开(公告)日:2025-02-20
申请号:US18636359
申请日:2024-04-16
Applicant: Samsung Display Co., LTD.
Inventor: Jun Ho JO , Sung Woon KIM , Jeong Kuk KIM , Duck Jung LEE , Il Soo LEE , Jin Woo LEE , Sug Woo JUNG , Sung Won CHO
Abstract: A deposition mask includes a mask body including a silicon substrate, where a plurality of holes is defined through the mask body, and the mask body further includes mask grids extending to define the holes. A cross section of each mask grid has a reverse tapered shape having a width increasing from a back surface to an upper surface of the deposition mask, and each side surface of each mask grid defining a hole includes a first concave curved surface.
-
公开(公告)号:US20240030398A1
公开(公告)日:2024-01-25
申请号:US18299269
申请日:2023-04-12
Applicant: Samsung Display Co., LTD.
Inventor: Eok Yi LEE , Soo Chul KIM , Dae Ho SONG , So Young YEO , Ki Beom LEE , Sung Won CHO
CPC classification number: H01L33/62 , H01L25/0753 , H01L25/167 , H01L33/40 , H01L33/505 , H01L33/46 , H01L27/1288 , H01L27/124 , H01L2933/0016 , H01L2933/0066 , H01L2933/0041
Abstract: The disclosure provides a display device and a method of manufacturing the same. The display device includes a plurality of pixel circuit parts disposed on a substrate, a plurality of pixel electrodes, each disposed on the pixel circuit parts, a first insulating layer filling a space between the pixel electrodes, a plurality of light emitting elements, each disposed on the pixel electrodes, and connection electrodes disposed between the light emitting elements and the pixel electrodes. Each of the pixel electrodes includes a protrusion protruding toward a corresponding one of the connection electrodes.
-
公开(公告)号:US20230240104A1
公开(公告)日:2023-07-27
申请号:US18094393
申请日:2023-01-09
Applicant: Samsung Display Co., Ltd.
Inventor: DAWOON JUNG , Yu-Gwang JEONG , Su Bin BAE , Sung Won CHO
IPC: H10K59/131 , G09G3/3233 , H10K59/12
CPC classification number: H10K59/131 , G09G3/3233 , H10K59/1201 , G09G2300/0842 , G09G2300/0819 , G09G2300/0861 , G09G2300/0426
Abstract: A display device includes the following elements: a semiconductor layer positioned on a substrate; a first gate insulating layer positioned on the semiconductor layer; a first gate conductive layer positioned on the first gate insulating layer; a second gate insulating layer positioned on the first gate conductive layer; a second gate conductive layer positioned on the second gate insulating layer; a first insulating layer positioned on the second gate conductive layer; a first contact hole passing through the first insulating layer, the second gate insulating layer, and the first gate insulating layer; a second contact hole passing through the first insulating layer; and a third contact hole passing through the first insulating layer and the second gate insulating layer. A cross-section of the first insulating layer in a plane perpendicular to the substrate has a curved profile.
-
公开(公告)号:US20220165805A1
公开(公告)日:2022-05-26
申请号:US17467493
申请日:2021-09-07
Applicant: Samsung Display Co., LTD.
Inventor: Dae Won CHOI , Dong Won KIM , Sang Gab KIM , Sang Woo KIM , Gyu Jeong LEE , Sung Won CHO
Abstract: A display device includes a display panel including a main portion, a first bent portion and a second bent portion each extending from the main portion, and a corner portion which connects the first bent portion and the second bent portion to each other and is bendable relative to the main portion. The corner portion which is bendable includes a plurality of protrusion patterns partially disconnected from each other and each bendable relative to the main portion, and each of the plurality of protrusion patterns including a display pixel
-
公开(公告)号:US20250101626A1
公开(公告)日:2025-03-27
申请号:US18680397
申请日:2024-05-31
Applicant: Samsung Display Co., LTD.
Inventor: Jeong Kuk KIM , Jin Woo LEE , Sung Won CHO
Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.
-
16.
公开(公告)号:US20220229322A1
公开(公告)日:2022-07-21
申请号:US17713715
申请日:2022-04-05
Applicant: Samsung Display Co., LTD.
Inventor: Seon-Il KIM , Sung Won CHO , Sang Gab KIM , Su Bin BAE , Yu-Gwang JEONG , Dae Won CHOI
IPC: G02F1/1368 , G02F1/1362 , H01L51/56 , H01L51/52 , H01L27/32
Abstract: A display device includes a thin film transistor on a base substrate and a signal wiring electrically connected to the thin film transistor. The signal wiring includes a main conductive layer including copper, and a capping layer including titanium the capping layer overlapping a portion of an upper surface of the main conductive layer. The signal wiring has a taper angle in a range of about 70° to about 90°. A thickness of the capping layer is in a range of about 100 Å to about 300 Å, and a thickness of the main conductive layer is in a range of about 1,000 Å to about 20,000 Å.
-
公开(公告)号:US20220068979A1
公开(公告)日:2022-03-03
申请号:US17212812
申请日:2021-03-25
Applicant: Samsung Display Co., Ltd.
Inventor: Dae Soo KIM , Yu-Gwang JEONG , Sung Won CHO
IPC: H01L27/12 , H01L29/786 , H01L21/311 , H01L21/3065
Abstract: A method for etching an insulating layer includes: sequentially forming a first gate insulating layer, an amorphous silicon layer, a first interlayer insulating layer, and a second interlayer insulating layer on a substrate; applying a photoresist on the second interlayer insulating layer, and patterning the photoresist through a photo-process; first etching the second interlayer insulating layer and the first interlayer insulating layer until at least a portion of the amorphous silicon layer is exposed by using the patterned photoresist as a mask; second etching the second interlayer insulating layer and the first interlayer insulating layer; third etching the amorphous silicon layer; and fourth etching the first gate insulating layer, wherein an etching gas used in the second etching includes a material having a higher etching selection ratio of the first and second interlayer insulating layers to the amorphous silicon layer than an etching gas used in the first etching.
-
公开(公告)号:US20210173259A1
公开(公告)日:2021-06-10
申请号:US17022459
申请日:2020-09-16
Applicant: Samsung Display Co., LTD.
Inventor: Sung Won CHO , Yun Jong YEO , Seon Il KIM , Youn Joon KIM , Dae Won CHOI
IPC: G02F1/13357 , G02B5/04 , G06F1/16
Abstract: A light control member includes a light control substrate including a surface, and a scalene prism disposed on the light control substrate. The scalene prism includes a first side surface extended at a first angle with respect to the surface of the light control substrate, and a second side surface extended at a second angle with respect to the surface of the light control substrate, the second angle being greater than the first angle. The light control member includes an etching stopper disposed on the scalene prism, and at least one absorption pattern disposed on the etching stopper on the second side surface of the scalene prism.
-
公开(公告)号:US20180157083A1
公开(公告)日:2018-06-07
申请号:US15814623
申请日:2017-11-16
Applicant: Samsung Display Co., Ltd.
Inventor: Yun Jong YEO , Seon Il KIM , Ji Hun KIM , Sung Won CHO , Sang Youn HAN
IPC: G02F1/1333 , G02F1/1335
CPC classification number: G02F1/13338 , G02F1/133514 , G02F1/133602 , G02F1/133617 , G02F2203/11 , G06F3/0412 , G06F3/042
Abstract: Provided herein may be a display device. The display device may include a first substrate including a first substrate having a plurality of pixel areas; a second substrate having a second base substrate facing the first substrate, first to third color filters provided on the second base substrate, the first to third color filters being respectively disposed on locations corresponding to respective pixel areas of the plurality of pixel areas and embodying different colors, and an infrared sensor disposed between the plurality of pixel areas in a plan view and configured to sense infrared light; a liquid crystal layer disposed between the first substrate and the second substrate; and a backlight unit configured to provide single-color light to the liquid crystal layer. At least one of the first to third color filters may include infrared quantum dot material which converts light provided from the backlight unit into infrared light.
-
-
-
-
-
-
-
-