公开(公告)号：US20180348635A1

公开(公告)日：2018-12-06

申请号：US16039341

申请日：2018-07-19

Applicant: Samsung Display Co., Ltd.

Inventor： Min Hyuck Kang ,  Eun Ae Kwak ,  Dong Eon Lee ,  Gug Rae Jo

IPC: G03F7/075 ,  C07F7/18 ,  C23F1/00 ,  G03F7/00 ,  G02B5/30 ,  C23F1/02

CPC classification number: G03F7/0751 ,  C07F7/1804 ,  C07F7/1872 ,  C23F1/00 ,  C23F1/02 ,  G02B5/3058 ,  G03F7/0002 ,  Y02P20/582

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

公开(公告)号：US09915768B2

公开(公告)日：2018-03-13

申请号：US14990334

申请日：2016-01-07

Applicant: Samsung Display Co. Ltd.

Inventor： Seung Won Park ,  Tae Woo Kim ,  Min Hyuck Kang ,  Dae Ho Yoon ,  Moon Gyu Lee

IPC: G02B5/30 ,  G02F1/1335

CPC classification number: G02B5/3058 ,  G02F1/133528 ,  G02F2001/133548 ,  G02F2001/13355

Abstract: The wire grid polarizer plate includes a light permeable substrate and a conductive pattern layer arranged on one surface of the light permeable substrate, the conductive pattern layer includes window regions and at least one reflective region arranged in a rectangular region which is circumscribed to the window regions, the window regions have target patterns including conductive simple closed curves surrounding in piles, spaced apart from each other at an interval of a period which is shorter than a wavelength of incident light, transmit first polarized light of the incident light and reflect second polarized light which is perpendicular to the first polarized light and the reflective regions reflect both of the first polarized light and the second polarized light.

公开(公告)号：US09903991B2

公开(公告)日：2018-02-27

申请号：US14623708

申请日：2015-02-17

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Ae Kwak ,  Min Hyuck Kang ,  Moon Gyu Lee

IPC: G02B5/30 ,  C09K13/00 ,  C23F4/00 ,  H01L21/308 ,  G02F1/1335 ,  H01L21/3065 ,  B81C1/00 ,  G03F7/004 ,  H01L21/306

CPC classification number: G02B5/3058 ,  B81C1/00388 ,  B81C1/00404 ,  B81C2201/0149 ,  C09K13/00 ,  C23F4/00 ,  G02F2001/133548 ,  G03F7/0041 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/3088

Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.

公开(公告)号：US10042256B2

公开(公告)日：2018-08-07

申请号：US15168665

申请日：2016-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Min Hyuck Kang ,  Eun Ae Kwak ,  Dong Eon Lee ,  Gug Rae Jo

IPC: G03F7/075 ,  G03F7/004 ,  C07F7/18 ,  G02B5/30 ,  C23F1/02 ,  C23F1/00 ,  G03F7/00

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

公开(公告)号：US10005100B2

公开(公告)日：2018-06-26

申请号：US15348305

申请日：2016-11-10

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Ae Kwak ,  Min Hyuck Kang ,  Gug Rae Jo

IPC: B05D3/00 ,  B05D1/00 ,  B05D3/12 ,  G02B5/30 ,  G02F1/1335 ,  G02F1/1368 ,  H01L27/12 ,  H01L29/786

CPC classification number: B05D3/007 ,  B05D1/005 ,  B05D3/12 ,  G02B5/3058 ,  G02F1/133528 ,  G02F1/1368 ,  G02F2001/133548 ,  H01L27/1222 ,  H01L29/66765 ,  H01L29/66969 ,  H01L29/78603 ,  H01L29/78633 ,  H01L29/78678

Abstract: A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.

公开(公告)号：US09612379B2

公开(公告)日：2017-04-04

申请号：US14704667

申请日：2015-05-05

Applicant: Samsung Display Co. Ltd.

Inventor： Eun Ae Kwak ,  Min Hyuck Kang ,  Hyeong Gyu Jang

IPC: H01L27/12 ,  G02B5/30 ,  G02B1/18 ,  G02F1/1335

CPC classification number: G02B5/3058 ,  G02B1/18 ,  G02F2001/133548 ,  H01L27/124

Abstract: A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.

公开(公告)号：US20170090285A1

公开(公告)日：2017-03-30

申请号：US15168665

申请日：2016-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Min Hyuck Kang ,  Eun Ae Kwak ,  Dong Eon Lee ,  Gug Rae Jo

IPC: G03F7/075 ,  G03F7/00 ,  C07F7/18 ,  G02B5/30 ,  C23F1/00

CPC classification number: G03F7/0751 ,  C07F7/1804 ,  C07F7/1872 ,  C23F1/00 ,  C23F1/02 ,  G02B5/3058 ,  G03F7/0002 ,  Y02P20/582

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

公开(公告)号：US09354522B2

公开(公告)日：2016-05-31

申请号：US14466735

申请日：2014-08-22

Applicant: SAMSUNG DISPLAY CO., LTD. ,  SOGANG UNIVERSITY RESEARCH FOUNDATION

Inventor： Min Hyuck Kang ,  Tae Woo Kim ,  Myung Im Kim ,  Moon Gyu Lee ,  Su Mi Lee ,  Seung-Won Park ,  Lei Xie ,  Bong-Jin Moon ,  Na Na Kang

IPC: G03C1/00 ,  G03F7/40 ,  H01L21/308 ,  C08F293/00

CPC classification number: G03F7/40 ,  C08F293/00 ,  G03F7/0002 ,  G03F7/405 ,  H01L21/3081

Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Abstract translation: 嵌段共聚物包括：第一嵌段和与第一嵌段共聚的第二嵌段。 第二嵌段包括含有环型官能团的甲硅烷基。

公开(公告)号：US09255170B2

公开(公告)日：2016-02-09

申请号：US14086182

申请日：2013-11-21

Applicant: Samsung Display Co., Ltd. ,  KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION ,  Sogang University Research Foundation

Inventor： Min Hyuck Kang ,  Su Mi Lee ,  Myung Im Kim ,  Tae Woo Kim ,  Seung-Won Park ,  Xie Lei ,  Na Na Kang ,  Bong-Jin Moon ,  Joona Bang ,  Sang Hoon Woo ,  Jin Yeong Lee ,  Hyun Jung Jung ,  June Huh

IPC: C08F279/02 ,  C08F277/00 ,  C08F293/00 ,  C08G61/08 ,  C08F279/00 ,  C08G63/00 ,  C08F32/06

CPC classification number: C08F299/024 ,  C08F293/00 ,  C08G61/08 ,  C08G2261/1424 ,  C08G2261/1426 ,  C08G2261/3324 ,  C08G2261/418 ,  C08G2261/74

Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Abstract translation: 提供嵌段共聚物。 根据示例性实施方案的嵌段共聚物包括由化学式1表示的第一嵌段和由化学式2表示的第二嵌段：其中COM1和COM2独立地选自聚苯乙烯部分，聚甲基丙烯酸甲酯部分，聚环氧乙烷部分，聚乙烯基吡啶部分，聚二甲基硅氧烷 部分，聚二茂铁基二甲基硅烷部分和聚异戊二烯部分，R1为氢或碳原子数为1〜10的烷基，Ph为苯基，a为1〜50，R2为氢或碳原子数1〜10的烷基， b为1〜50。