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公开(公告)号：US09682827B2
公开(公告)日：2017-06-20
申请号：US14927673
申请日：2015-10-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Min Kim , Tae-gon Kim , Hoon Kim , Hyun-joon Park , Seung-yong Oh , Hyun-hee Lee
CPC classification number: B65G47/5122
Abstract: A conveyor apparatus is provided. The conveyor apparatus includes a rail formed in a closed curve line, a chain conveyor that moves along the rail, a driver that drives the chain conveyor, and a first and a second variable conveyors that relatively vary lengths of at least two portions of the chain conveyor so that a section of the chain conveyor remains in position while other portions of the chain conveyor moving along the rail.
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12.发明授权公开(公告)号：US08865375B2
公开(公告)日：2014-10-21
申请号：US13706978
申请日：2012-12-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Il-Yong Jang , Hoon Kim , Hye-Kyoung Lee , Sang-Gyun Woo , Dong-Seok Nam
Abstract: Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.
Abstract translation: 提供了半色调相移光掩模，其包括被配置为透射光的基板; 基板上的移动图案，包括基板的中心部分上的图案区域和设置在基板的周边上的盲区的移动图案，盲区的移位图案的厚度大于基板的厚度 图案区域，并且被配置为部分地透射光; 以及遮光图案，其形成在所述遮光区域中的所述移动图案上，并且被构造成屏蔽所述光。 本文还提供了相关方法。
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公开(公告)号：US12092656B2
公开(公告)日：2024-09-17
申请号：US17721522
申请日：2022-04-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sungyoon Ryu , Seungbum Hong , Kwangeun Kim , Hoon Kim , Jiwon Yeom , Seokjung Yun , Souk Kim , Younghoon Sohn , Yusin Yang
CPC classification number: G01R1/06727 , G01R1/04
Abstract: A test apparatus includes a movable stage to support a sample, tips above the stage that have different shapes and alternately perform profiling and milling on the sample, a tip stage connected to a cantilever coupled to the tips, the tip stage to adjust a position of the cantilever, a position sensor to obtain information about a positional relationship between the tips and the sample, a stage controller to control movements of the stage and the tip stage, based on the information about the positional relationship, and a tip controller to select the tips for performing the profiling or milling and to determine conditions for performing milling, wherein a depth of the sample being processed by the milling in the first direction is controlled based on a relationship between a distance between the tips and the sample and a force between the tips and the sample.
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14.发明授权公开(公告)号：US11854610B2
公开(公告)日：2023-12-26
申请号：US18164199
申请日：2023-02-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang-Yeop Baeck , Tae-Hyung Kim , Daeyoung Moon , Dong-Wook Seo , Inhak Lee , Hyunsu Choi , Taejoong Song , Jae-Seung Choi , Jung-Myung Kang , Hoon Kim , Jisu Yu , Sun-Yung Jang
IPC: G11C11/419 , H10B10/00 , G11C7/08 , H01L23/528 , H01L27/092
CPC classification number: G11C11/419 , G11C7/08 , H01L23/5286 , H01L27/092 , H10B10/12 , H10B10/18
Abstract: A semiconductor device includes an active area extending in a first direction, a first transistor including a first gate electrode and first source and drain areas disposed on the active area, the first source and drain areas being disposed at opposite sides of the first gate electrode, a second transistor including a second gate electrode and second source and drain areas disposed on the active area, the second source and drain areas being disposed at opposite sides of the second gate electrode, and a third transistor including a third gate electrode and third source and drain areas disposed on the active area, the third source and drain areas being disposed at opposite sides of the third gate electrode, and the first gate electrode, the second gate electrode, and the third gate electrode extending in a second direction different from the first direction. The second transistor is configured to turn on and off, based on an operation mode of the semiconductor device.
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15.发明授权公开(公告)号：US11581038B2
公开(公告)日：2023-02-14
申请号：US17412588
申请日：2021-08-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang-Yeop Baeck , Tae-Hyung Kim , Daeyoung Moon , Dong-Wook Seo , Inhak Lee , Hyunsu Choi , Taejoong Song , Jae-Seung Choi , Jung-Myung Kang , Hoon Kim , Jisu Yu , Sun-Yung Jang
IPC: G11C11/419 , G11C7/08 , H01L23/528 , H01L27/092 , H01L27/11
Abstract: A semiconductor device includes an active area extending in a first direction, a first transistor including a first gate electrode and first source and drain areas disposed on the active area, the first source and drain areas being disposed at opposite sides of the first gate electrode, a second transistor including a second gate electrode and second source and drain areas disposed on the active area, the second source and drain areas being disposed at opposite sides of the second gate electrode, and a third transistor including a third gate electrode and third source and drain areas disposed on the active area, the third source and drain areas being disposed at opposite sides of the third gate electrode, and the first gate electrode, the second gate electrode, and the third gate electrode extending in a second direction different from the first direction. The second transistor is configured to turn on and off, based on an operation mode of the semiconductor device.
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Patent Agency Ranking
16.发明授权公开(公告)号：US11086210B2
公开(公告)日：2021-08-10
申请号：US16578628
申请日：2019-09-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yigwon Kim , Sangjin Kim , Heeyoung Go , Heebom Kim , Hoon Kim , Hong-Seock Choi , Jinseok Heo
IPC: G03F1/24
Abstract: Disclosed are photomasks, methods of fabricating the same, and methods of manufacturing semiconductor devices using the same. The photomask comprises a substrate including a pattern region and a peripheral region around the pattern region, a reflection layer on the pattern region and extending onto the peripheral region, an absorption structure on the reflection layer, and a dielectric pattern on the absorption structure on the peripheral region and exposing the absorption structure on the pattern region.
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公开(公告)号：US08968970B2
公开(公告)日：2015-03-03
申请号：US13719910
申请日：2012-12-19
Applicant: Samsung Electronics Co., Ltd.
Inventor： Se-Gun Moon , Dong-Seok Nam , Hoon Kim
IPC: G03F1/26
CPC classification number: G03F1/26
Abstract: A phase shift mask having a first region and a second region in a transverse direction includes a transparent layer, a phase shift pattern disposed in the first region, a transmittance control layer pattern disposed in the second region, and a shading layer pattern disposed on the transmittance control layer pattern. The phase shift pattern has a first pattern including a transparent material and a second pattern including metal. The phase shift mask may prevent haze effects through a cleaning process using an alkaline cleaning solution.
Abstract translation: 具有第一区域和第二区域的相移掩模包括透明层，设置在第一区域中的相移图案，设置在第二区域中的透射率控制层图案，以及设置在第二区域上的遮光层图案 透光控制层图案。 相移图案具有包括透明材料的第一图案和包括金属的第二图案。 相移掩模可以通过使用碱性清洁溶液的清洁过程来防止雾度效应。
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公开(公告)号：US20150038103A1
公开(公告)日：2015-02-05
申请号：US14341016
申请日：2014-07-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Si Hyun Park , Talipov Elmurod , Dal Young Yu , Hoon Kim , Young Woon Kim , Jae Seok Lee , Jae Seung Choi
CPC classification number: H04M1/72533 , H04L12/282 , H04L12/2834 , H04L63/0492 , H04L63/08 , H04L63/18 , H04L2012/2841 , H04L2012/285 , H04M1/7253 , H04W4/20 , H04W4/80 , H04W4/90
Abstract: A control method of a home appliance, the method including retrieving information about a communication device, authenticating the communication device, registering the authenticated communication device, receiving voice data from the registered communication device, outputting a voice signal corresponding to the received voice data to a user, receiving the voice signal from the user, and transmitting voice data corresponding to the received voice signal to the communication device. When the method is used, even if a user loses a communication device in a home, call is possible using a home appliance such as refrigerator.
Abstract translation: 一种家用电器的控制方法，所述方法包括检索关于通信设备的信息，认证通信设备，登记认证通信设备，从已登记的通信设备接收语音数据，将与所接收的语音数据相对应的语音信号输出到 用户接收来自用户的语音信号，并将对应于所接收的语音信号的语音数据发送到通信设备。 当使用该方法时，即使用户在家中丢失通信设备，也可以使用诸如冰箱的家用电器进行呼叫。
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公开(公告)号：US20140355588A1
公开(公告)日：2014-12-04
申请号：US14288608
申请日：2014-05-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dong Seok CHO , Hoon Kim
CPC classification number: H04L12/2816 , G08C17/02 , G08C2201/40 , H04L12/6418 , H04W88/08
Abstract: A home network system has a home appliance, a portable terminal to receive a control command associated with the home appliance, and an access point to allow the home appliance or the portable terminal to be connected to a wide area network (WAN), wherein the access point notifies the home appliance of the connection of the portable terminal if the portable terminal connects to the access point, so that the home application detects that a user returns home and performs a certain operation as a user connects to the access point when returning home.
Abstract translation: 家庭网络系统具有家用电器，用于接收与家用电器相关联的控制命令的便携式终端以及允许家用电器或便携式终端连接到广域网（WAN）的接入点，其中， 如果便携式终端连接到接入点，则接入点通知家用电器便携式终端的连接，使得当家庭应用检测到用户返回家时，当用户在返回家庭时连接到接入点时执行一定的操作 。
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20.发明申请公开(公告)号：US20130101926A1
公开(公告)日：2013-04-25
申请号：US13706978
申请日：2012-12-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Il-Yong Jang , Hoon Kim , Hye-Kyoung Lee , Sang-Gyun Woo , Dong-Seok Nam
IPC: G03F1/26
Abstract: Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.
Abstract translation: 提供了半色调相移光掩模，其包括被配置为透射光的基板; 基板上的移动图案，包括基板的中心部分上的图案区域和设置在基板的周边上的盲区的移动图案，盲区的移位图案的厚度大于基板的厚度 图案区域，并且被配置为部分地透射光; 以及遮光图案，其形成在所述遮光区域中的所述移动图案上，并且被构造成屏蔽所述光。 本文还提供了相关方法。
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