公开(公告)号：US20210240078A1

公开(公告)日：2021-08-05

申请号：US17005636

申请日：2020-08-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Hyunwoo KIM ,  Sukkoo HONG ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI

IPC: G03F7/004 ,  C07C381/12 ,  C07C309/12 ,  G03F7/039

Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.

公开(公告)号：US20230123035A1

公开(公告)日：2023-04-20

申请号：US17826234

申请日：2022-05-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juhyeon PARK ,  Hyunwoo KIM ,  Suk Koo HONG ,  Su Min KIM ,  Yechan KIM ,  Jicheol PARK ,  Honggu IM

IPC: G03F7/039 ,  G03F7/004 ,  C08F228/02 ,  C08F220/18 ,  C08F226/02 ,  C08F220/30 ,  C08F214/18

Abstract: The present disclosure relates to a polymer for photoresist and a photoresist composition including the same. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.

公开(公告)号：US20230194987A1

公开(公告)日：2023-06-22

申请号：US18084718

申请日：2022-12-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunji SONG ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK

IPC: G03F7/039

CPC classification number: G03F7/0392

Abstract: A photoresist polymer and a photoresist composition, the photoresist polymer including a first repeating unit represented by Chemical Formula 1:

公开(公告)号：US20220334702A1

公开(公告)日：2022-10-20

申请号：US17857499

申请日：2022-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Youngho CHO ,  Juhyeon PARK ,  Kiwon KIM

IPC: G06F3/041 ,  G06F1/16

Abstract: An electronic device, according to an embodiment of the disclosure, may comprise: a touchscreen including a first portion and a second portion; a memory; and a processor operatively connected to the touchscreen and the memory. The memory may store instructions that, when executed, cause the processor to: recognize a first point at which a touch input is in contact with the second portion, recognize a second point at which the touch input is separated from the touch screen, recognize at least one third point at which the touch input is periodically in contact with the touch screen in a state in which the touch input is in contact with the touch screen, and activate the touch input based on whether at least one of the second point and the at least one third point is located outside a specified area having a specified radius set with respect to the first point.

公开(公告)号：US20210223692A1

公开(公告)日：2021-07-22

申请号：US16994957

申请日：2020-08-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunji SONG ,  Sukkoo HONG ,  Sumin KIM ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Songse YI

IPC: G03F7/004 ,  G03F7/039 ,  C07D277/26 ,  C07D263/32 ,  C07D233/64 ,  C07D213/68

Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.