公开(公告)号：US07977654B2

公开(公告)日：2011-07-12

申请号：US12417933

申请日：2009-04-03

申请人： Hitoshi Sunaoshi

发明人： Hitoshi Sunaoshi

IPC分类号： H01J37/302

CPC分类号： G03F1/38 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174

摘要： A writing apparatus includes a writing unit configured to a write a pattern onto a target workpiece, based on a writing data of the pattern to be written on the target workpiece, and a generation unit configured generate, after the pattern has been written, writing data of a figure code indicating a writing information of when the target workpiece is written, based on the writing information, wherein the writing unit further writes the figure code onto the target workpiece, based on the writing data of the figure code.

摘要翻译： 一种写入装置，包括：写入单元，被配置为基于要写入目标工件的图案的写入数据，将目标工件上的图案写入到目标工件;以及生成单元，在图案被写入之后，生成写入数据 基于写入信息，指示写入目标工件的写入信息的图形代码，其中写入单元还根据图形代码的写入数据将图形代码写入到目标工件上。

公开(公告)号：US20080217553A1

公开(公告)日：2008-09-11

申请号：US12043707

申请日：2008-03-06

申请人： Kenji Ohtoshi ,  Hitoshi Sunaoshi ,  Osamu Iizuka ,  Takahito Nakayama

发明人： Kenji Ohtoshi ,  Hitoshi Sunaoshi ,  Osamu Iizuka ,  Takahito Nakayama

IPC分类号： H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/1532 ,  H01J2237/216

摘要： A focusing method of a charged particle beam includes measuring a first set value to focus a beam on a position of a reference plane by using a lens coil, acquiring a first factor to change a set value of an electrostatic lens depending on a distance and a second factor to change a set value of the coil depending on a distance, measuring a level distribution of a target plane, correcting the first set value by using the second factor to correct a focal point position of the beam in the coil from the position of the reference plane to an intermediate level position of the level distribution of the target plane, and correcting a second set value of the lens depending on a level position of the target plane by using the first factor to correct a focal point position of the beam by the lens.

摘要翻译： 带电粒子束的聚焦方法包括测量第一设定值以通过使用透镜线圈将光束聚焦在参考平面的位置上，获取根据距离改变静电透镜的设定值的第一因素，以及 根据距离来改变线圈的设定值的第二因素，测量目标平面的电平分布，通过使用第二因素校正第一设定值，以从线圈的位置校正线圈中的焦点位置 所述基准平面与所述目标平面的水平分布的中间位置相对应，并且通过使用所述第一因子来校正所述目标平面的水平位置的所述透镜的第二设定值，以通过所述第一因子校正所述光束的焦点位置 镜头。

公开(公告)号：US20070158576A1

公开(公告)日：2007-07-12

申请号：US11617165

申请日：2006-12-28

申请人： Takashi Kamikubo ,  Shuichi Tamamushi ,  Hitoshi Sunaoshi ,  Kenji Ohtoshi ,  Rieko Nishimura

发明人： Takashi Kamikubo ,  Shuichi Tamamushi ,  Hitoshi Sunaoshi ,  Kenji Ohtoshi ,  Rieko Nishimura

IPC分类号： G01K1/08

CPC分类号： G01K1/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31776

摘要： A method of calculating a deflection aberration correcting voltage includes writing predetermined patterns at a plurality of focus height positions measuring dimensional variations of width sizes of the predetermined patterns written at the plurality of focus height positions, calculating effective resolutions of the written predetermined patterns by using the dimensional variations, and on the basis of a focus height position at which a minimum effective resolution of the predetermined patterns is obtained, calculating a correcting voltage to correct deflection aberration and output the correcting voltage, wherein the correcting voltage is used when a charged particle beam is deflected.

摘要翻译： 计算偏转像差校正电压的方法包括在测量在多个聚焦高度位置处写入的预定图案的宽度尺寸的尺寸变化的多个聚焦高度位置处书写预定图案，通过使用 并且基于获得预定图案的最小有效分辨率的焦点高度位置，计算校正电压以校正偏转像差并输出校正电压，其中当带电粒子束 被偏转。

公开(公告)号：US6028317A

公开(公告)日：2000-02-22

申请号：US5640

申请日：1998-01-12

申请人： Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

发明人： Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

IPC分类号： G21K1/087 ,  G21K1/093 ,  H01J3/18 ,  H01J37/12 ,  H01J37/14 ,  H01J37/305 ,  H01L21/027 ,  G21K1/08 ,  H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/087 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/153 ,  H01J2237/3175

摘要： An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam passing direction and to form curves obtained by deforming hyperbolas in a direction perpendicular to the beam passing direction, in order that an electric field whose effective part except for an arbitrary constant of the field potential is given by.phi.=(k/2)r.sup.2 -.alpha.lnr-kz.sup.2is spatially partially formed in a cylindrical coordinate system defined by (r, z, .theta.).

摘要翻译： 光学元件包括两个彼此相对配置的距离并配置成会聚电子束的电极1和2。 电极1和2的相对表面被形成为沿着光束通过方向为圆柱对称，并且形成通过使垂直于光束通过方向的方向使双曲线变形而获得的曲线，以便将有效部分除外 对于场电位的任意常数由phi =（k / 2）给出，r2-α1nr-kz2在空间上部分地形成在由（r，z，θ）定义的圆柱坐标系中。

公开(公告)号：US08653487B2

公开(公告)日：2014-02-18

申请号：US12343997

申请日：2008-12-24

申请人： Hitoshi Sunaoshi

发明人： Hitoshi Sunaoshi

IPC分类号： G21K5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

摘要： A lithography apparatus includes a generating unit configured, by receiving character information which specifies a shape of an identification figure representing identification information of a target object, to generate pattern writing data of the identification figure on the basis of the character information; a synthesizing unit configured, by receiving a pattern writing data of a pattern written on the target object, to synthesize the pattern writing data of the pattern and the pattern writing data of the identification figure; and a pattern writing unit configured to write the pattern and the identification figure on the target object on the basis of the synthesized pattern writing data.

摘要翻译： 光刻设备包括：生成单元，通过接收指定表示目标对象的识别信息的识别图形的形状的字符信息，基于字符信息生成识别图形的图案写入数据; 合成单元，通过接收写入目标对象上写入的图案的数据的图案来合成图案的图案写入数据和识别图形的图案写入数据; 以及图案写入单元，被配置为基于合成图案写入数据将图案和识别图形写入目标对象。

公开(公告)号：US07485879B2

公开(公告)日：2009-02-03

申请号：US11478744

申请日：2006-07-03

申请人： Hitoshi Sunaoshi ,  Shuichi Tamamushi

发明人： Hitoshi Sunaoshi ,  Shuichi Tamamushi

IPC分类号： G21K5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31776

摘要： A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of the pattern to be written; and a writing unit configured to create an electron beam with the current density selected by said selector unit, shape the created electron beam into a shot size less than or equal to said maximal shot size in units of the shots, and shoot the shaped electron beam onto a workpiece to thereby write said pattern.

摘要翻译： 一种写入装置，包括：选择器单元，响应于接收到要被写入的图形的输入数据的电子束的照射，被配置为基于所述输入来选择正在被拍摄的电子束的电流密度和最大镜头大小 要写入的模式的数据; 以及写入单元，其被配置为产生具有由所述选择器单元选择的电流密度的电子束，将所创建的电子束形成为以所述拍摄为单位小于或等于所述最大投射尺寸的投射尺寸，并且拍摄成形电子束 到工件上，从而写入所述图案。

公开(公告)号：US06781680B1

公开(公告)日：2004-08-24

申请号：US10602701

申请日：2003-06-25

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

IPC分类号： G01J100

CPC分类号： H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

摘要： A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

公开(公告)号：US06606149B1

公开(公告)日：2003-08-12

申请号：US09533815

申请日：2000-03-24

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomaura

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomaura

IPC分类号： G01J100

CPC分类号： H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

摘要： A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

摘要翻译： 一种能量束装置的光学系统的调整方法，该方法是利用能量束对样品上的标记进行二维或二维扫描而得到的标记信号。 标记具有一维或二维周期性结构。 通过用光束扫描标记来检测第一标记信号。 标记设置在光学系统的光轴上。 通过用光束扫描标记来检测第二标记信号。 标记位于偏离光轴的位置。 基于第一和第二标记信号之间的相位差来确定偏转位置的偏差。

公开(公告)号：US5843603A

公开(公告)日：1998-12-01

申请号：US701614

申请日：1996-08-22

申请人： Atsushi Ando ,  Hitoshi Sunaoshi ,  Hirotsugu Wada ,  Kazuyoshi Sugihara

发明人： Atsushi Ando ,  Hitoshi Sunaoshi ,  Hirotsugu Wada ,  Kazuyoshi Sugihara

IPC分类号： G03F7/20 ,  H01J37/302 ,  H01J37/317 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31776 ,  Y10S430/143

摘要： A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1/n one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions; a second step of irradiating the shaped line beam upon a surface of the sample or the movable stage for a constant time or longer; a third step of shaping a beam by adding a bias value .delta. to each line beam width in the divided direction; a fourth step of irradiating the line beam obtained by adding the bias value to the shaped line beam upon a photosensitive substance on the sample surface for a constant time for exposure; a fifth step of repeating the fourth step exposure (n-1) times by shifting the line beam obtained by adding the bias value to the line beam, in the direction that one side of the shaped beam is divided into 1/n, and developing the photosensitive substance, to obtain a pattern width .theta.; a sixth step of repeating the above first to fifth steps by changing the number of divisions n and the bias value .delta.; and a seventh step of obtaining a change rate .DELTA..theta./.DELTA.n of the pattern width .theta. relative to the number of divisions n for each bias value .delta., to obtain an offset drift rate on the basis of the obtained change rate and the bias value. The method can evaluate a beam offset drift rate between the set beam dimension and the actual beam dimension, so that a microscopic pattern can be formed at a high precision.

摘要翻译： 一种评估由带电光束写入器产生的成形光束的方法，包括以下步骤：通过在x方向上划分成具有尺寸“a”的成形光束的1 / n的一侧来对线束进行成形的第一步骤，以及 尺寸“b”垂直于x方向的方向，其中n是分割数; 将成形线束照射在样品或可移动台的表面上恒定时间或更长的第二步骤; 第三步骤，通过在分割方向上的每个线束宽度上增加偏置值δ来对波束进行成形; 第四步骤，通过将所述成形线束的偏置值加到所述样品表面上的感光物质上以恒定时间曝光而获得的线束; 通过将通过将偏置值添加到线束而获得的线束在成形光束的一侧被划分为1 / n的方向上，并且显影（n-1）倍重复第四步曝光（n-1）次的第五步骤 感光物质，以获得图案宽度θ; 通过改变分割数n和偏差值δ来重复上述第一至第五步骤的第六步骤; 以及第七步骤，针对每个偏差值delta获得相对于分割数n的图案宽度θ的变化率DELTAθ/ DELTA n，以基于获得的变化率和偏置值获得偏移漂移率 。 该方法可以评估设定光束尺寸和实际光束尺寸之间的光束偏移漂移率，从而可以高精度地形成微观图案。