公开(公告)号：US07768163B2

公开(公告)日：2010-08-03

申请号：US12272006

申请日：2008-11-17

申请人： Shigeru Kasai

发明人： Shigeru Kasai

IPC分类号： H02K7/08

CPC分类号： H02K5/1672 ,  H02K7/081

摘要： A motor may include a rotor provided with a rotation shaft, a stator, a frame fixed to the stator and provided with a bearing part that rotatably supports an output side of the rotation shaft, and an urging member mounted on the bearing part for urging the rotation shaft. The bearing part may include a bearing, formed with a protruded part protruded from a flat plate part of the frame. The urging member may include a bottom face part provided with a spring part for urging the rotation shaft, a pair of side plate parts bent from side edge parts of the bottom face part, and a pair of hook parts bent on inner sides from the pair of the side plate parts to be engaged with the protruded part. The urging member is mounted on the bearing part such that the hook parts are engaged with the protruded part.

摘要翻译： 电动机可以包括设置有旋转轴的转子，定子，固定到定子上的框架，并且设置有可旋转地支撑旋转轴的输出侧的轴承部分，以及安装在轴承部分上用于推动 旋转轴。 轴承部件可以包括形成有从框架的平板部突出的突出部的轴承。 推动构件可以包括设置有用于推动旋转轴的弹簧部分的底面部分，从底面部分的侧边缘部分弯曲的一对侧板部分和从该对的内侧弯曲的一对钩部 的侧板部件与突出部分接合。 推动构件安装在轴承部分上，使得钩部与突出部接合。

公开(公告)号：US07675207B2

公开(公告)日：2010-03-09

申请号：US12271996

申请日：2008-11-17

申请人： Shigeru Kasai

发明人： Shigeru Kasai

IPC分类号： H02K7/06

CPC分类号： H02K7/116 ,  F16C35/10 ,  H02K5/1672 ,  H02K37/24 ,  Y10T74/19684 ,  Y10T74/2186

摘要： A motor device may include a motor main body provided with a stator part and a rotation shaft, an output shaft provided with a lead screw part, a motor frame provided with an opposite-to-output side support part that supports the stator part and an opposite-to-output side of the output shaft, and which is provided with an output side support part which supports an output side of the output shaft, and a gear part for transmitting a driving force of the rotation shaft to the output shaft. The opposite-to-output side support part rotatably supports the rotation shaft and further rotatably supports the opposite-to-output side of the output shaft.

摘要翻译： 电动机装置可以包括设置有定子部分和旋转轴的电动机主体，设置有丝杠部分的输出轴，设置有支撑定子部分的相对输出侧支撑部分的电动机框架和 输出轴的相对输出侧，并且设置有支撑输出轴的输出侧的输出侧支撑部和用于将旋转轴的驱动力传递到输出轴的齿轮部。 相对输出侧支撑部可旋转地支撑旋转轴并进一步可旋转地支撑输出轴的相对输出侧。

公开(公告)号：US20100038833A1

公开(公告)日：2010-02-18

申请号：US12440034

申请日：2007-08-31

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

IPC分类号： H01L21/26 ,  C21D1/74

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H01L31/1864 ,  Y02E10/50 ,  Y02P70/521

摘要： Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.

摘要翻译： 提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。 该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。

公开(公告)号：US20080309239A1

公开(公告)日：2008-12-18

申请号：US12044625

申请日：2008-03-07

申请人： Shigeru Kasai ,  Yuki Osada

发明人： Shigeru Kasai ,  Yuki Osada

IPC分类号： H01J25/50

CPC分类号： H05B6/666 ,  H01J37/32192 ,  H01J37/32201 ,  H05B6/806 ,  H05B2206/043

摘要： A microwave generation device includes: a magnetron having a cathode containing a filament and an anode containing a hollow resonator arranged to oppose to each other; a filament current measuring unit; and an application voltage measuring unit for measuring voltage applied to the filament. Based on the current and the voltage obtained by the current measuring unit and the voltage measuring unit, a resistance value calculation unit obtains a resistance value of the filament. A temperature calculation unit calculates the filament temperature from the resistance value and the resistance-temperature dependent characteristic. A filament power source is controlled by a power control unit so that the filament temperature is within a predetermined temperature range.

摘要翻译： 微波发生装置包括：具有包含灯丝的阴极的磁控管和包含彼此相对的中空谐振器的阳极; 灯丝电流测量单元; 以及用于测量施加到灯丝​​上的电压的施加电压测量单元。 基于由电流测量单元和电压测量单元获得的电流和电压，电阻值计算单元获得灯丝的电阻值。 温度计算单元根据电阻值和电阻温度依赖特性来计算灯丝温度。 灯丝电源由功率控制单元控制，使得灯丝温度在预定的温度范围内。

公开(公告)号：US20080280048A1

公开(公告)日：2008-11-13

申请号：US12078332

申请日：2008-03-28

申请人： Shigeru Kasai ,  Hiroyuki Miyashita

发明人： Shigeru Kasai ,  Hiroyuki Miyashita

IPC分类号： B05C11/00 ,  B05D3/02

CPC分类号： H01L21/67248 ,  H01L21/67115

摘要： This invention relates to a thermal processing method including: a placing step of placing an object to be processed onto a stage arranged in a processing container that can be vacuumed; and a heating step of heating the object to be processed to a predetermined temperature. The object to be processed is heated under a state in which a temperature distribution is maintained in such a manner that a temperature at a central portion of the object to be processed is high while a temperature at a peripheral portion of the object to be processed is low, during at least a part of the heating step.

摘要翻译： 本发明涉及一种热处理方法，包括：放置步骤，将待处理物体放置在布置在可被抽真空的处理容器中的台上; 以及将被处理物体加热到规定温度的加热工序。 待加工对象在保持温度分布的状态下被加热，使得待处理物体的中心部分的温度高，而被加工物的周边部分的温度为 在加热步骤的至少一部分期间为低。

公开(公告)号：US07372350B2

公开(公告)日：2008-05-13

申请号：US11137453

申请日：2005-05-26

申请人： Yoshifumi Chida ,  Kei Chiba ,  Tatsumi Ide ,  Shigeru Kasai

发明人： Yoshifumi Chida ,  Kei Chiba ,  Tatsumi Ide ,  Shigeru Kasai

IPC分类号： H01H67/02

CPC分类号： H01H50/546

摘要： An electromagnetic relay is provided which is small in size and is capable of controlling two circuits of an ordinarily-open contact, which has a large current-carrying capacity and high interrupting capability, and which is excellent in resistance against shock and vibration. Movable contactors are held, through bow-shaped movable contactor springs, to two -shaped holding frames each being electrically separated and being mechanically connected via a card made of a highly heat-resistant resin in a card block. Thick-plate shaped movable contacts, which are attached to the movable contactors in a fixed manner, are electrically connected or disconnected to fixed contacts in a base block, in synchronization with operations of an armature of an electro-magnet block. In order to improve a current-carrying capability and interrupting capability, there are provided two pieces of ordinarily-open contacts which are connected in series to each other, and between which an interval is doubled, in each of two circuits.

摘要翻译： 提供了一种电磁继电器，其尺寸小，并且能够控制具有大的载流能力和高中断能力的通常开路触点的两个电路，并且具有优异的抗冲击和振动性。 可移动接触器通过弓形活动接触器弹簧固定到两个形状的保持框架各自电气分离，并通过卡片块中由高耐热树脂制成的卡片机械连接。 与电磁块的电枢的操作同步地，以固定的方式附接到活动接触器的厚板形可动触头与基座中的固定触点电连接或断开。 为了提高载流能力和中断能力，在两个电路中的每一个中提供两个彼此串联连接的通常开路的触点，并且间隔被加倍。

公开(公告)号：US07226524B2

公开(公告)日：2007-06-05

申请号：US10498672

申请日：2002-11-25

申请人： Shigeru Kasai ,  Nobuhiko Yamamoto ,  Hikaru Adachi ,  Yuki Osada

发明人： Shigeru Kasai ,  Nobuhiko Yamamoto ,  Hikaru Adachi ,  Yuki Osada

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01J37/32256 ,  H01J37/32192 ,  H01J37/32568 ,  H01P5/103

摘要： A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.

摘要翻译： 等离子体处理装置包括可抽空处理容器; 用于在其上安装待处理物体的工件安装基座; 设置在处理容器的天花板的开口中的微波传输板; 平面天线构件，用于经由微波发射板向处理容器提供微波; 屏蔽盖，其接地以覆盖所述平面天线构件的顶部; 用于将微波引导到平面天线构件的波导; 用于相对改变平面天线构件和屏蔽盖之间的垂直距离的构件升降机构; 调谐杆可插入到波导中; 调节杆驱动机构，用于移动调音杆以调节其插入量; 以及匹配控制部分，用于控制平面天线部件的仰角量和调节杆的插入量以获得匹配调整。

公开(公告)号：US07176634B2

公开(公告)日：2007-02-13

申请号：US10951049

申请日：2004-09-27

申请人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

发明人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

IPC分类号： H01J7/24 ,  H03H7/38

CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32183 ,  H01P5/026 ,  H01P5/04

摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.

摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。

公开(公告)号：US06950596B2

公开(公告)日：2005-09-27

申请号：US10716904

申请日：2003-11-19

申请人： Akira Yahagi ,  Shigeru Kasai ,  Tatsumi Ide ,  Michikazu Kondo

发明人： Akira Yahagi ,  Shigeru Kasai ,  Tatsumi Ide ,  Michikazu Kondo

IPC分类号： G02B26/02 ,  B81B3/00 ,  B81B7/04 ,  G02B6/26 ,  G20B6/26

CPC分类号： G02B6/266

摘要： A variable optical attenuator comprises an incoming fiber for propagating an incoming light beam, a mirror for reflecting the incoming light beam as a reflected light beam and an outgoing fiber for propagating as an outgoing light beam at least one part of the reflected light beam. The light intensity of the outgoing light beam is determined by the angle of reflection at the mirror. The angle of reflection at the mirror is adjusted by an actuator for rotating the mirror. The actuator comprises a plate, a coil, a housing and permanents magnets. The mirror and the coil are fixed on the plate. The housing supports the plate so that the plate is able to rotate around a rotation axis, which is included on a predetermined plane. The permanent magnets are fixed on the housing and generate predetermined magnetic flux density along the predetermined plane. When a driving current is supplied to the coil under the predetermined magnetic flux density, a Lorentz force occurs at the coil so as to rotate the coil. Together with the coil, the mirror rotates so that the light intensity of the outgoing light beam can be adjusted.

摘要翻译： 可变光衰减器包括用于传播入射光束的入射光纤，用于反射作为反射光束的入射光束的反射镜和用于作为输出光束传播至少一部分反射光束的输出光纤。 出射光束的光强度由反射镜的反射角决定。 通过用于旋转镜子的致动器来调节镜子处的反射角度。 致动器包括板，线圈，壳体和永磁体。 镜子和线圈固定在板上。 壳体支撑板，使得板能够绕包含在预定平面上的旋转轴线旋转。 永久磁铁被固定在壳体上并沿预定平面产生预定的磁通密度。 当以预定的磁通密度向线圈提供驱动电流时，在线圈处产生洛仑兹力以使线圈旋转。 与线圈一起，镜子旋转，从而可以调节出射光束的光强度。

公开(公告)号：US20050160987A1

公开(公告)日：2005-07-28

申请号：US11088811

申请日：2005-03-25

申请人： Shigeru Kasai ,  Yuki Osada ,  Takashi Ogino

发明人： Shigeru Kasai ,  Yuki Osada ,  Takashi Ogino

IPC分类号： C23C16/00 ,  C23F1/00

CPC分类号： H05B6/705

摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.

摘要翻译： 等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。 微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。