公开(公告)号：US07064812B2

公开(公告)日：2006-06-20

申请号：US10642621

申请日：2003-08-19

Applicant: Audunn Ludviksson ,  Steven T. Fink

Inventor： Audunn Ludviksson ,  Steven T. Fink

IPC: G01N21/00

CPC classification number: H01J37/32862 ,  G01N21/64 ,  H01J37/32935 ,  H01L21/67069 ,  H01L21/67253

Abstract: A method and system are provided for monitoring erosion of system components in a plasma processing system. The system components contain a gas emitter that can release a sensor gas into a plasma process environment. The sensor gas can produce characteristic fluorescent light emission when exposed to a plasma. The method can evaluate erosion of system components in a plasma, by monitoring fluorescent light emission and a mass signal from the sensor gas. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.

Abstract translation: 提供了一种用于监测等离子体处理系统中的系统部件的侵蚀的方法和系统。 系统组件包含可将传感器气体释放到等离子体处理环境中的气体发射器。 当暴露于等离子体时，传感器气体可以产生特征性的荧光发射。 该方法可以通过监测荧光发射和来自传感器气体的质量信号来评估等离子体中系统组分的侵蚀。 可以使用该方法监测的消耗品系统组件包括环，屏蔽，电极，挡板和衬垫。

公开(公告)号：US07143887B2

公开(公告)日：2006-12-05

申请号：US10743057

申请日：2003-12-23

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: F16D71/04

CPC classification number: H01L21/67069 ,  H01L21/68 ,  H01L21/68792 ,  Y10T74/1836

Abstract: A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or the second object, a rotatble shaft rotatably mounted to the housing, and plurality of stops located on the rotatable shaft. When the shaft is rotated within the housing, the stops are rotated to different positions relative to the housing. As such, the rotatable shaft positions one of the stops to contact the first or second object that the multi-stop mechanism is not attached to.

公开(公告)号：US06962348B2

公开(公告)日：2005-11-08

申请号：US10627599

申请日：2003-07-28

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: F16J15/06 ,  F16L17/06

CPC classification number: F16J15/004 ,  F16J15/061 ,  F16J15/062 ,  Y10S277/91

Abstract: A sealing apparatus includes a sealing arrangement and a groove in a base. The sealing arrangement may comprise an o-ring and a grounding gasket where both the o-ring and the grounding gasket partially protrude in a longitudinal direction from the groove. Thus, the grounding gasket, which is equipped with ends that can be pulled out of the groove, can be removed from the groove by a pulling force. This leaves the o-ring accessible for removal or maintenance at a much lower cost in terms of manufacturing and operational costs. The sealing arrangement may also include inner and outer o-rings which seal a fluid flow from the atmosphere.

Abstract translation: 密封装置包括密封装置和基部中的凹槽。 密封装置可以包括O形环和接地垫圈，其中O形环和接地垫圈都沿着纵向方向从凹槽部分地突出。 因此，配备有能够从槽中拉出的端部的接地衬垫可以通过拉力从槽中移除。 这使得O型环在制造和运营成本方面以低得多的成本进行拆卸或维护。 密封装置还可以包括密封来自大气的流体流的内部和外部O形环。

公开(公告)号：US06942222B2

公开(公告)日：2005-09-13

申请号：US10450814

申请日：2001-12-19

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: F16J15/00 ,  F16L17/06 ,  F16L23/16 ,  F16L39/00

CPC classification number: F16J15/004 ,  F16L17/06 ,  F16L23/16 ,  F16L39/005

Abstract: A seal for sealing and load bearing a process tube in a vacuum system including a seal member and a load bearing spacer provided in a seal cavity. The seal generally includes a seal cavity provided in a housing, where the seal cavity is configured opposite the process tube. At least one load bearing spacer is received within the seal cavity and adapted to contact the process tube is mounted to the housing. Additionally, at least one seal member is received within the seal cavity and adapted to contact the process tube.

Abstract translation: 一种用于密封和承载真空系统中的处理管的密封件，包括设置在密封腔中的密封构件和承载隔离件。 密封件通常包括设置在壳体中的密封腔，密封腔配置成与处理管相对。 至少一个承载间隔件被容纳在密封腔内并适于接触被安装到壳体上的过程管。 此外，至少一个密封构件被容纳在密封腔内并且适于接触处理管。

公开(公告)号：US07601242B2

公开(公告)日：2009-10-13

申请号：US11032101

申请日：2005-01-11

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: H01J37/32633 ,  H01J37/3244 ,  H01L21/67069

Abstract: The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having a plurality of passages therethrough, the at least two baffle inserts being supported by the baffle carrier.

Abstract translation: 本发明提供了一种位于等离子体处理系统中的挡板组件，包括附接到等离子体处理系统的挡板载体和至少两个挡板插入件，其具有穿过其中的多个通道，所述至少两个挡板插入件由挡板载体 。

公开(公告)号：US07235155B2

公开(公告)日：2007-06-26

申请号：US10788328

申请日：2004-03-01

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: H01L21/00 ,  C23C16/00

CPC classification number: H01J37/32935

Abstract: A plasma processing system is provided that allows for monitoring a plasma processing system during plasma processing. The plasma processing system includes a processing chamber and a monitoring system for monitoring conditions of the processing chamber. By providing tools within a tool housing that is protected from the plasma environment but still in very close proximity thereto, better process monitoring can be achieved.

Abstract translation: 提供了等离子体处理系统，其允许在等离子体处理期间监视等离子体处理系统。 等离子体处理系统包括处理室和用于监视处理室的状况的监视系统。 通过在工具外壳内提供工具以防止等离子体环境，但仍然非常接近于其，可以实现更好的过程监控。

公开(公告)号：US07040032B2

公开(公告)日：2006-05-09

申请号：US10806400

申请日：2004-03-23

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: G01B3/50 ,  G01B3/00

CPC classification number: G01B3/50

Abstract: A go no-go gauge and method for verifying whether a process kit part used within a plasma chamber of a plasma processing tool has accumulated excessive wear or deposits. The gauge includes a component for verifying whether a dimension of a process kit part feature violates a prescribed size tolerance, the violation indicating that the process kit part has accumulated excessive wear or deposits.

Abstract translation: 用于验证等离子体处理工具的等离子体室内使用的处理组件部件是否累积了过多的磨损或沉积物的脱模仪和方法。 仪表包括用于验证过程套件零件特征的尺寸是否违反规定的尺寸公差的部件，表示处理套件部件累积过多磨损或沉积的违规。

公开(公告)号：US07350476B2

公开(公告)日：2008-04-01

申请号：US11018253

申请日：2004-12-22

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: G01D21/00 ,  G01N21/00 ,  C23C16/00 ,  C23C16/52 ,  H01L21/306

CPC classification number: H01L21/67288 ,  H01J37/32935

Abstract: A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and sidewalls joining said top and bottom portions respectively. The tapered plug has a cross sectional profile that is substantially parallel to the top and bottom portions and a cross sectional width that varies according to a location where the cross sectional profile intersects the second axis. At least one of the tapered plugs is inserted into at least one consumable component of the substrate processing system such that the top portion of the tapered plug is exposed to a processing environment of a plasma processing system.

Abstract translation: 一种用于监测基板处理系统中的可消耗部件的状况的系统，包括：具有第一轴的锥形塞，与第一轴相交的第二轴，具有第一宽度的顶部，具有第二宽度的底部;以及 分别连接所述顶部和底部的侧壁。 锥形塞具有基本上平行于顶部和底部的横截面轮廓，并且横截面宽度根据截面轮廓与第二轴线相交的位置而变化。 锥形插塞中的至少一个被插入到基板处理系统的至少一个可消耗部件中，使得锥形插头的顶部暴露于等离子体处理系统的处理环境。

公开(公告)号：US07227624B2

公开(公告)日：2007-06-05

申请号：US10484723

申请日：2002-07-24

Applicant: Steven T. Fink ,  Thomas Windhorn

Inventor： Steven T. Fink ,  Thomas Windhorn

IPC: G01N21/00

CPC classification number: H01J37/32862 ,  G01N21/59 ,  H01J37/32935

Abstract: An apparatus (100) senses a degree of cleanliness of a plasma reactor having a chamber (102) containing a plasma (103) that emits light (104) during a process conducted in the chamber (102). The apparatus (100) also has a light sensing element (180), configured to sense an intensity of the light (104) emitted by the plasma (103) after the light (104) passes through a film (135) that accrues in the chamber (102) during the process, and to provide a light intensity indication signal, and an electronics assembly (170) configured to receive the light intensity indication signal and to provide an indication of the degree of cleanliness of the plasma reactor.

Abstract translation: 在室（102）中进行的过程中，装置（100）感测具有包含发射光（104）的等离子体（103）的室（102）的等离子体反应器的清洁度。 该装置（100）还具有一个感光元件（180），用于感测在光（104）通过膜（135）中产生的膜（135）之后由等离子体（103）发射的光（104）的强度， （102），并且提供光强度指示信号，以及电子组件（170），其被配置为接收光强度指示信号并且提供等离子体反应器的清洁度的指示。

公开(公告)号：US07163603B2

公开(公告)日：2007-01-16

申请号：US10601590

申请日：2003-06-24

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: H01L21/306 ,  C23C16/00

CPC classification number: H01J37/321

Abstract: A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the helical coil. Preferably, the assembly includes a plenum cooling plate that is configured to supply cooling fluid to a first cooling rod provided within a resonator cavity defined by the chamber wall and the outer shield, and receive cooling fluid from a second cooling rod provided within the resonator cavity. The assembly preferably also includes a spacer provided between the first cooling rod and the second cooling rod, and coil insulators having holes configured to receive the helical coil.

Abstract translation: 一种等离子体源组件，包括外屏蔽件，电介质室壁和设置在外屏蔽件和电介质室壁之间的螺旋线圈。 等离子体源组件还包括线圈支撑组件，其构造成促进螺旋线圈的可重复性能。 优选地，组件包括增压室冷却板，其构造成将冷却流体供应到设置在由室壁和外屏蔽体限定的谐振腔内的第一冷却杆，并且从设置在谐振腔内的第二冷却杆接收冷却流体 。 组件优选地还包括设置在第一冷却杆和第二冷却杆之间的间隔件，以及具有构造成接收螺旋线圈的孔的线圈绝缘体。