公开(公告)号：US11410875B2

公开(公告)日：2022-08-09

申请号：US16225875

申请日：2018-12-19

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Hau Thanh Nguyen ,  Woochan Kim ,  Yi Yan ,  Luu Thanh Nguyen ,  Ashok Prabhu ,  Anindya Poddar ,  Masamitsu Matsuura ,  Kengo Aoya ,  Mutsumi Masumoto

IPC: H01L21/768 ,  H01L23/528 ,  H01L23/31 ,  H01L23/00

Abstract: An electronic device (100) includes a substrate (110) and an integrated circuit (120) provided on the substrate (110) having a surface facing away from the substrate (110). An insulating layer (150) extends over the substrate (110) and around the integrated circuit (120) to define an interface (154) between the insulating layer (150) and the integrated circuit (120). An electrically conductive via (130) is provided on the surface of the integrated circuit (120). An insulating material (140) extends over the via (130) and includes an opening (142) exposing a portion of the via (130). A repassivation member (162) extends over the insulating layer (150) and has a surface (164) aligned with the interface (154). An electrically conductive redistribution member (181) is electrically connected to the via (130) and extends over the repassivation member (162) into contact with the insulating layer (150).

公开(公告)号：US20200173013A1

公开(公告)日：2020-06-04

申请号：US16209513

申请日：2018-12-04

Applicant: Texas Instruments Incorporated

Inventor： Luu Thanh Nguyen ,  Mahmud Halim Chowdhury ,  Ashok Prabhu ,  Anindya Poddar

IPC: C23C14/12 ,  C23F11/10 ,  H01L21/768 ,  H01L21/3205 ,  H01L21/288

Abstract: In a described example, a method for passivating a copper structure includes: passivating a surface of the copper structure with a copper corrosion inhibitor layer; and depositing a protection overcoat layer with a thickness less than 35 μm on a surface of the copper corrosion inhibitor layer.

公开(公告)号：US20200035633A1

公开(公告)日：2020-01-30

申请号：US16047888

申请日：2018-07-27

Applicant: Texas Instruments Incorporated

Inventor： Dibyajat Mishra ,  Ashok Prabhu ,  Tomoko Noguchi ,  Luu Thanh Nguyen ,  Anindya Poddar ,  Makoto Yoshino ,  Hau Nguyen

IPC: H01L23/00 ,  H01L23/31 ,  H01L23/495

Abstract: A microelectronic device has a pillar connected to an external terminal by an intermetallic joint. Either the pillar or the external terminal, or both, include copper in direct contact with the intermetallic joint. The intermetallic joint includes at least 90 weight percent of at least one copper-tin intermetallic compound. The intermetallic joint is free of voids having a combined volume greater than 10 percent of a volume of the intermetallic joint; and free of a void having a volume greater than 5 percent of the volume of the intermetallic joint. The microelectronic device may be formed using solder which includes at least 93 weight percent tin, 0.5 weight percent to 5.0 weight percent silver, and 0.4 weight percent to 1.0 weight percent copper, to form a solder joint between the pillar and the external terminal, followed by thermal aging to convert the solder joint to the intermetallic joint.

公开(公告)号：US10541220B1

公开(公告)日：2020-01-21

申请号：US16053199

申请日：2018-08-02

Applicant: Texas Instruments Incorporated

Inventor： Daiki Komatsu ,  Makoto Shibuya ,  Yi Yan ,  Hau Nguyen ,  Luu Thanh Nguyen ,  Anindya Poddar

IPC: H01L21/48 ,  H01L21/56 ,  H01L21/78 ,  H01L23/00 ,  H01L23/367 ,  H01L23/498 ,  H01L23/495 ,  H01L23/31

Abstract: Described examples provide integrated circuits and methods, including forming a conductive seed layer at least partially above a conductive feature of a wafer, forming a conductive structure on at least a portion of the conductive seed layer, performing a printing process that forms a polymer material on a side of the wafer proximate a side of the conductive structure, curing the deposited polymer material, and attaching a solder ball structure to a side of the conductive structure.