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11.发明申请ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权具有螺旋结构的酸可可酯单体，聚合物，树脂组合物和方法公开(公告)号：US20100304295A1
公开(公告)日：2010-12-02
申请号：US12787004
申请日：2010-05-25
申请人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
IPC分类号： G03F7/20 , C07C69/533 , C08F220/00 , C08F232/08 , G03F7/004
CPC分类号： C07C69/54 , C07C69/753 , C07C2602/42 , C07C2602/50 , C07C2603/94 , C08F232/08 , G03F7/0045 , G03F7/0397
摘要： An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译： 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。
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12.发明授权Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation 有权聚合物，抗蚀剂组合物和图案化工艺，新型四氢呋喃化合物及其制备公开(公告)号：US06794111B2
公开(公告)日：2004-09-21
申请号：US10126877
申请日：2002-04-22
申请人： Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
发明人： Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
IPC分类号： G03C1492
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or alkyl, or R1 and R2, and R3 and R4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译： 包含式（1-1）或（1-2）的重复单元的聚合物，其中R 1，R 2，R 3和R 4是H或烷基，或R 1和R 2 R 3和R 4一起可以形成一个环，每一对是亚烷基，并且k是0或1，并且具有1,000-500,000的Mw是新的。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐腐蚀性和最小化的溶胀，并且使其自身具有电子束或深UV的微图形化。
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公开(公告)号：US20120100486A1
公开(公告)日：2012-04-26
申请号：US13243204
申请日：2011-09-23
IPC分类号： G03F7/20 , C07J33/00 , C07D333/46
CPC分类号： C07D493/18 , C07D333/46 , C07D409/12 , C07J31/006 , C07J33/002 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.
摘要翻译： 提供了具有特定阴离子的氟烷氧基链的萘基四氢噻吩阳离子的锍盐。 锍盐用作光致酸发生剂以形成抗蚀剂组合物，当通过浸渍光刻加工时，提供了在浸水中抑制溶解和较少图案依赖性或暗/亮偏压的优点。
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公开(公告)号：US08597869B2
公开(公告)日：2013-12-03
申请号：US13243204
申请日：2011-09-23
CPC分类号： C07D493/18 , C07D333/46 , C07D409/12 , C07J31/006 , C07J33/002 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.
摘要翻译： 提供了具有特定阴离子的氟烷氧基链的萘基四氢噻吩阳离子的锍盐。 锍盐用作光致酸发生剂以形成抗蚀剂组合物，当通过浸渍光刻加工时，提供了在浸水中抑制溶解和较少图案依赖性或暗/亮偏压的优点。
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公开(公告)号：US08431323B2
公开(公告)日：2013-04-30
申请号：US12608556
申请日：2009-10-29
申请人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
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公开(公告)号：US06830866B2
公开(公告)日：2004-12-14
申请号：US10170345
申请日：2002-06-14
申请人： Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
发明人： Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： G03F7038
CPC分类号： G03F7/0392 , C08G61/06 , G03F7/0395 , G03F7/0397
摘要： A resist composition comprising a hydrogenated product of ring-opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance, and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译： 包含开环易位聚合物和聚（甲基）丙烯酸衍生物作为基础树脂的氢化产物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于微图案化 电子束或深紫外线。
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公开(公告)号：US08722321B2
公开(公告)日：2014-05-13
申请号：US13450867
申请日：2012-04-19
IPC分类号： G03F7/26
CPC分类号： G03F7/0395 , G03F7/0397 , G03F7/203 , G03F7/2041 , G03F7/325
摘要： A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer comprising recurring units having an acid labile group-protected carboxyl group and recurring units having a lactone structure displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.
摘要翻译： 通过将抗蚀剂组合物涂布在基材上，烘烤，暴露于高能量辐射，烘烤（PEB）和在有机溶剂显影剂中曝光的抗蚀剂膜显影以选择性地溶解抗蚀剂膜的未曝光区域，形成负图案。 包括含有酸不稳定基团保护的羧基的重复单元和具有内酯结构的重复单元的氢化ROMP聚合物的抗蚀剂组合物在有机溶剂显影中显示出高的溶解对比度，并且即使当酸不稳定基团为 通过暴露和PEB去保护。
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18.发明申请FLUOROALCOHOL, FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS 有权氟代醇，氟化单体，聚合物，耐火组合物和方法公开(公告)号：US20120077121A1
公开(公告)日：2012-03-29
申请号：US13235719
申请日：2011-09-19
IPC分类号： G03F7/20 , C07C69/675 , C07C69/732 , C08F228/02 , C08F22/20 , C08F220/22 , C08F220/38 , G03F7/004 , C07C69/734
CPC分类号： C07C69/675 , C07C69/67 , C07C69/708 , C08F220/18 , C08F220/24 , C08F220/30 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
摘要翻译： 式（1）的氟醇化合物可用于制备用作基础树脂的聚合物，以配制具有高达500nm波长的辐射透明度和改进的显影特性的对透射性的辐射敏感性抗蚀剂组合物。 R1是氢或一价C1-C20烃基，其中任何组成的-CH 2 - 部分可以被-O-或-C（= O） - 代替，A a是（k1 + 1）价的C1-C20烃或 氟化烃基，k1为1,2或3。
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公开(公告)号：US08795942B2
公开(公告)日：2014-08-05
申请号：US12000284
申请日：2007-12-11
CPC分类号： G03F7/0397 , G03F7/0045
摘要： There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).
摘要翻译： 公开了一种抗蚀剂组合物，其使用诸如ArF准分子激光器的高能束作为光源显着地提高了光刻的分辨率，并且在使用半色调相移掩模的情况下表现出优异的抗表面粗糙度和侧凸的性能; 以及使用抗蚀剂组合物的图案化工艺。 正型抗蚀剂组合物至少包含（A）包含由以下通式（1）表示的重复单元的树脂组分; （B）在暴露于高能量束时产生由以下通式（2）表示的磺酸的光酸产生剂; 和（C）鎓盐，其中阳离子是由以下通式（3）表示的锍或由以下通式（4）表示的铵; 并且阴离子由以下通式（5）至（7）中的任一个表示。
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公开(公告)号：US08628908B2
公开(公告)日：2014-01-14
申请号：US13406684
申请日：2012-02-28
申请人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
发明人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要： A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
摘要翻译： 提供一种化学放大抗蚀剂组合物，其包含（A）特定的叔胺化合物，（B）特定的酸发生剂，（C）具有由酸不稳定基团保护的酸性官能团的基础树脂，其基本上不溶于碱性显影剂 并且在酸不稳定基团脱保护时变为可溶于碱性显影剂，和（D）有机溶剂。 抗蚀剂组合物具有高分辨率，改善浸渍光刻中的缺陷控制，以及良好的储存稳定性。
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