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公开(公告)号:US20210065347A1
公开(公告)日:2021-03-04
申请号:US17098895
申请日:2020-11-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chien-Ko LIAO , Ya-Hsun HSUEH , Sheng-Hsiang CHUANG , Hsu-Shui LIU , Jiun-Rong PAI , Shou-Wen KUO
Abstract: A method includes: receiving a defect map from a defect scanner, wherein the defect map comprises at least one defect location of a semiconductor workpiece; annotating the defect map with a reference fiducial location of the semiconductor workpiece; determining a detected fiducial location within image data of the semiconductor workpiece; determining an offset correction based on comparing the detected fiducial location with the reference fiducial location; producing a corrected defect map by applying the offset correction to the defect map, wherein the applying the offset correction translocates the at least one defect location; and transferring the corrected defect map to a defect reviewer configured to perform root cause analysis based on the corrected defect map.
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公开(公告)号:US20200161161A1
公开(公告)日:2020-05-21
申请号:US16598136
申请日:2019-10-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ren-Hau WU , Yan-Han CHEN , Cheng-Kang HU , Feng-Kuang WU , Hsu-Shui LIU , Jiun-Rong PAI
IPC: H01L21/687 , H04N5/225 , B25J9/16 , B65G47/90 , H01L21/67
Abstract: Apparatus and methods for handling semiconductor part carriers are disclosed. In one example, an apparatus for handling semiconductor part carriers is disclosed. The apparatus includes a mechanical arm and an imaging system coupled to the mechanical arm. The mechanical arm is configured for holding a semiconductor part carrier. The imaging system is configured for automatically locating a goal position on a surface onto which the semiconductor part carrier is to be placed.
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公开(公告)号:US20190164793A1
公开(公告)日:2019-05-30
申请号:US16201312
申请日:2018-11-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Kang HU , Hsu-Shui LIU , Jiun-Rong PAI , Shou-Wen KUO , Sheng-Hsiang CHUANG , Cheng-Hung CHEN
IPC: H01L21/67 , H01L21/687 , G05B19/18
Abstract: In an embodiment, a system includes a profiler configured to detect variations along a surface of a semiconductor stage; and a jig configured to move the profiler along an axis over the semiconductor stage.
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公开(公告)号:US20190139746A1
公开(公告)日:2019-05-09
申请号:US15901970
申请日:2018-02-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wun-Kai TSAI , Wen-Che LIANG , Chao-Keng LI , Zheng-Jie XU , Chih-Kuo CHANG , Sing-Tsung LI , Feng-Kuang WU , Hsu-Shui LIU
IPC: H01J37/32 , H01L21/67 , H01L21/66 , H01J37/244 , G05B19/4065 , C23C16/505
Abstract: A fabrication system for fabricating an IC is provided which includes a processing tool, a computation device and a FDC system. The processing tool includes an electrode and an RF sensor to execute a semiconductor manufacturing process to fabricate the IC. The RF sensor wirelessly detects the intensity of the RF signal. The computation device extracts statistical characteristics based on the detection of the intensity of the RF signal. The FDC system determines whether or not the intensity of the RF signal meets a threshold value or a threshold range according to the extracted statistical characteristics. When the detected intensity of the RF signal exceeds the threshold value or the threshold range, the FDC system notifies the processing tool to adjust the RF signal or stop tool to check parts damage.
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公开(公告)号:US20240377826A1
公开(公告)日:2024-11-14
申请号:US18784749
申请日:2024-07-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Kang HU , Cheng-Hung CHEN , Yan-Han CHEN , Feng-Kuang WU , Hsu-Shui LIU , Jiun-Rong PAI , Shou-Wen KUO
IPC: G05D1/00 , B25J5/00 , G01S17/931
Abstract: In an embodiment a system includes: an automated vehicle configured to traverse a first predetermined path; and a sensor system located on the automated vehicle, the sensor system configured to detect a vertical obstacle along the first predetermined path along one or two floorboards ahead of the automated vehicle, wherein the automated vehicle is configured to traverse a second predetermined path in response to detecting the vertical obstacle.
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公开(公告)号:US20220261001A1
公开(公告)日:2022-08-18
申请号:US17736915
申请日:2022-05-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Kang HU , Cheng-Hung CHEN , Yan-Han CHEN , Feng-Kuang WU , Hsu-Shui LIU , Jiun-Rong PAI , Shou-Wen KUO
IPC: G05D1/02 , G01S17/931 , B25J5/00 , G05D1/00
Abstract: In an embodiment a system includes: an automated vehicle configured to traverse a first predetermined path; and a sensor system located on the automated vehicle, the sensor system configured to detect a vertical obstacle along the first predetermined path along one or two floorboards ahead of the automated vehicle, wherein the automated vehicle is configured to traverse a second predetermined path in response to detecting the vertical obstacle.
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公开(公告)号:US20220189792A1
公开(公告)日:2022-06-16
申请号:US17686278
申请日:2022-03-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tsung-Sheng KUO , Yang-Ann CHU , Alan YANG , Vic HUANG , Hsu-Shui LIU , Jiun-Rong PAI
IPC: H01L21/677 , H01L21/683 , H01L21/68
Abstract: An apparatus for handling wafer carriers in a semiconductor fabrication facility (FAB) is disclosed. In one example, the apparatus includes: a table configured to receive a wafer carrier having a first door and operable to hold a plurality of wafers; an opening mechanism configured to open the first door of the wafer carrier; and a door storage space configured to store the first door. The apparatus may be either located on a floor of the FAB or physically coupled to a ceiling of the FAB.
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公开(公告)号:US20220185512A1
公开(公告)日:2022-06-16
申请号:US17686299
申请日:2022-03-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tsung-Sheng KUO , Hsu-Shui LIU , Jiun-Rong PAI , Yang-Ann CHU , Chieh-Chun LIN , Shine CHEN
Abstract: In certain embodiments, a system includes: an inspection station configured to receive a die vessel, wherein the inspection station is configured to inspect the die vessel for defects; a desiccant station configured to receive the die vessel from the inspection station, wherein the desiccant station is configured to add a desiccant to the die vessel; a bundle station configured to receive the die vessel from the desiccant station, wherein the bundle station is configured to combine the die vessel with another die vessel as a die bundle; and a bagging station configured to receive the die bundle from the bundle station, wherein the bagging station is configured to dispose the die bundle in a die bag and to heat seal the die bag with the die bundle inside.
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公开(公告)号:US20160020128A1
公开(公告)日:2016-01-21
申请号:US14332643
申请日:2014-07-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
Inventor: Yeh-Chieh WANG , Jiun-Rong PAI , Hsu-Shui LIU , Cheng-Lung LEE , Kuang-Chung LIOU
IPC: H01L21/683
CPC classification number: H01L21/6833
Abstract: A wafer chuck is provided. The wafer chuck includes a main body and a dielectric layer disposed over the main body. The wafer chuck also includes an electrode embedded in the dielectric layer and configured to generate an electrostatic field for retaining a wafer. The wafer chuck further includes a thermal conductive layer embedded in the main body or the dielectric layer. The thermal conductive layer has a lateral thermal conductivity greater than a vertical thermal conductivity.
Abstract translation: 提供晶片卡盘。 晶片卡盘包括设置在主体上的主体和电介质层。 晶片卡盘还包括嵌入电介质层中并被配置为产生用于保持晶片的静电场的电极。 晶片卡盘还包括嵌入在主体或电介质层中的导热层。 导热层的横向热导率大于垂直热导率。
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公开(公告)号:US20250114803A1
公开(公告)日:2025-04-10
申请号:US18484339
申请日:2023-10-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Lung WU , Yang-Ann CHU , Hsu-Shui LIU , Jiun-Rong PAI
Abstract: A plurality of purge nozzles of a purge load port include a nozzle gasket and a nozzle structure to inject a purging fluid into and through an internal chamber of a container (e.g., a FOUP) that is configured to, in operation, transport wafers or workpieces between various locations within a FAB. The nozzle gasket includes a deformable structure that abuts against a surface of a nozzle structure and a sealing structure opposite to the deformable structure that forms a seal between the container and the nozzle gasket. A nozzle hole of a nozzle of the nozzle structure includes a threaded region or portion that is configured to receive a threaded stopper structure to seal off the nozzle hole.
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