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    PROCESS SYSTEM AND OPERATING METHOD THEREOF
    12.
    发明申请
    PROCESS SYSTEM AND OPERATING METHOD THEREOF 审中-公开

    公开(公告)号：US20200057381A1

    公开(公告)日：2020-02-20

    申请号：US16195945

    申请日：2018-11-20

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Chao-Chen CHANG ,  Shao-Wei LUO ,  Jen-Yang CHUNG ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A device is disclosed that includes a master controller, a process chamber, a local controller, a switch, and a data storage. The process chamber is configured to generate a data according to a EUV light generation process. The local controller is coupled to the master controller and configured to control the process chamber. The switch is coupled between the master controller and the local controller, wherein the switch is configured to provide paths for the local controller to communicate with the master controller. The data storage directly connected to the local controller and configured to store the data. The local controller communicates directly with the data storage.

    EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF
    14.
    发明申请
    EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF 审中-公开

    公开(公告)号：US20200037427A1

    公开(公告)日：2020-01-30

    申请号：US16250026

    申请日：2019-01-17

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chi YANG ,  Sheng-Ta LIN ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

    IPC: H05G2/00 ,  B08B5/02 ,  B01D46/10 ,  G03F7/20

    Abstract: An extreme ultraviolet radiation source is provided, including a vessel, an optical collector, and a gas scrubber. The vessel has a gas inlet and a gas outlet. The optical collector is disposed within the vessel and configured to collect and reflect extreme ultraviolet light produced in the vessel. A cleaning gas is introduced into the vessel through the gas inlet to clean the surface of the optical collector. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the size of the gas passage close to the gas outlet is smaller than the size of the gas passage away from the gas outlet.

    LIGHT SOURCE SYSTEM AND POLARIZATION ANGLE ADJUSTING METHOD
    15.
    发明申请
    LIGHT SOURCE SYSTEM AND POLARIZATION ANGLE ADJUSTING METHOD 审中-公开

    公开(公告)号：US20200033194A1

    公开(公告)日：2020-01-30

    申请号：US16438710

    申请日：2019-06-12

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Jen-Hao YEH ,  Chun-Lin CHANG ,  Han-Lung CHANG ,  Li-Jui CHEN ,  Po-Chung CHENG

    IPC: G01J4/04 ,  G02B5/30 ,  G03F7/20 ,  G02B27/28

    Abstract: A light source system is provided. The light source system is capable of measuring a polarization angle and includes a light source configured to emit an original light beam, and the original light beam has an original polarization angle. The light source system further includes an amplifying module configured to amplify the original light beam and generate a forward beam for hitting a target, and the forward beam has a forward polarization angle that is equal to the original polarization angle. The light source system further includes a polarization measurement unit, and the polarization measurement unit includes a first polarization measurement module configured to receive a first return beam and measure a first polarization angle of the first return beam. The first return beam is reflected from the target.

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