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公开(公告)号:US11101214B2
公开(公告)日:2021-08-24
申请号:US16380502
申请日:2019-04-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Po-Hao Tsai , Techi Wong , Meng-Liang Lin , Yi-Wen Wu , Po-Yao Chuang , Shin-Puu Jeng
IPC: H01L23/495 , H01L23/528 , H01L23/00 , H01L23/31 , H01L25/00 , H01L25/065 , H01L23/498 , H01L23/538 , H01L25/07
Abstract: A package structure and method for forming the same are provided. The package structure includes a die structure formed over a first interconnect structure, and the die structure includes a first region and a second region. The package structure includes a dam structure formed on the first region of the die structure, and a second interconnect structure formed over the die structure and the dam structure. The package structure also includes a package layer formed between the first interconnect structure and the second interconnect structure, and the package layer is formed on the second region of the die structure to surround the dam structure.
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公开(公告)号:US11024581B2
公开(公告)日:2021-06-01
申请号:US16283836
申请日:2019-02-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yi-Wen Wu , Hung-Jui Kuo , Ming-Che Ho
IPC: H01L23/532 , H01L23/31 , H01L23/522 , H01L23/00 , H01L21/768
Abstract: Semiconductor packages and methods of forming the same are disclosed. One of the semiconductor packages includes a first dielectric layer, a first conductive pattern and a barrier layer. The first conductive pattern is disposed in a second dielectric layer over the first dielectric layer. The barrier layer is disposed at an interface between the first conductive pattern and the second dielectric layer and an interface between the first dielectric layer and the second dielectric layer.
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公开(公告)号:US20210098397A1
公开(公告)日:2021-04-01
申请号:US17120825
申请日:2020-12-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Ming-Che Ho , Hung-Jui Kuo , Yi-Wen Wu , Tzung-Hui Lee
Abstract: A semiconductor device and method of manufacturing is provided, whereby a support structure is utilized to provide additional support for a conductive element in order to eliminate or reduce the formation of a defective surface such that the conductive element may be formed to have a thinner structure without suffering deleterious structures.
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公开(公告)号:US10510673B2
公开(公告)日:2019-12-17
申请号:US16120327
申请日:2018-09-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Hsiang Hu , Hung-Jui Kuo , Yi-Wen Wu
IPC: H01L23/538 , H01L21/48 , H01L21/56 , H01L23/31
Abstract: An integrated fan-out package including an integrated circuit, an insulating encapsulation, and a redistribution circuit structure is provided. The integrated circuit includes an active surface, a plurality of sidewalls connected to the active surface, and a plurality of pads distributed on the active surface. The insulating encapsulation encapsulates the active surface and the sidewalls of the integrated circuit. The insulating encapsulation includes a plurality of first contact openings and a plurality of through holes, and the pads are exposed by the first contact openings. The redistribution circuit structure includes a redistribution conductive layer, wherein the redistribution conductive layer is disposed on the insulating encapsulation and is distributed in the first contact openings and the through holes. The redistribution conductive layer is electrically connected to the pads through the first contact openings. A method of fabricating the integrated fan-out package is also provided.
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公开(公告)号:US20190279929A1
公开(公告)日:2019-09-12
申请号:US16416278
申请日:2019-05-20
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yi-Wen Wu , Hung-Jui Kuo , Ming-Che Ho
IPC: H01L23/522 , H01L23/532 , H01L21/768 , H01L23/00 , H01L23/538
Abstract: An integrated fan-out package includes a die, an insulating encapsulation, a redistribution circuit structure, conductive terminals, and barrier layers. The insulating encapsulation encapsulates the die. The redistribution circuit structure includes a first redistribution conductive layer on the insulating encapsulation, a first inter-dielectric layer covering the first redistribution conductive layer, and a second redistribution conductive layer on the first inter-dielectric layer. The first redistribution conductive layer includes conductive through vias extending from a first surface of the insulating encapsulation to a second surface of the insulating encapsulation. The first inter-dielectric layer includes contact openings, portions of the second redistribution conductive layer filled in the contact openings are in contact with the first redistribution conductive layer and offset from the conductive through vias. The conductive terminals are disposed over the second surface of the insulating encapsulation. The barrier layers respectively are disposed between the conductive through vias and the conductive terminals.
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公开(公告)号:US10297544B2
公开(公告)日:2019-05-21
申请号:US15716476
申请日:2017-09-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yi-Wen Wu , Hung-Jui Kuo , Ming-Che Ho
IPC: H01L23/52 , H01L23/522 , H01L23/00 , H01L23/532 , H01L21/768
Abstract: Provided is an integrated fan-out package including a die, an insulating encapsulation, a redistribution circuit structure, a conductive terminal, and a barrier layer. The die is encapsulated by the insulating encapsulation. The redistribution circuit structure includes a redistribution conductive layer. The redistribution conductive layer is disposed in the insulating encapsulation and extending from a first surface of the insulating encapsulation to a second surface of the insulating encapsulation. The conductive terminal is disposed over the second surface of the insulating encapsulation. The barrier layer is sandwiched between the redistribution conductive layer and the conductive terminal. A material of the barrier layer is different from a material of the redistribution conductive layer and a material of the conductive terminal. A method of fabricating the integrated fan-out package is also provided.
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公开(公告)号:US20180374797A1
公开(公告)日:2018-12-27
申请号:US16120327
申请日:2018-09-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Hsiang Hu , Hung-Jui Kuo , Yi-Wen Wu
IPC: H01L23/538 , H01L21/48 , H01L21/56 , H01L23/31
CPC classification number: H01L23/5389 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/565 , H01L21/568 , H01L23/3128 , H01L23/5383 , H01L23/5384 , H01L23/5386 , H01L2224/04105 , H01L2224/12105 , H01L2224/19 , H01L2924/18162
Abstract: An integrated fan-out package including an integrated circuit, an insulating encapsulation, and a redistribution circuit structure is provided. The integrated circuit includes an active surface, a plurality of sidewalls connected to the active surface, and a plurality of pads distributed on the active surface. The insulating encapsulation encapsulates the active surface and the sidewalls of the integrated circuit. The insulating encapsulation includes a plurality of first contact openings and a plurality of through holes, and the pads are exposed by the first contact openings. The redistribution circuit structure includes a redistribution conductive layer, wherein the redistribution conductive layer is disposed on the insulating encapsulation and is distributed in the first contact openings and the through holes. The redistribution conductive layer is electrically connected to the pads through the first contact openings. A method of fabricating the integrated fan-out package is also provided.
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公开(公告)号:US20170323853A1
公开(公告)日:2017-11-09
申请号:US15147909
申请日:2016-05-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Hsiang Hu , Hung-Jui Kuo , Yi-Wen Wu
IPC: H01L23/538 , H01L21/56 , H01L21/48
CPC classification number: H01L23/5389 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/565 , H01L21/568 , H01L23/3128 , H01L23/5383 , H01L23/5384 , H01L23/5386 , H01L2224/04105 , H01L2224/12105 , H01L2224/19 , H01L2924/18162
Abstract: An integrated fan-out package including an integrated circuit, an insulating encapsulation, and a redistribution circuit structure is provided. The integrated circuit includes an active surface, a plurality of sidewalls connected to the active surface, and a plurality of pads distributed on the active surface. The insulating encapsulation encapsulates the active surface and the sidewalls of the integrated circuit. The insulating encapsulation includes a plurality of first contact openings and a plurality of through holes, and the pads are exposed by the first contact openings. The redistribution circuit structure includes a redistribution conductive layer, wherein the redistribution conductive layer is disposed on the insulating encapsulation and is distributed in the first contact openings and the through holes. The redistribution conductive layer is electrically connected to the pads through the first contact openings. A method of fabricating the integrated fan-out package is also provided.
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公开(公告)号:US20230369269A1
公开(公告)日:2023-11-16
申请号:US18360425
申请日:2023-07-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Li Yang , Po-Hao Tsai , Yi-Wen Wu , Sheng-Pin Yang , Hao-Chun Liu
IPC: H01L23/00 , H01L23/498 , H01L21/48 , H01L23/522
CPC classification number: H01L24/14 , H01L23/49811 , H01L28/60 , H01L21/4853 , H01L23/5226
Abstract: A semiconductor device includes a substrate; an interconnect structure over the substrate; a first passivation layer over the interconnect structure; a first conductive pad, a second conductive pad, and a conductive line disposed over the first passivation layer and electrically coupled to conductive features of the interconnect structure; a conformal second passivation layer over and extending along upper surfaces and sidewalls of the first conductive pad, the second conductive pad, and the conductive line; a first conductive bump and a second conductive bump over the first conductive pad and the second conductive pad, respectively, where the first conductive bump and the second conductive bump extend through the conformal second passivation layer and are electrically coupled to the first conductive pad and the second conductive pad, respectively; and a dummy bump over the conductive line, where the dummy bump is separated from the conductive line by the conformal second passivation layer.
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公开(公告)号:US11094625B2
公开(公告)日:2021-08-17
申请号:US16406600
申请日:2019-05-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yi-Wen Wu , Techi Wong , Po-Hao Tsai , Po-Yao Chuang , Shih-Ting Hung , Shin-Puu Jeng
IPC: H01L23/522 , H01L23/00 , H01L23/48 , H01L23/31 , H01L23/528 , H01L21/56
Abstract: A semiconductor package is provided. The semiconductor package includes a semiconductor die formed over an interconnect structure, an encapsulating layer formed over the interconnect structure to cover and surround the semiconductor die, and an interposer structure formed over the encapsulating layer. The interposer structure includes an insulating base having a first surface facing the encapsulating layer, and a second surface opposite the first surface. The interposer structure includes island layers arranged on the first surface of the insulating base and corresponding to the semiconductor die. A portion of the encapsulating layer is sandwiched by at least two of the island layers. Alternatively, the interposer structure includes a passivation layer covering the second surface of the insulating base and having a recess that is extended along a peripheral edge of the insulating base.
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