PACKAGE STRUCTURE AND METHOD OF FABRICATING THE SAME

    公开(公告)号:US20210225776A1

    公开(公告)日:2021-07-22

    申请号:US16921907

    申请日:2020-07-06

    摘要: A package structure includes a redistribution structure, a first semiconductor die, a first passive component, a second semiconductor die, a first insulating encapsulant, a second insulating encapsulant, a second passive component and a global shielding structure. The redistribution structure includes dielectric layers and conductive layers alternately stacked. The first semiconductor die, the first passive component and the second semiconductor die are disposed on a first surface of the redistribution structure. The first insulating encapsulant is encapsulating the first semiconductor die and the first passive component. The second insulating encapsulant is encapsulating the second semiconductor die, wherein the second insulating encapsulant is separated from the first insulating encapsulant. The second passive component is disposed on a second surface of the redistribution structure. The global shielding structure is surrounding the first insulating encapsulant, the second insulating encapsulant, and covering sidewalls of the redistribution structure.

    INTEGRATED FAN-OUT PACKAGE AND METHOD OF FABRICATING THE SAME

    公开(公告)号:US20190096802A1

    公开(公告)日:2019-03-28

    申请号:US15716476

    申请日:2017-09-26

    摘要: Provided is an integrated fan-out package including a die, an insulating encapsulation, a redistribution circuit structure, a conductive terminal, and a barrier layer. The die is encapsulated by the insulating encapsulation. The redistribution circuit structure includes a redistribution conductive layer. The redistribution conductive layer is disposed in the insulating encapsulation and extending from a first surface of the insulating encapsulation to a second surface of the insulating encapsulation. The conductive terminal is disposed over the second surface of the insulating encapsulation. The barrier layer is sandwiched between the redistribution conductive layer and the conductive terminal. A material of the barrier layer is different from a material of the redistribution conductive layer and a material of the conductive terminal. A method of fabricating the integrated fan-out package is also provided.

    Semiconductor Devices and Methods of Manufacture

    公开(公告)号:US20230061716A1

    公开(公告)日:2023-03-02

    申请号:US17707481

    申请日:2022-03-29

    IPC分类号: H01L23/00

    摘要: Semiconductor devices and methods of manufacturing are provided, wherein a first passivation layer is deposited over a top redistribution structure; a second passivation layer is deposited over the first passivation layer; and a first opening is formed through the second passivation layer. After the forming the first opening, the first opening is reshaped into a second opening; a third opening is formed through the first passivation layer; and filling the second opening and the third opening with a conductive material.