Deposition Apparatus and Methods
    11.
    发明申请

    公开(公告)号:US20190352768A1

    公开(公告)日:2019-11-21

    申请号:US16527250

    申请日:2019-07-31

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    TOOLING FOR VAPOR DEPOSITION
    20.
    发明申请

    公开(公告)号:US20170144181A1

    公开(公告)日:2017-05-25

    申请号:US15006900

    申请日:2016-01-26

    CPC classification number: B05B15/62 C23C14/24 C23C14/243 C23C14/505

    Abstract: An embodiment of an apparatus includes a first crucible in communication with a deposition chamber, an energy source, and a workpiece fixture. The first crucible includes a plurality of walls defining an upper recess and a first lower recess, at least the upper recess open to an interior of the deposition chamber. The energy source is configured to selectively apply and direct energy within the deposition chamber, including toward the first crucible. The workpiece fixture includes tooling and a plurality of workpiece holders configured to retain at least one workpiece selectively within the deposition chamber. The tooling includes at least one wall separating at least a first of the plurality of workpiece holders from a second of the plurality of workpiece holders.

Patent Agency Ranking