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26 条记录 (耗时 0.063 秒)

    METHODS FOR PLASMA MATCHING BETWEEN DIFFERENT CHAMBERS AND PLASMA STABILITY MONITORING AND CONTROL
    11.
    发明申请
    METHODS FOR PLASMA MATCHING BETWEEN DIFFERENT CHAMBERS AND PLASMA STABILITY MONITORING AND CONTROL 有权
    不同燃烧室之间的等离子体匹配方法与等离子体稳定性监测与控制方法

    公开(公告)号：US20090030632A1

    公开(公告)日：2009-01-29

    申请号：US11829762

    申请日：2007-07-27

    申请人： SAIRAJU TALLAVARJULA ,  Aaron M. Hunter ,  Joseph M. Ranish ,  Johanes Swenberg ,  Robert M. Haney

    发明人： SAIRAJU TALLAVARJULA ,  Aaron M. Hunter ,  Joseph M. Ranish ,  Johanes Swenberg ,  Robert M. Haney

    IPC分类号： G06F19/00

    CPC分类号： G01N21/73 ,  G01J3/443 ,  G01J2003/2866 ,  G01N21/274

    摘要： Methods for matching semiconductor plasma processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in a sample chamber. Measuring the plasma attributes during process perturbations allows for the correlation of process parameters to the plasma optical emission spectra. The process parameters can then be adjusted to yield a processed substrate which matches that of the reference chamber. Methods for monitoring the stability of a plasma processing chamber using a calibrated spectrometer are also disclosed.

    摘要翻译： 公开了使用校准的光谱仪来匹配半导体等离子体处理室的方法。 在一个实施例中，测量参考室中的过程和样品室中的过程的等离子体属性。 在处理扰动期间测量等离子体属性允许工艺参数与等离子体发射光谱的相关性。 然后可以调整工艺参数以产生与参考室的处理参数相匹配的经处理的衬底。 还公开了使用校准的光谱仪监测等离子体处理室的稳定性的方法。

    Apparatus Including Heating Source Reflective Filter For Pyrometry
    14.
    发明申请
    Apparatus Including Heating Source Reflective Filter For Pyrometry 有权
    包括用于高温测定的加热源反射滤光器的设备

    公开(公告)号：US20090255921A1

    公开(公告)日：2009-10-15

    申请号：US12100179

    申请日：2008-04-09

    申请人： Joseph M. Ranish ,  Aaron M. Hunter ,  Blake R. Koelmel

    发明人： Joseph M. Ranish ,  Aaron M. Hunter ,  Blake R. Koelmel

    IPC分类号： G01J5/00 ,  H05B3/68

    CPC分类号： H01L21/67115 ,  H01L21/67248

    摘要： Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.

    摘要翻译： 公开了用于处理衬底和使用辐射测温法测量温度的方法和装置。 反射层设置在处理室的窗口上。 提供在第一波长范围内的辐射的辐射源加热衬底，所述衬底对于处于预定温度范围的第一波长范围内的第二波长范围内的辐射是透明的。 在第二波长范围内的辐射被反射层反射。

    METHOD AND APPARATUS FOR HEATING A SUBSTRATE
    15.
    发明申请
    METHOD AND APPARATUS FOR HEATING A SUBSTRATE 审中-公开
    用于加热基材的方法和装置

    公开(公告)号：US20080145038A1

    公开(公告)日：2008-06-19

    申请号：US11611680

    申请日：2006-12-15

    申请人： JOSEPH M. RANISH ,  Bruce E. Adams ,  Aaron M. Hunter

    发明人： JOSEPH M. RANISH ,  Bruce E. Adams ,  Aaron M. Hunter

    IPC分类号： F26B3/28

    CPC分类号： H01L21/67103 ,  H01L21/67098 ,  H01L21/67109 ,  H01L21/68714

    摘要： A method and apparatus for heating a substrate is provided herein. In one embodiment, a substrate heater includes a vessel having an upper member including a top surface for supporting a substrate thereon; a liquid disposed within and partially filling the vessel; and a heat source for providing sufficient heat to the liquid to boil the liquid. Optionally, a pressure controller for regulating the pressure within the vessel may be provided. The substrate is heated by first placing the substrate on the support surface of the vessel of the substrate heater. The liquid contained in the vessel is then boiled. As the liquid is boiling, a uniform film of heated condensation is deposited on a bottom side of the support surface. The heated condensation heats the support surface which in turn, heats the substrate.

    摘要翻译： 本文提供了一种用于加热衬底的方法和装置。 在一个实施例中，衬底加热器包括具有上部构件的容器，所述上部构件包括用于在其上支撑衬底的顶表面; 设置在容器内并部分填充容器的液体; 以及用于向液体提供足够的热量以使液体沸腾的热源。 可选地，可以提供用于调节容器内的压力的压力控制器。 首先将基板放置在基板加热器的容器的支撑表面上来加热基板。 然后将包含在容器中的液体煮沸。 当液体沸腾时，在支撑表面的底侧上沉积有均匀的加热冷凝膜。 加热的冷凝会加热支撑表面，从而加热基板。

    Multiple band pass filtering for pyrometry in laser based annealing systems
    16.
    发明申请
    Multiple band pass filtering for pyrometry in laser based annealing systems 有权
    在激光基退火系统中进行高频测量的多带通滤波

    公开(公告)号：US20090084986A1

    公开(公告)日：2009-04-02

    申请号：US12283615

    申请日：2008-09-12

    申请人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    发明人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    IPC分类号： G01J5/00 ,  G21G1/00

    CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

    摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

    摘要翻译： 热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学 元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路 波长，第二光路位于光束投影光学器件和高温计之间。 该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

    Apparatus and method for measuring substrate temperature
    17.
    发明授权
    Apparatus and method for measuring substrate temperature 失效
    基板温度测量装置及方法

    公开(公告)号：US6007241A

    公开(公告)日：1999-12-28

    申请号：US26855

    申请日：1998-02-20

    申请人： Mark Yam ,  Aaron M. Hunter

    发明人： Mark Yam ,  Aaron M. Hunter

    IPC分类号： G01J5/00 ,  G01J5/04 ,  G01J5/06 ,  G01J5/08

    CPC分类号： G01J5/041 ,  G01J5/0003

    摘要： An apparatus for measuring the temperature of a substrate in a thermal processing chamber. The substrate is suspended above a reflector to form a reflecting cavity. A probe of a temperature sensor has an input end positioned to receive radiation from the reflecting cavity and an output end optically coupled to a detector to provide a temperature reading. The temperature sensor is configured to reduce the effect that radiation which has an axis of propagation within an angle of an axis normal to the reflector, e.g., substantially normal radiation from a portion of the substrate adjacent to the input end of the probe, has on the temperature reading.

    摘要翻译： 一种用于测量热处理室中的衬底的温度的装置。 衬底悬挂在反射器上方以形成反射腔。 温度传感器的探头具有一个输入端，该输入端定位成接收来自反射腔的辐射，以及光耦合到检测器以提供温度读数的输出端。 温度传感器被配置为减少在与反射器垂直的轴的角度内具有传播轴线的辐射的影响，例如来自与探头的输入端相邻的基板的一部分的基本正常的辐射已经开启 温度读数。

    Method and apparatus for extended temperature pyrometry
    19.
    发明授权
    Method and apparatus for extended temperature pyrometry 有权
    用于扩展温度测温法的方法和装置

    公开(公告)号：US08254767B2

    公开(公告)日：2012-08-28

    申请号：US12547605

    申请日：2009-08-26

    申请人： Aaron M. Hunter ,  Jiping Li ,  Rajesh S. Ramanujam ,  Thomas Haw

    发明人： Aaron M. Hunter ,  Jiping Li ,  Rajesh S. Ramanujam ,  Thomas Haw

    IPC分类号： A21B2/00

    CPC分类号： H01L21/67248 ,  H01L21/67115

    摘要： Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.

    摘要翻译： 本发明的实施例涉及用于在包括低温的扩展温度范围内快速热处理衬底的方法和装置。 公开了使用采用透射辐射探测器系统的扩展温度测温系统的系统和方法。 还描述了组合透射辐射检测器系统和发射的辐射探测器系统的系统。

    Multiple band pass filtering for pyrometry in laser based annealing systems
    20.
    发明授权
    Multiple band pass filtering for pyrometry in laser based annealing systems 有权
    在激光基退火系统中进行高频测量的多带通滤波

    公开(公告)号：US07717617B2

    公开(公告)日：2010-05-18

    申请号：US12283615

    申请日：2008-09-12

    申请人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    发明人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    IPC分类号： G01N3/28 ,  G01J5/08 ,  H01L21/477

    CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

    摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

    摘要翻译： 热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学 元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路 波长，第二光路位于光束投影光学器件和高温计之间。 该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。