公开(公告)号：US08094394B2

公开(公告)日：2012-01-10

申请号：US12665562

申请日：2008-07-14

申请人： Tomohiro Yamada ,  Masaya Ogino ,  Yasuhisa Inao

发明人： Tomohiro Yamada ,  Masaya Ogino ,  Yasuhisa Inao

IPC分类号： G02B5/22 ,  G02F1/03

CPC分类号： G02B5/223 ,  G02B5/008 ,  G02B5/201 ,  G02B5/204 ,  H01L27/1462 ,  H01L27/14621

摘要： An optical filter that transmits light of the visible light region includes a dielectric substrate; a dielectric layer that is formed on a surface of the dielectric substrate; and a first metal structure group in which a plurality of first metal structures are arranged two-dimensionally in an isolated state in the in-plane direction of the dielectric substrate, that is provided between the dielectric substrate and the dielectric layer, comprising: the first metal structures having first and second lengths in first and second directions orthogonal to each other, which lengths are equal to or less than a first wavelength in the visible light region; and a transmittance of the first wavelength being reduced or a reflectance being increased by surface plasmons induced on a surface of the first metal structures by resonance between light incident on the dielectric substrate or the dielectric layer and the first metal structures.

摘要翻译： 透射可见光区域的光的滤光器包括电介质基片; 介电层，其形成在所述电介质基板的表面上; 以及设置在所述电介质基板和所述电介质层之间的所述电介质基板的面内方向上以隔离状态二维地配置多个所述第一金属结构体的第一金属结构体，所述第一金属结构体包括：所述第一金属结构体， 在第一和第二方向上具有彼此正交的第一和第二长度的金属结构，其长度等于或小于可见光区域中的第一波长; 并且通过入射到电介质基板或电介质层上的光与第一金属结构之间的共振，在第一金属结构的表面上引起的表面等离子体激元的第一波长的透射率减小或反射率增加。

公开(公告)号：US20100220377A1

公开(公告)日：2010-09-02

申请号：US12665562

申请日：2008-07-14

申请人： Tomohiro Yamada ,  Masaya Ogino ,  Yasuhisa Inao

发明人： Tomohiro Yamada ,  Masaya Ogino ,  Yasuhisa Inao

IPC分类号： G02B5/26

CPC分类号： G02B5/223 ,  G02B5/008 ,  G02B5/201 ,  G02B5/204 ,  H01L27/1462 ,  H01L27/14621

摘要： An optical filter that transmits light of the visible light region includes a dielectric substrate; a dielectric layer that is formed on a surface of the dielectric substrate; and a first metal structure group in which a plurality of first metal structures are arranged two-dimensionally in an isolated state in the in-plane direction of the dielectric substrate, that is provided between the dielectric substrate and the dielectric layer, comprising: the first metal structures having first and second lengths in first and second directions orthogonal to each other, which lengths are equal to or less than a first wavelength in the visible light region; and a transmittance of the first wavelength being reduced or a reflectance being increased by surface plasmons induced on a surface of the first metal structures by resonance between light incident on the dielectric substrate or the dielectric layer and the first metal structures.

摘要翻译： 透射可见光区域的光的滤光器包括电介质基片; 介电层，其形成在所述电介质基板的表面上; 以及设置在所述电介质基板和所述电介质层之间的所述电介质基板的面内方向上以隔离状态二维地配置多个所述第一金属结构体的第一金属结构体，所述第一金属结构体包括：所述第一金属结构体， 在第一和第二方向上具有彼此正交的第一和第二长度的金属结构，其长度等于或小于可见光区域中的第一波长; 并且通过入射到电介质基板或电介质层上的光与第一金属结构之间的共振，在第一金属结构的表面上引起的表面等离子体激元的第一波长的透射率减小或反射率增加。

公开(公告)号：US07733491B2

公开(公告)日：2010-06-08

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G12Q1/68 ,  G01N1/02 ,  G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US20100029027A1

公开(公告)日：2010-02-04

申请号：US12509635

申请日：2009-07-27

申请人： Mitsuhiro Ikuta ,  Yasuhisa Inao ,  Takako Yamaguchi

发明人： Mitsuhiro Ikuta ,  Yasuhisa Inao ,  Takako Yamaguchi

IPC分类号： H01L21/00 ,  H01S5/00

CPC分类号： H01S5/18391 ,  H01S5/18311 ,  H01S5/18347 ,  H01S2301/166 ,  H01S2301/176

摘要： Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.

摘要翻译： 本发明提供了一种表面发射激光制造方法等，其减少了对表面起伏结构发生的工艺损伤，能够稳定地提供单一横模特性。 提供了一种包括用于控制上反射镜的发光部分中的反射率的表面浮雕结构的方法，所述表面浮雕结构包括阶梯结构，包括：形成包括用于形成台面结构的图案的抗蚀剂图案和用于形成台阶结构的图案 在上反射镜上或上方形成台阶结构，并执行用于蚀刻上镜的表面层的第一相蚀刻以确定阶梯结构的水平位置; 在执行第一相蚀刻之后形成电流限制结构; 并且在形成电流限制结构之后，执行第二相蚀刻以进一步蚀刻已经执行第一相蚀刻的区域，以确定阶梯结构的深度位置。

公开(公告)号：US20080199817A1

公开(公告)日：2008-08-21

申请号：US12102152

申请日：2008-04-14

申请人： Natsuhiko Mizutani ,  Yasuhisa Inao

发明人： Natsuhiko Mizutani ,  Yasuhisa Inao

IPC分类号： G03F7/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/36 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325

摘要： A resist pattern forming method includes preparing a photomask for generating near-field light having an intensity distribution. The photomask has a light-transmissible base member, and a light-blocking film. The film has a micro-aperture adapted to expose an object to near-field light seeping out from the micro-aperture. The photomask has a periodic structure and a shift of a phase. The shift exists between recesses or projections adjacent to the micro-aperture. A difference in the intensity distribution of the near-field light in the area of the aperture is reduced. The photomask is arranged close to a photoresist film on a substrate. Light from a light source irradiates the photoresist film by way of the photomask to form a latent image based on the micro-aperture, and the photoresist film is developed to form a resist pattern on the substrate based on the latent image.

摘要翻译： 抗蚀剂图案形成方法包括制备用于产生具有强度分布的近场光的光掩模。 光掩模具有透光性基材和遮光膜。 该膜具有适于将物体暴露于从微孔渗出的近场光的微孔。 光掩模具有周期性结构和相位偏移。 在与微孔相邻的凹部或突起之间存在偏移。 孔径区域中的近场光的强度分布的差异减小。 光掩模布置在基板上的光致抗蚀剂膜附近。 来自光源的光通过光掩模照射光致抗蚀剂膜，以基于微孔形成潜像，并且基于潜像在光致抗蚀剂图案上显影以在基板上形成抗蚀剂图案。

公开(公告)号：US20080107998A1

公开(公告)日：2008-05-08

申请号：US11740604

申请日：2007-04-26

申请人： Yasuhisa Inao ,  Takako Yamaguchi ,  Toshiki Ito ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Takako Yamaguchi ,  Toshiki Ito ,  Natsuhiko Mizutani

IPC分类号： G03F9/00

CPC分类号： G03F7/2014 ,  G03F1/50 ,  G03F7/091 ,  G03F7/094 ,  G03F7/7035

摘要： A near-field exposure method in which a light blocking film with an opening having an opening width not greater than a wavelength size of exposure light is contacted to an object to be exposed and in which light from an exposure light source is projected on the light blocking film so that a pattern based on the opening of the light blocking film is formed on the object to be exposed, by use of near-field light produced at the opening, wherein the object to be exposed is prepared by a process that includes (i) a step of providing, upon a substrate having surface irregularity, a shape buffering layer so as to fill the surface irregularity thereof to thereby flatten the surface of the substrate, (ii) a step of providing, upon the shape buffering layer, a light reflecting layer for reflecting the exposure light, and (iii) a step of providing a photosensitive resist layer upon the light reflecting layer, and wherein the exposure is carried out to the object so prepared.

摘要翻译： 一种近场曝光方法，其中具有不大于曝光光的波长尺寸的开口宽度的开口的遮光膜与待曝光的物体接触，并且来自曝光光源的光被投射到光 使得通过使用在开口处产生的近场光，在待曝光的物体上形成基于遮光膜的开口的图案，其中待曝光的物体通过包括（ i）在具有表面不规则的基板上设置形状缓冲层以填充其表面不规则性从而使基板的表面变平的步骤，（ii）在形状缓冲层上设置一个 用于反射曝光光的光反射层，以及（iii）在光反射层上提供光敏抗蚀剂层的步骤，并且其中对如此制备的物体进行曝光。

公开(公告)号：US07303859B2

公开(公告)日：2007-12-04

申请号：US11439983

申请日：2006-05-25

申请人： Takako Yamaguchi ,  Yasuhisa Inao

发明人： Takako Yamaguchi ,  Yasuhisa Inao

IPC分类号： G03F7/30 ,  G03F7/023

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/60 ,  G03F7/0236 ,  G03F7/2014 ,  G03F7/70325

摘要： There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing for reduced pattern edge roughness, and a photolithography method including a step of exposing by the near-field exposure the photoresist layer for image formation made thereof. In a positive photoresist containing an alkali-soluble novolak resin and a quinone diazide compound, the film thickness of the photoresist at the time of exposure is not larger than 100 nm, and the absorption coefficient of the photoresist α (μm−1) for the exposure light is such that 0.5≦α≦7.

摘要翻译： 提供了用于近场暴露的正性光致抗蚀剂，即使对于用于图像形成的光致抗蚀剂层的薄层厚度也具有优异的光利用效率，并且允许减小的图案边缘粗糙度，以及包括通过近场曝光的步骤曝光的步骤的光刻方法， 场曝光用于其形成的图像形成用光致抗蚀剂层。 在含有碱溶性酚醛清漆树脂和醌二叠氮化合物的正性光致抗蚀剂中，曝光时的光致抗蚀剂的膜厚不大于100nm，光致抗蚀剂α（mum < ）使得曝光光使得0.5 <=α<= 7。

公开(公告)号：US07262851B2

公开(公告)日：2007-08-28

申请号：US11166106

申请日：2005-06-27

申请人： Ryo Kuroda ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042

摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

摘要翻译： 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii） 第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。

公开(公告)号：US20060166112A1

公开(公告)日：2006-07-27

申请号：US11393988

申请日：2006-03-31

申请人： Natsuhiko Mizutani ,  Yasuhisa Inao

发明人： Natsuhiko Mizutani ,  Yasuhisa Inao

IPC分类号： G03C5/00 ,  G03B27/42 ,  G03F1/00

CPC分类号： B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/7035

摘要： A photomask for near-field light exposure includes a transparent substrate, and a shading member on the substrate, the shading member having a mask pattern including an aperture with a width not greater than the wavelength of light from a light source. The shading member has a thickness that provides a required light intensity right below the aperture in consideration of a relationship with the width of the aperture.

公开(公告)号：US20060007440A1

公开(公告)日：2006-01-12

申请号：US11166106

申请日：2005-06-27

申请人： Ryo Kuroda ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042

摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

摘要翻译： 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii） 第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。