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97 条记录 (耗时 0.033 秒)

    Light-sensitive image-forming material
    15.
    发明授权
    Light-sensitive image-forming material 失效
    感光成像材料

    公开(公告)号：US4388399A

    公开(公告)日：1983-06-14

    申请号：US347620

    申请日：1982-02-10

    申请人： Fumiaki Shinozaki ,  Tomizo Namiki ,  Tomoaki Ikeda

    发明人： Fumiaki Shinozaki ,  Tomizo Namiki ,  Tomoaki Ikeda

    IPC分类号： G03F1/56 ,  G03C1/76

    CPC分类号： G03F1/56

    摘要： A light-sensitive image-forming material which comprises a support having provided thereon a first layer comprising at least one alcohol-soluble polyamide resin and, on said first layer, a second layer comprising a light-sensitive photoresist composition, said layer containing said alcohol-soluble polyamide resin containing one or more polymers having one or more of a free carboxy group(s), one or more of a phenolic hydroxy group(s) or a maleic anhydride group in a proportion of about 0.1:9.9 to 6:4 by weight to said polyamide resin.

    摘要翻译： 一种感光成像材料，其包括其上设置有包含至少一种醇可溶性聚酰胺树脂的第一层的载体，并且在所述第一层上包含含有光敏光致抗蚀剂组合物的第二层，所述含有所述醇的层 含有一种或多种具有一个或多个游离羧基，一个或多个酚羟基或马来酸酐基团的聚合物的可溶性聚酰胺树脂，其比例为约0.1:9.9至6:4 （重量）。

    Process for producing a material having a vapor-deposited metal layer, and process for producing a recording material
    17.
    发明授权
    Process for producing a material having a vapor-deposited metal layer, and process for producing a recording material 失效
    用于制备具有气相沉积金属层的材料的方法，以及用于制备记录材料的方法

    公开(公告)号：US4268541A

    公开(公告)日：1981-05-19

    申请号：US81221

    申请日：1979-10-02

    申请人： Tomoaki Ikeda ,  Satoshi Yoshida ,  Hideaki Takeuchi ,  Fumiaki Shinozaki ,  Keishiro Kido

    发明人： Tomoaki Ikeda ,  Satoshi Yoshida ,  Hideaki Takeuchi ,  Fumiaki Shinozaki ,  Keishiro Kido

    IPC分类号： B05D7/24 ,  G03F1/00 ,  H01F41/14 ,  B05D1/36 ,  B05D7/04

    CPC分类号： B05D1/60 ,  B05D7/24 ,  H01F41/14

    摘要： A process for producing a sheet-like material having a vapor-deposited metallic layer thereon, which comprises vapor depositing a layer of a metal, a layer of different metals in contact with each other, a layer of a metal alloy, a layer of a metal and a metal compound in contact with each other or a layer of a metal compound as the metallic layer on a support of a polymeric material having a glass transition temperature of at least about 0.degree. C., a composite of said polymeric material and paper, woven or non-woven cloth, or paper using at least one member selected from the group consisting of metals, metal alloys and metal compounds as an evaporating material in the vapor depositing, and then forming a layer of an organic material on the metallic layer by vapor deposition using an evaporable organic material as an evaporating material in the vapor depositing.

    摘要翻译： 一种用于制造其上具有气相沉积金属层的片状材料的方法，其包括气相沉积金属层，彼此接触的不同金属层，金属合金层， 金属和金属化合物彼此接触或金属化合物层作为金属层在玻璃化转变温度为至少约0℃的聚合材料的载体上，所述聚合材料和纸的复合物 ，织造或无纺布，或使用在气相沉积中使用选自金属，金属合金和金属化合物作为蒸发材料的组中的至少一种的材料，然后在金属层上形成有机材料层 通过使用蒸发有机材料作为气相沉积中的蒸发材料进行气相沉积。

    Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
    18.
    发明授权
    Spectrally sensitized positive light-sensitive o-quinone diazide containing composition 失效
    光谱敏感的正亮度的O-QUINONE DIAZIDE包含组合物

    公开(公告)号：US4105450A

    公开(公告)日：1978-08-08

    申请号：US689874

    申请日：1976-05-25

    申请人： Fumiaki Shinozaki ,  Tomoaki Ikeda

    发明人： Fumiaki Shinozaki ,  Tomoaki Ikeda

    IPC分类号： G03F7/022 ,  G03F7/08 ,  G03C1/54

    CPC分类号： G03F7/0226

    摘要： A positive light-sensitive composition containing: (a) a quinonediazide type, positive light-sensitive substance and (1) (b) at least one compound selected from the group consisting of those compounds represented by the following general formulae (I) ##STR1## wherein X.sub.1 and X.sub.2 each represents an oxygen atom or a sulfur atom; R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; (2) those compounds represented by the general formula (II) ##STR2## wherein R.sub.3 represents a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a cycloalkyl group; and R.sub.4 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and (3) o-benzoic acid sulfimide.

    Negative image forming process in o-quinone diazide layer utilizing laser beam
    19.
    发明授权
    Negative image forming process in o-quinone diazide layer utilizing laser beam 失效
    利用激光束在邻醌二叠层中的负成像过程

    公开(公告)号：US4544627A

    公开(公告)日：1985-10-01

    申请号：US548132

    申请日：1983-11-03

    申请人： Yonosuke Takahashi ,  Hiromichi Tachikawa ,  Fumiaki Shinozaki ,  Tomoaki Ikeda

    发明人： Yonosuke Takahashi ,  Hiromichi Tachikawa ,  Fumiaki Shinozaki ,  Tomoaki Ikeda

    IPC分类号： G03C1/72 ,  G03C5/00 ,  G03C5/16 ,  G03C5/56 ,  G03F7/022 ,  G03F7/20 ,  H01L21/027 ,  G03F7/26

    CPC分类号： G03F7/0226 ,  Y10S430/146

    摘要： A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.

    摘要翻译： 一种负性图像形成方法，其包括将包含其上包含（i）邻醌二叠氮化合物和（ii）第二化合物）的敏感层的载体均匀曝光于能够将o- 醌二叠氮化合物与相应的茚羧酸化合物反应，然后在所述曝光的感光材料成像曝光的同时使曝光区域的茚羧酸化合物转化为相应的茚化合物并用碱性显影液显影， 以将未曝光区域溶解到激光束，其中所述第二化合物通过将茚羧酸转化为相应的茚化合物而降低了显影溶液中的激光曝光区域的溶解速率，从而产生所述图像。