公开(公告)号：US20110024779A1

公开(公告)日：2011-02-03

申请号：US12673806

申请日：2008-08-25

申请人： Masahiro Nakamura ,  Takeyuki Yamaki ,  Yoshio Mitsutake ,  Masahito Yamana ,  Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji

发明人： Masahiro Nakamura ,  Takeyuki Yamaki ,  Yoshio Mitsutake ,  Masahito Yamana ,  Nobuhiro Ide ,  Norihiro Ito ,  Hiroya Tsuji

IPC分类号： H01L51/50

CPC分类号： H01L51/5268 ,  B82Y20/00 ,  B82Y30/00 ,  H01L2251/5369

摘要： An organic EL device in the present invention comprises a light-transmissive substrate 1, an organic light emitting layer 2, a light-transmissive electrode 3 disposed between the light-transmissive substrate 1 and the organic light emitting layer 2, and a light guiding layer 4 which is disposed between the substrate 1 and the light-transmissive electrode 3. The light guiding layer 4 is configured to alter light direction. The organic EL device is configured to emit light from the organic light emitting layer 2, and allow the light to propagate out through said light guiding layer 4, the light-transmissive electrode 3, and the light-transmissive substrate 1. The light guiding layer 4 includes a light dispersion layer 5. The light dispersion layer 5 is formed with a light dispersion region 8 and a light-transmissive region 9, which are arranged in a coplanar relation within said light dispersion layer 5. The light dispersion region 8 contains light dispersion particles 6 and a binder resin 7. The light-transmissive region 9 contains the light dispersion particles 6 at a lower ratio than the light dispersion region 8. The organic EL device in the present invention enables to improve an overall light output by suppressing the reduction of light output in the front direction as well as increasing light output in diagonal directions.

摘要翻译： 本发明的有机EL元件包括透光性基板1，有机发光层2，配置在透光性基板1和有机发光层2之间的透光性电极3和导光层 4，其设置在基板1和透光电极3之间。导光层4被配置为改变光线方向。 有机EL器件被配置为从有机发光层2发光，并且允许光通过所述导光层4，透光电极3和透光基板1传播出去。导光层 4包括光分散层5.光分散层5形成有在所述光分散层5内以共面关系排列的光分散区域8和透光区域9.光分散区域8包含光 分散粒子6和粘合剂树脂7.透光区域9含有比分散区域8低的比例的光分散粒子6.本发明的有机EL元件能够通过抑制 在正向上减少光输出以及增加对角线方向的光输出。

公开(公告)号：US08950414B2

公开(公告)日：2015-02-10

申请号：US12837840

申请日：2010-07-16

申请人： Norihiro Ito

发明人： Norihiro Ito

IPC分类号： H01L21/00 ,  H01L21/67

CPC分类号： H01L21/6708 ,  H01L21/67051 ,  H01L21/67248 ,  Y10S134/902

摘要： The liquid processing apparatus includes: a liquid supply mechanism; a supply line connected to the liquid supply mechanism, the supply line having a discharge opening for discharging a temperature-regulated liquid; a processing unit supporting the discharge opening of the supply line; a return line configured to return the liquid supplied to the supply line to the liquid supply mechanism; and a liquid-supply switching valve configured to switch between supply of the liquid, which is used in a processing of an object to be processed in the processing unit, and stoppage of the liquid supply. The liquid-supply switching valve is disposed on the supply line on a route of the liquid returning from the supply line to the liquid supply mechanism through the return line.

摘要翻译： 液体处理装置包括：液体供给机构; 连接到液体供给机构的供给管线，供给管线具有用于排出温度调节液体的排出口; 支撑供给管线的排出口的处理单元; 返回管线，被配置为将供应到所述供应管线的液体返回到所述液体供应机构; 以及液体供给切换阀，其配置为在所述处理单元中的被处理物的处理中使用的液体的供给与所述液体供给的停止之间切换。 液体供给切换阀通过返回管路从供给管路返回到液体供给机构的液体的路线配置在供给管路上。

公开(公告)号：US20130014786A1

公开(公告)日：2013-01-17

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/04 ,  F17D1/00

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

摘要翻译： 顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。 设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。 构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

公开(公告)号：US08201568B2

公开(公告)日：2012-06-19

申请号：US12533743

申请日：2009-07-31

申请人： Norihiro Ito ,  Hidemasa Aratake

发明人： Norihiro Ito ,  Hidemasa Aratake

IPC分类号： B08B7/00 ,  B08B7/04 ,  B08B3/00 ,  B08B3/04

CPC分类号： B08B3/04 ,  H01L21/67051 ,  Y10S134/902

摘要： Disclosed is a liquid treatment apparatus capable of effectively exhausting processing liquid atmosphere around a target object. The liquid treatment apparatus includes a container, a support part located within the container that supports the target object, a rotation driving mechanism to rotate the target object supported by the support part, a processing liquid supply mechanism to supply a processing liquid to the target object, and a rotation cup, which is located outside of the outer circumference of the target object and is rotatable together with the support part. A rotation exhaust cup is arranged above the rotation cup and is rotatable together with the rotation cup. A discharge mechanism discharges processing liquid atmosphere guided by the rotation cup and the rotation exhaust cup.

摘要翻译： 公开了能够有效地排出目标物体周围的处理液体气氛的液体处理装置。 液体处理装置包括容器，位于容器内的支撑目标物体的支撑部，旋转驱动机构，使由支撑部支撑的目标物体旋转;处理液供给机构，用于向目标物体供给处理液 以及旋转杯，其位于目标物体的外周的外侧，并与支撑部一起旋转。 旋转排气杯设置在旋转杯的上方，并与旋转杯一起旋转。 排出机构排出由旋转杯和旋转排气杯引导的处理液体气氛。

公开(公告)号：US20100144158A1

公开(公告)日：2010-06-10

申请号：US11991845

申请日：2007-07-20

申请人： Norihiro Ito ,  Satoshi Kaneko ,  Hiromitsu Nanba

发明人： Norihiro Ito ,  Satoshi Kaneko ,  Hiromitsu Nanba

IPC分类号： H01L21/46

CPC分类号： H01L21/67051

摘要： A liquid treatment device having a substrate holding section (2) for horizontally holding a wafer (W) and capable of rotating with the wafer (W), a rotation cup (4) having an annular shape so as to surround the wafer (W) held by the substrate holding section (2) and capable of rotating with the wafer (W), a rotation mechanism (3) for integrally rotating the rotation cup (4) and the substrate holding section (2), a nozzle (5) for supplying a treatment liquid for the wafer (W) and a cleaning liquid for the rotation cup (4), a liquid supply section (85) for supplying the treatment liquid and cleaning liquid to the nozzle (5), and a nozzle movement mechanism for moving the nozzle (5) between a first position at which the liquid is discharged to the wafer (W) and a second position at which the liquid is discharged to an external portion of the rotation cup (4). The wafer (W) is treated with the liquid with the nozzle (5) positioned at the wafer treatment position, and the cleaning liquid is discharged to the external portion of the rotation cup with the nozzle (5) positioned at the rotation cup cleaning position.

摘要翻译： 一种液体处理装置，具有用于水平地保持晶片（W）并且能够与晶片（W）一起旋转的基板保持部分（2），具有围绕晶片（W）的环形的旋转杯（4） 由所述基板保持部（2）保持并且能够与所述晶片（W）一起旋转的旋转机构（3），所述旋转机构（3）用于使所述旋转杯（4）和所述基板保持部（2）一体旋转;喷嘴（5），其用于 提供用于晶片（W）的处理液和用于旋转杯（4）的清洁液体，用于向喷嘴（5）供应处理液和清洁液体的液体供应部分（85），以及用于 将喷嘴（5）在液体排放到晶片（W）的第一位置和液体排出到旋转杯（4）的外部的第二位置之间移动。 用喷嘴（5）位于晶片处理位置的液体处理晶片（W），并且将清洁液体喷射到旋转杯的外部，喷嘴（5）位于旋转杯清洁位置 。

公开(公告)号：US20070289528A1

公开(公告)日：2007-12-20

申请号：US11808855

申请日：2007-06-13

申请人： Hiromitsu Nanba ,  Norihiro Ito

发明人： Hiromitsu Nanba ,  Norihiro Ito

IPC分类号： B05C11/02 ,  B05B1/28

CPC分类号： H01L21/67051 ,  G03F7/162 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/68728 ,  H01L21/68735

摘要： A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow servers to lead the process liquid within the drain cup to the drain port.

摘要翻译： 一种液体处理装置，包括：基板保持部件，其被构造成与水平状态下保持的基板一起旋转; 环形旋转杯，其构造成围绕保持在所述基板保持构件上并且与所述基板一起旋转的所述基板; 旋转机构，其构造成使所述旋转杯和所述基板保持部件一体旋转; 以及配置成将处理液体供应到所述基板上的液体供给机构。 该装置还包括环形排水杯，其构造成接收从旋转杯排出的处理液体，并设置有排出口; 以及圆形流量产生元件，其被配置为当所述旋转杯和所述基板保持构件旋转时在所述排水杯内产生圆形流动，使得所述圆形流动服务器将所述排水杯内的处理液体引导到排出口。

公开(公告)号：US20070107751A1

公开(公告)日：2007-05-17

申请号：US10581729

申请日：2004-12-16

申请人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

发明人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

IPC分类号： B08B7/04 ,  C23G1/00 ,  B08B3/00

CPC分类号： H01L21/68721 ,  B01D53/002 ,  B01D2257/106 ,  C01B13/10 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the condensed water. Water vapor is mixed with the O3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.

摘要翻译： 将水蒸汽与由放电型臭氧发生器产生的O 3气体混合。 混合流体由冷却器冷却，由此含有的O 3 3气体中的杂质如金属和氮氧化物溶解在冷凝水中。 随后，气液分离器从冷凝水中分离出O 3 N 3气体。 水蒸汽再次与O 3 3气体混合。 混合流体通过金属捕集器，该金属捕集器由含有多个硅芯片的容器组成，作为金属吸附剂，从而从其中除去剩余的金属。

公开(公告)号：US07086410B2

公开(公告)日：2006-08-08

申请号：US10384089

申请日：2003-03-07

申请人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

发明人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

IPC分类号： G05D16/20

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10S134/902 ,  Y10S438/935 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87917

摘要： A common solvent vapor supply source 41 and a common processing gas supply source 42 supply ozone gas and steam to a plurality of processing vessels 30A, 30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves 50A, 50B, which are placed in exhaust lines 80A, 80B, respectively.

摘要翻译： 常见的溶剂蒸气供给源41和公共处理气体供应源42向多个处理容器30A，30B供应臭氧气体和蒸汽。处理容器中的压力通过调节有价值的节流阀50A的开口来调节 ，50B，它们分别放置在排气管线80A，80B中。

公开(公告)号：US20130319476A1

公开(公告)日：2013-12-05

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member (22) that holds a substrate (W) horizontally, a rotation mechanism (25) that rotates the substrate holding member; a chemical liquid nozzle (56a) that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate (50) that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp (62) that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

摘要翻译： 液体处理装置包括：水平地保持基板（W）的基板保持部件（22）;使基板保持部件旋转的旋转机构（25）; 向由所述基板保持部件保持的所述基板供给化学液体的化学液体喷嘴（56a） 顶板（50），其从所述基板的上方覆盖由所述基板保持部件保持的基板; 以及至少一个LED灯（62），其通过从所述顶板的上方通过所述顶板照射预定波长的光而在化学液体处理期间加热所述基板。

公开(公告)号：US20110209560A1

公开(公告)日：2011-09-01

申请号：US13035010

申请日：2011-02-25

申请人： Norihiro Ito ,  Hiroyuki Kudoh

发明人： Norihiro Ito ,  Hiroyuki Kudoh

IPC分类号： G01F1/34

CPC分类号： G01F1/36 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67253 ,  H01L21/68792

摘要： There is provided a substrate processing method of supplying a processing solution to a substrate through a supply nozzle connected with a supply path via a differential pressure flowmeter provided on the supply path for supplying the processing solution and performing a process on the substrate by the processing solution. The substrate processing method includes measuring a pressure value in the supply path by a pressure measurement unit included in the differential pressure flowmeter when the processing solution is not supplied to the substrate; determining whether the pressure measurement unit is operated normally by comparing the pressure value measured in the measuring process with a predetermined pressure value; and supplying the processing solution to a substrate if it is determined that the pressure measurement unit is operated normally in the determining process.

摘要翻译： 提供了一种基板处理方法，其通过设置在供给路径上的差压式流量计与供给路径连接的供给喷嘴向基板供给处理液，该供给路径用于供给处理液，并通过处理液对基板进行处理 。 基板处理方法包括当处理液不被供给到基板时，通过包括在压差流量计中的压力测量单元来测量供给路径中的压力值; 通过将测量过程中测量的压力值与预定压力值进行比较来确定压力测量单元是否正常工作; 以及如果在所述确定过程中确定所述压力测量单元正常地操作，则将所述处理溶液供应到基板。