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公开(公告)号：US08711347B2
公开(公告)日：2014-04-29
申请号：US13701030
申请日：2011-05-25
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8874
摘要： Disclosed is a defect inspection method which makes it possible to scan the entire surface of a sample and detect minute defects without causing thermal damage to the sample. A defect inspection method in which a pulse laser emitted from a light source is subjected to pulse division and irradiated on the surface of a sample which moves in one direction while the divided-pulse pulse laser is rotated, reflection light from the sample irradiated by the divided-pulse pulse laser is detected, the signal of the detected reflection light is processed to detect defects on the sample, and information regarding a detected defect is output to a display screen, wherein the barycentric position of the light intensity of the divided-pulse pulse laser is monitored and adjusted.
摘要翻译： 公开了一种缺陷检查方法，其可以扫描样品的整个表面并检测微小缺陷而不会对样品造成热损伤。 对从光源射出的脉冲激光进行脉冲分割并照射在分割脉冲激光器旋转时在一个方向上移动的样品的表面的缺陷检查方法中， 检测出分割脉冲脉冲激光，检测出反射光的信号，以检测样本上的缺陷，将与检测到的缺陷有关的信息输出到显示画面，其中分割脉冲的光强度的重心位置 脉冲激光被监测和调整。
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公开(公告)号：US08670116B2
公开(公告)日：2014-03-11
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译： 提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描 缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光 响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。
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公开(公告)号：US20140009755A1
公开(公告)日：2014-01-09
申请号：US13701834
申请日：2011-07-01
申请人： Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
发明人： Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/9501
摘要： In order to enable inspections to be conducted at a sampling rate higher than the pulse oscillation frequency of a pulsed laser beam emitted from a laser light source, without damaging samples, a defect inspection method is disclosed, wherein: a single pulse of a pulsed laser beam emitted from the laser light source is split into a plurality of pulses; a sample is irradiated with this pulse-split pulsed laser beam; scattered light produced by the sample due to the irradiation is focused and detected; and defects on the sample are detected by using information obtained by focusing and detecting the scattered light from the sample. Said defect inspection method is configured such that the splitting a single pulse of the pulsed laser beam into a plurality of pulses is controlled in such a manner that the peak values of the split pulses are substantially uniform.
摘要翻译： 为了使得能够以高于从激光光源发射的脉冲激光束的脉冲振荡频率的采样率进行检查，而不损害样品，公开了一种缺陷检查方法，其中：脉冲激光的单个脉冲 从激光光源发射的光束被分成多个脉冲; 用脉冲分割脉冲激光束照射样品; 聚焦和检测由于照射产生的样品产生的散射光; 通过使用通过聚焦和检测来自样品的散射光获得的信息来检测样品上的缺陷。 所述缺陷检查方法被配置为使得将脉冲激光束的单个脉冲分裂成多个脉冲以使得分离脉冲的峰值基本上均匀的方式被控制。
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公开(公告)号：US09109194B2
公开(公告)日：2015-08-18
申请号：US13505803
申请日：2010-11-05
申请人： Toshifumi Honda , Hiroko Fujita , Muneo Maeshima , Akira Maekawa , Yoshiko Ishida , Yuta Urano , Shinya Murakami
发明人： Toshifumi Honda , Hiroko Fujita , Muneo Maeshima , Akira Maekawa , Yoshiko Ishida , Yuta Urano , Shinya Murakami
摘要： When multiple kinds of bacterial colonies are present in a petri dish and, for example, a drug tolerance is to be measured, harvesting of mixed colonies of different types of bacteria makes it impossible to accurately determine the drug tolerance. Also, it is required to improve the throughput of a device for harvesting a bacterial colony. From images illuminated from multiple directions, isolating bacterial colonies are automatically extracted. Next, the image feature amounts are calculated from the multiple images that are illuminated from multiple directions and colonies are grouped depending on the feature amounts. Then, bacterial colonies to be harvested are determined based on the results of the grouping.
摘要翻译： 当培养皿中存在多种细菌菌落时，例如测定药物耐受性时，收集不同类型细菌的混合菌落使得不可能准确地确定药物耐受性。 此外，需要提高用于收获细菌菌落的装置的产量。 从多个方向照射的图像，分离细菌菌落被自动提取。 接下来，根据从多个方向照明的多个图像计算图像特征量，并且根据特征量对殖民地进行分组。 然后，基于分组的结果确定要收获的细菌菌落。
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15.发明申请公开(公告)号：US20130321798A1
公开(公告)日：2013-12-05
申请号：US13882542
申请日：2011-10-14
申请人： Yuta Urano , Toshifumi Honda , Takahiro Jingu
发明人： Yuta Urano , Toshifumi Honda , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/4795 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8835
摘要： A defect inspection method includes an illumination light adjustment step of adjusting light emitted from a light source, an illumination intensity distribution control step of forming light flux obtained in the illumination light adjustment step into desired illumination intensity distribution, a sample scanning step of displacing a sample in a direction substantially perpendicular to a longitudinal direction of the illumination intensity distribution, a scattered light detection step of counting the number of photons of scattered light emitted from plural small areas in an area irradiated with illumination light to produce plural scattered light detection signals corresponding to the plural small areas, a defect judgment step of processing the plural scattered light detection signals to judge presence of a defect, a defect dimension judgment step of judging dimensions of the defect in each place in which the defect is judged to be present and a display step of displaying a position on sample surface and the dimensions of the defect in each place in which the defect is judged to be present.
摘要翻译： 缺陷检查方法包括调整从光源发出的光的照明光调节步骤，将在所述照明光调节步骤中获得的光束形成为期望的照度分布的照度分布控制步骤，将样品置换的样本扫描步骤 在与照明强度分布的长度方向大致正交的方向上，对从照明光照射的区域的多个小区域发射的散射光的光数进行计数，生成与多个散射光检测信号对应的散射光检测信号的散射光检测步骤 多个小区域，处理多个散射光检测信号以判断缺陷的存在的缺陷判断步骤，判断存在缺陷的每个位置的缺陷的尺寸的缺陷维度判断步骤和显示 显示位置的步骤o n样品表面和缺陷的每个位置的缺陷的尺寸。
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公开(公告)号：US20100004875A1
公开(公告)日：2010-01-07
申请号：US12488610
申请日：2009-06-22
申请人： Yuta Urano , Toshifumi Honda , Akira Hamamatsu , Shunji Maeda
发明人： Yuta Urano , Toshifumi Honda , Akira Hamamatsu , Shunji Maeda
CPC分类号： G01N21/9501 , G01N21/4738 , G01N2021/4711 , G01N2021/887
摘要： In a detection step, light produced on a sample in plural directions are collectively detected using a plurality of detectors. Multidimensional features containing information about scattered light distributions are extracted based on a plurality of detector outputs obtained. The feature is compared with data in a scattered light distribution library thereby to determine the types and sizes of defects. In a feature extraction step, a feature outputted based on the magnitude of each of scattered light detected signals of scatterers already known in refractive index and shape, which are obtained in the detection step, is corrected, thereby realizing high precision determination.
摘要翻译： 在检测步骤中，使用多个检测器共同检测在多个方向上的样品上产生的光。 基于获得的多个检测器输出提取包含关于散射光分布的信息的多维特征。 将该特征与散射光分布库中的数据进行比较，从而确定缺陷的类型和大小。 在特征提取步骤中，校正基于在检测步骤中获得的折射率和形状已知的散射体的散射光检测信号的大小的输出的特征，从而实现高精度的确定。
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公开(公告)号：US08599369B2
公开(公告)日：2013-12-03
申请号：US13378418
申请日：2010-06-09
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译： 一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。
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公开(公告)号：US20120133928A1
公开(公告)日：2012-05-31
申请号：US13378418
申请日：2010-06-09
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译： 一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。
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公开(公告)号：US09773641B2
公开(公告)日：2017-09-26
申请号：US13993838
申请日：2011-11-10
申请人： Yuko Otani , Yuta Urano , Toshifumi Honda
发明人： Yuko Otani , Yuta Urano , Toshifumi Honda
CPC分类号： H01J37/261 , G01N21/8806 , G01N21/9501
摘要： Disclosed are a method and an apparatus for observing defects by using an SEM, wherein, in order to observe defects on a wafer at high speed and high sensitivity, positional information of defects on a sample, which has been optically inspected and detected by other inspecting apparatus, and information of the conditions of the optical inspection having been performed by other inspecting apparatus are obtained, and optically detecting the defects on the sample placed on a table, on the basis of the thus obtained information, and on the basis of the detected positional information of the defect on the sample placed on the table, the positional information of the defect having been inspected and detected by other inspecting apparatus is corrected, then, the defects on the sample placed on the table are observed by the SEM using the thus corrected positional information of the defects.
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公开(公告)号：US20140204194A1
公开(公告)日：2014-07-24
申请号：US14116132
申请日：2012-04-27
申请人： Yuko Otani , Toshifumi Honda , Yuta Urano
发明人： Yuko Otani , Toshifumi Honda , Yuta Urano
CPC分类号： G01N21/9505 , G01B11/00 , G01B11/02 , G01B15/00 , G01N21/47 , G01N21/9501 , G01N2021/4711 , G01N2021/8822 , G01N2021/8867 , G02B26/008 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： This invention relates to a method for performing an analysis of defective material and the refractive index, and a three-dimensional analysis of very small pattern shapes including the steps of imaging by a scanning electron microscope to acquire an image of the position of a defect under observation using information of inspection results obtained by an optical inspection device, creating a model of the defect by using the acquired image of the defect under observation, calculating the values detected by the detector when reflected and scattered light emitted from a defect model is received by the detector when light is irradiated onto the defect model thus created, comparing the detection values thus calculated and the values detected by the detector, which has received light actually reflected and scattered from the sample, to obtain information relating to the height of the defect under observation, the material, or the refractive index.
摘要翻译： 本发明涉及一种用于对缺陷物质进行分析的方法和折射率，以及非常小的图案形状的三维分析，包括以下步骤：通过扫描电子显微镜成像以获得缺陷位置的图像 观察使用由光学检查装置获得的检查结果的信息，通过使用获取的观察缺陷图像来产生缺陷的模型，计算当从缺陷模型发射的反射和散射光被反射和检测到的值时检测到的值被接收到 当将光照射到如此产生的缺陷模型上时，将检测器与这样计算的检测值进行比较，并将接收到从样品实际反射和散射的光的检测器检测到的值进行比较，以获得与缺陷的高度有关的信息 观察，材料或折射率。
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