公开(公告)号：US08118935B2

公开(公告)日：2012-02-21

申请号：US11132173

申请日：2005-05-19

申请人： Takakazu Yamada ,  Takeshi Masuda ,  Masahiko Kajinuma ,  Masaki Uematsu ,  Koukou Suu

发明人： Takakazu Yamada ,  Takeshi Masuda ,  Masahiko Kajinuma ,  Masaki Uematsu ,  Koukou Suu

IPC分类号： C23C16/455 ,  C23C16/00 ,  H01L21/306

CPC分类号： C23C16/45502 ,  B01F3/02 ,  B01F5/0256 ,  B01F2215/0427 ,  B01J4/001 ,  B01J10/02 ,  B01J19/247 ,  C23C16/4412 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/4558 ,  C23C16/4585 ,  H01L21/67017

摘要： A thin film manufacturing system, wherein a stage for placing a substrate thereon is disposed within a vacuum reactor and a gas head for supplying a film forming gas to a central area on a top face of the vacuum reactor is arranged so that the gas head is opposed to the stage. A cylindrical sleeve member is disposed and comes in close contact with a side wall of the stage to surround a periphery of the stage. The height of the stage can be established at the position where the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of a first space formed above the stage, in such a manner that an exhaust gas is isotropically discharged from the first space without causing any convection current therein through the interstice between the sleeve member and an inner wall surface constituting the reactor.

摘要翻译： 一种薄膜制造系统，其中用于将基板放置在其上的载物台设置在真空反应器内，并且将用于将成膜气体供应到真空反应器的顶面上的中心区域的气体头设置为使得气体头 反对舞台。 圆柱形套筒构件设置成与舞台的侧壁紧密接触以围绕舞台的周边。 该台架的高度可以在形成在载物台下方并连接到真空排出装置的第二空间的体积大于形成在载物台上方的第一空间的体积的位置上， 从第一空间各向同性地排出，而不会通过套筒构件和构成反应器的内壁面之间的间隙引起任何对流。

公开(公告)号：US08197599B2

公开(公告)日：2012-06-12

申请号：US12086032

申请日：2006-11-13

申请人： Takakazu Yamada ,  Nobuyuki Kato ,  Masaki Uematsu

发明人： Takakazu Yamada ,  Nobuyuki Kato ,  Masaki Uematsu

IPC分类号： C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/45514 ,  C23C16/45565

摘要： A gas head that, at low cost, is capable of suppressing any deactivation of radical gas and capable of uniformly introducing a raw material gas on a substrate; and a relevant thin-film manufacturing apparatus are provided. A gas head (13) according to the present invention includes a reactive gas introduction port (30A) for introduction of a reactive gas, a plurality of raw material gas introduction ports (30B) for introduction of a raw material gas, and a dispersion board (32) for dispersing the raw material gas, wherein the plurality of the raw material gas introduction ports (30B) are disposed so as to surround the periphery of the reactive gas introduction port (30A). The reactive gas having been introduced in the reactive gas introduction port (30A) is mixed with the raw material gas having been introduced through a plurality of raw material gas introduction ports (30B) and dispersed by means of the dispersion board (32). Although the plurality of raw material gas introduction ports (30B) are disposed around the reactive gas introduction port (30A), they are not required to be minute holes such as shower holes.

摘要翻译： 一种低成本地能够抑制自由基气体的失活并能够将原料气体均匀地引入到基板上的气体头， 并提供相关的薄膜制造装置。 根据本发明的气体头（13）包括用于引入反应性气体的反应气体引入口（30A），用于引入原料气体的多个原料气体导入口（30B）和分散板 （32），用于分散原料气体，其中多个原料气体导入口（30B）配置成包围反应气体导入口（30A）的周围。 引入到反应气体导入口（30A）中的反应性气体与通过多个原料气体导入口（30B）导入并通过分散板（32）分散的原料气体混合。 虽然多个原料气体导入口（30B）配置在反应气体导入口（30A）的周围，但不需要像淋浴孔那样的小孔。

公开(公告)号：US20090250004A1

公开(公告)日：2009-10-08

申请号：US12086032

申请日：2006-11-13

申请人： Takakazu Yamada ,  Nobuyuki Kato ,  Masaki Uematsu

发明人： Takakazu Yamada ,  Nobuyuki Kato ,  Masaki Uematsu

IPC分类号： C23C16/00 ,  B05B7/00

CPC分类号： C23C16/45574 ,  C23C16/45514 ,  C23C16/45565

摘要： A gas head that, at low cost, is capable of suppressing any deactivation of radical gas and capable of uniformly introducing a raw material gas on a substrate; and a relevant thin-film manufacturing apparatus are provided. A gas head (13) according to the present invention includes a reactive gas introduction port (30A) for introduction of a reactive gas, a plurality of raw material gas introduction ports (30B) for introduction of a raw material gas, and a dispersion board (32) for dispersing the raw material gas, wherein the plurality of the raw material gas introduction ports (30B) are disposed so as to surround the periphery of the reactive gas introduction port (30A). The reactive gas having been introduced in the reactive gas introduction port (30A) is mixed with the raw material gas having been introduced through a plurality of raw material gas introduction ports (30B) and dispersed by means of the dispersion board (32). Although the plurality of raw material gas introduction ports (30B) are disposed around the reactive gas introduction port (30A), they are not required to be minute holes such as shower holes.

摘要翻译： 一种低成本地能够抑制自由基气体的失活并能够将原料气体均匀地引入到基板上的气体头， 并提供相关的薄膜制造装置。 根据本发明的气体头（13）包括用于引入反应性气体的反应气体引入口（30A），用于引入原料气体的多个原料气体导入口（30B）和分散板 （32），用于分散原料气体，其中多个原料气体导入口（30B）配置成包围反应气体导入口（30A）的周围。 引入到反应气体导入口（30A）中的反应性气体与通过多个原料气体导入口（30B）导入并通过分散板（32）分散的原料气体混合。 虽然多个原料气体导入口（30B）配置在反应气体导入口（30A）的周围，但不需要像淋浴孔那样的小孔。

公开(公告)号：US5505440A

公开(公告)日：1996-04-09

申请号：US264302

申请日：1994-06-23

申请人： Masaki Uematsu

发明人： Masaki Uematsu

IPC分类号： B07C1/00 ,  B07C1/02 ,  B65H7/06 ,  B65H43/04 ,  G06K13/067 ,  B65H7/02

CPC分类号： G06K13/067 ,  B07C1/02 ,  B65H43/04 ,  B65H2511/11

摘要： An apparatus for transporting card-like articles includes a feeding unit for feeding card-like articles, and a shingler conveying unit comprising a first belt which moves in a first running speed and a second belt which moves in a second running speed different from the first running speed for transporting card-like articles fed from the feeding unit in a prescribed direction while holding them by the first and second belts. The apparatus further includes a first measuring unit provided in a preceding stage of the shingler conveying unit for measuring lengths of the card-like articles along the transporting direction, a second measuring unit provided in a succeeding stage of the shingler conveying unit for measuring lengths of the card-like articles along the transporting direction, and an abnormality detecting unit for detecting abnormality in conveying card-like articles based on measured results of the first and the second measuring unit.

摘要翻译： 用于传送卡状物品的装置包括用于供给卡状物品的供给单元和包括第一带子，其以第一行进速度移动的第二带状物和第二带状物的移动单元输送单元， 运送速度，用于沿着规定的方向输送从进给单元供给的卡状物品，同时由第一和第二皮带保持。 该装置还包括：第一测量单元，设置在用于测量沿着输送方向的卡状物品的长度的定位器输送单元的前级;第二测量单元，设置在隔板输送单元的后段，用于测量长度 所述卡片状物品沿着所述输送方向，以及异常检测单元，其基于所述第一和第二测量单元的测量结果检测输送卡状物品的异常。

公开(公告)号：US5228052A

公开(公告)日：1993-07-13

申请号：US757766

申请日：1991-09-11

申请人： Masashi Kikuchi ,  Richard L. Bersin ,  Masaki Uematsu

发明人： Masashi Kikuchi ,  Richard L. Bersin ,  Masaki Uematsu

IPC分类号： H01J37/32

CPC分类号： H01J37/32082 ,  H01J37/32541 ,  H01J2237/334

摘要： A plasma ashing apparatus has a vacuum treatment chamber for receiving therein a substrate coated with a resist film, a reactive gas introduction pipe equipped with a plasma applicator, a vacuum exhaust pipe, a heating means for heating the substrate, and two pieces of electrodes disposed in parallel to each other. One of the electrodes is a substrate electrode and the other thereof is a circular counter electrode. These two electrodes are commonly connected to an RF power source to thereby constitute a cathode electrode. Multiple concentric perforations are formed in the counter electrode except for a rib portion. A central perforation is formed in the center of the counter electrode. The concentric perforations are formed at every distance, from the center, equivalent to a diameter of the central perforation, while leaving circular electrode surfaces corresponding in width to a radius of of the perforation.

摘要翻译： 等离子体灰化装置具有真空处理室，用于在其中容纳涂覆有抗蚀剂膜的基材，配备有等离子体涂布器的反应气体引入管，真空排气管，用于加热基板的加热装置和设置的两个电极 彼此平行。 电极中的一个是基板电极，另一个是圆形对电极。 这两个电极通常连接到RF电源，从而构成阴极电极。 除了肋部之外，在对电极中形成多个同心穿孔。 中心穿孔形成在对电极的中心。 同心的穿孔在距离中心的每个距离处形成，相当于中心穿孔的直径，同时留下宽度对应于穿孔半径的圆形电极表面。